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2014, 63(12): 128102.
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Ge Hong, Zhang Xiao-Dan, Yue Qiang, Zhao Jing, Zhao Ying. Study of space voltage distribution between large-area parallel-plate electrodes for very high frequency plasma enhanced chemical vapor deposition. Acta Physica Sinica,
2008, 57(8): 5105-5110.
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Wang Ye-An, Qin Fu-Wen, Wu Dong-Jiang, Wu Ai-Min, Xu Yin, Gu Biao. Analysis of diluted magnetic semiconductor GaMnN grown by electron cyclotron resonance-plasma enhanced metal organic chemical vapor deposition. Acta Physica Sinica,
2008, 57(1): 508-513.
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Yang Hang-Sheng. Surface growth mechanism of cubic boron nitride thin films prepared by plasma-enhanced chemical vapor deposition. Acta Physica Sinica,
2006, 55(8): 4238-4246.
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2005, 54(4): 1899-1903.
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Yu Wei, Wang Bao-Zhu, Yang Yan-Bin, Lu Wan-Bing, Fu Guang-Sheng. Optical emission diagnosis of helicon-wave-plasma-enhanced chemical vapor deposition of nanocrystalline silicon. Acta Physica Sinica,
2005, 54(5): 2394-2398.
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2004, 53(12): 4410-4413.
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Yang Wu-Bao, Wang Jiu-Li, Zhang Gu-Ling, Fan Song-Hua, Liu Chi-Zi, Yang Si-Ze. Diamond-like carbon films deposited on optical glass substrate by using ECR microwave acetone plasma CVD method. Acta Physica Sinica,
2004, 53(9): 3099-3103.
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2004, 53(3): 888-890.
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2003, 52(11): 2865-2869.
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2003, 52(3): 687-691.
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2001, 50(12): 2452-2455.
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