Mask defects characterization techniques based on synchrotron radiation extreme ultraviolet light source

ZHANG Zhihe; LIU Haigang; WANG Yong; TAI Renzhong

doi:10.7498/aps.74.20250864

Abstract

The multilayer structure of extreme ultraviolet (EUV) masks limits the penetration depth of traditional inspection techniques at non-working wavelengths, thus hindering the effective examination of buried phase defects. Developing defect characterization techniques operating at the 13.5 nm wavelength is crucial for overcoming the quality bottleneck in EUV mask fabrication. Synchrotron radiation light source, with their stable EUV wavelength, cleanliness, and high power density, represents an ideal light source for EUV mask defect characterization research. In this work the current state of technology development for mask characterization at the world's four major synchrotron radiation facilities are systematically reviewed. Through comparative analysis, their working principles, technical advantages, and limitations are investigated in depth, and provide a forward-looking discussion on future trends. In response to the specific requirements for EUV mask defect detection and review, this paper discusses the requirements for the next-generation system platform, which integrates deep detection and review functions, develops novel compact light sources, and innovatively combines the advantages of various imaging techniques to improve the numerical aperture (NA) of imaging systems. This aims to achieve a theoretical resolution of over 20 nm, meeting the future demands of the EUV lithography industry for higher NA (>0.55) and shorter wavelengths (6.7 nm). Regarding the prospects of extending synchrotron radiation to industrial applications, a compact synchrotron radiation source, which can be developed on-site in semiconductor facilities, is introduced to accelerate the research and development cycle, while achieving the synergistic integration of imaging technologies. This paper focuses on the application of phase recovery principle of ptychography to Fourier synthesis illumination (FSI), achieving aberration correction in lens-based systems through synthetic aperture extension. In this paper, the working principles, performance benchmarks, technical challenges, and emerging development trends of existing synchrotron radiation-based EUV mask characterization techniques are investigated. It provides an important reference for designing next-generation EUV mask characterization system platforms.

Keywords:

Authors and contacts

1.
Qian Weichang College, Shanghai University, Shanghai 200444, China
2.
Shanghai Synchrotron Radiation Facility (SSRF), Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China

Corresponding author: LIU Haigang, liuhg@sari.ac.cn ; WANG Yong, wangyong@sari.ac.cn ; TAI Renzhong, tairz@sari.ac.cn

Funds: Project supported by the National Basic Research Program of China (Grant No. 2021YFA1601000) and the National Natural Science Foundation of China (Grant No. 12175297).

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References

[1]	Sivakumar S 2011 16th Asia and South Pacific Design Automation Conference (ASP-DAC 2011) Hongkong, China, January 25–28, 2011 p402
[2]	刘海岗, 孟祥雨, 张祥志, 赵波, 赵俊, 郭智, 吴衍青, 王勇, 邰仁忠 2024 中国专利CN117890382A [2024-4-16]] Liu H G, Meng X Y, Zhang X Z, Zhao B, Zhao J, Guo Z, Wu Y Q, Wang Y, Tai RZ 2024 Patent CN117890382A [2024-4-16]
[3]	苏子净, 刘海岗, 孟祥雨, 张祥志, 赵波, 郭智, 王勇, 邰仁忠 2025 核技术 48 030102 Su Z J, Liu H G, Meng X Y, Zhang X Z, Zhao B, Guo Z, Wang Y, Tai R Z 2025 Nucl. Tech. 48 030102
[4]	崔明启, 王俊, 缪建伟, 黄宇营, 唐鄂生, 冼鼎昌, 邵景鸿, 薛松, 徐正良, 孙剑辉 1995 高能物理与核物理 19 82 Cui M Q, Wang J, Miao J W, Huang Y Y, Tang E S, Xian D C, Shao J H, Xue S, Xu Z L, Sun J H 1995 High Energy Phys. Nucl. Phys. 19 82
[5]	Ko J H, Kim M W, Lee S, Han J H, Hong J 2024 J. Korean Phys. Soc. 84 189 Google Scholar
[6]	Bergmann R M, Bieri T, Craievich P, Ekinci T G, Gough M N, Rivkin C R, Schulz T S, Stingelin A S, Wrulich V V A, Callegher A Z, Zennaro R 2017 13th International Topical Meeting on the Applications of Accelerators Quebec, Cnanda, July 31–August 4, 2017 p217
[7]	Rastegar A, Jindal V 2012 28th European Mask and Lithography Conference (EMLC 2012) Dresden, Germany, January 17–18, 2012 p83520W
[8]	Pfeiffer F 2018 Nat. Photonics 12 9 Google Scholar
[9]	Miyai H, Kohyama T, Todoroki T 2021 Photomask Japan 2021 Japan, April 20–21, 2021 p119080H
[10]	Gwosch K, Capelli R, Roesch M, Nicholls R, Langbehn B, Mohn M, Verch A, Albert M, Kersteen G, Winkler A, Müller C, Krannich S 2023 SPIE Photomask Technology + Extreme Ultraviolet Lithography 2023 Monterey, California, USA, October 1–5, 2023 pPC127500O
[11]	赵红军, 李昊罡, 颜亮, 李川 2016 网络安全与数据治理 35 8 Google Scholar Zhao H J, Li H G, Yan L, Li C 2016 Cyber Secur. Data Govern. 35 8 Google Scholar
[12]	Spie Photomask Technology V, International B 2015 SPIE Photomask Technology Monterey, California, USA, September 29–October 1, 2015 p271
[13]	Lin J, Weber N, Maul J, Hendel S, Rott K, Merkel M, Schoenhense G, Kleineberg U 2007 Opt. Lett. 32 1875 Google Scholar
[14]	李慧, 吴晓斌, 韩晓泉, 马赫, 沙鹏飞 2023 中国激光 50 113 Li H, Wu X B, Han X Q, Ma H, Sha P F 2023 Chin. J. Lasers 50 113
[15]	Yang L, Ma Z, Liu S, Jiao Q, Zhang J, Zhang W, Pei J, Li H, Li Y, Zou Y, Xu Y, Tan X 2022 Sensors 22 1113 Google Scholar
[16]	García-Escudero A, Navarro-Bustos G, Umbría-Jiménez S, González-Cámpora R, Galera-Davidson H 2017 Rev. Soc. Esp. Quim. Clin. 50 113
[17]	Goldberg K, Mochi I, Benk M, Allezy A, Dickinson M, Cork C, Zehm D, Macdougall J, Anderson E, Salmassi F, Chao W, Vytla V, Gullikson E, DePonte J, Jones M S G, Van Camp D, Gamsby J, Ghiorso W, Huang H, Cork W, Martin E, Van Every E, Acome E, Milanovic V, Delano R, Naulleau P, Rekawa S 2013 SPIE Advanced Lithography San Jose, California, February 24–28, 2013 p867919
[18]	潘新宇, 毕筱雪, 董政, 耿直, 徐晗, 张一, 董宇辉, 张承龙 2023 物理学报 72 054202 Google Scholar Pan X Y, Bi X X, Dong Z, Geng Z, Xu H, Zhang Y, Dong Y H, Zhang C L 2023 Acta Phys. Sin. 72 054202 Google Scholar
[19]	范家东, 江怀东 2012 物理学报 61 218702 Google Scholar Fan J D, Jiang H D 2012 Acta Phys. Sin. 61 218702 Google Scholar
[20]	Lee S, Guizar-Sicairos M, Ekinci Y 2014 SPIE Advanced Lithography San Jose, California, February 23–27, 2014 p904811–1
[21]	Wojdyla A, Benk M, Naulleau P, Goldberg K 2018 Image Sensing Technologies: Materials, Devices, Systems, and Applications V Gaylord Palms Hotel, Orlando, April 16–19, 2018 p106560W
[22]	Mochi I, Helfenstein P, Mohacsi I, Rajendran R, Kazazis D, Yoshitake S, Ekinci Y 2017 J. Micro/Nanolithogr. , MEMS, MOEMS 16 041003 Google Scholar
[23]	Tanaka Y, Harada T, Amano T, Usui Y, Watanabe T, Kinoshita H 2014 Jpn. J. Appl. Phys. 53 06JC03 Google Scholar
[24]	Miyakawa R, and Naulleau P 2019 Synchrotron Radiat. News 32 15
[25]	Benk M, Wojdyla A, Chao W, Salmassi F, Oh S, Wang Y-G, Miyakawa R, Naulleau P, Goldberg K 2016 SPIE Advanced Lithography San Jose, California, February 21–25, 2016 p97761J–1
[26]	Goldberg K, Benk M, Wojdyla A, Mochi I, Rekawa S, Allezy A, Dickinson M, Cork C, Chao W, Zehm D, Macdougall J, Naulleau P, Rudack A 2014 SPIE Advanced Lithography San Jose, California, February 23–27, 2014 p90480Y–1
[27]	Li X L, Meng X Y, Wang Y, Liu H G, Zhang Y F, Zhang X Z, Zhao B, Zhao J, Tai R Z 2025 Phys. Scr. 100 045533 Google Scholar
[28]	Simons H, Poulsen H F, Guigay J P, Detlefs C 2016 arXiv: 1609.07513 [physics.ins-det]
[29]	Wakonig K, Diaz A, Bonnin A, Stampanoni M, Bergamaschi A, Ihli J, Guizar-Sicairos M, Menzel A 2019 Sci. Adv. 5 eaav0282 Google Scholar

Cited By

图 1 EUV掩模结构及典型缺陷

Figure 1. EUV mask structure and typical defects.

DownLoad: Full-Size Img PowerPoint

图 2 (a) 傅里叶合成照明光路图及照明模式样例; (b) SHARP的光路设计^[17]; (c) SSRF-BL09B1A的光路设计

Figure 2. (a) Schematic optical layout of FSI and representative illumination patterns; (b) optical path design of SHARP^[17]; (c) optical path design of SSRF-BL09B1A.

DownLoad: Full-Size Img PowerPoint

图 3 (a) RESCAN的光路设计^[22]; (b) Micro-CSM的光路设计^[23]

Figure 3. (a) Optical path design of RESCAN^[22]; (b) optical path design of Micro-CSM^[23].

DownLoad: Full-Size Img PowerPoint

表 1 国际知名同步辐射光源与表征设备对比

Table 1. Comparison of internationally renowned synchrotron radiation sources and characterization equipment.

光源	ALS	SLS	New SUBARU	SSRF
平台	SHARP	RESCAN	Micro- CSM	SSRF- BL09B1A
功能	分析	在线检测+ 分析	分析	在线检测+ 分析
成像技术	全场成像	叠层衍射成像	相干衍射成像	全场成像
92 eV能量分辨率(E/ΔE)	10^–4	4%	1300	1000—8000
光斑直径/μm	30	10	0.23	>25
分辨率/nm	22	34	30	20(设计)

DownLoad: CSV

[1]	Sivakumar S 2011 16th Asia and South Pacific Design Automation Conference (ASP-DAC 2011) Hongkong, China, January 25–28, 2011 p402
[2]	刘海岗, 孟祥雨, 张祥志, 赵波, 赵俊, 郭智, 吴衍青, 王勇, 邰仁忠 2024 中国专利CN117890382A [2024-4-16]] Liu H G, Meng X Y, Zhang X Z, Zhao B, Zhao J, Guo Z, Wu Y Q, Wang Y, Tai RZ 2024 Patent CN117890382A [2024-4-16]
[3]	苏子净, 刘海岗, 孟祥雨, 张祥志, 赵波, 郭智, 王勇, 邰仁忠 2025 核技术 48 030102 Su Z J, Liu H G, Meng X Y, Zhang X Z, Zhao B, Guo Z, Wang Y, Tai R Z 2025 Nucl. Tech. 48 030102
[4]	崔明启, 王俊, 缪建伟, 黄宇营, 唐鄂生, 冼鼎昌, 邵景鸿, 薛松, 徐正良, 孙剑辉 1995 高能物理与核物理 19 82 Cui M Q, Wang J, Miao J W, Huang Y Y, Tang E S, Xian D C, Shao J H, Xue S, Xu Z L, Sun J H 1995 High Energy Phys. Nucl. Phys. 19 82
[5]	Ko J H, Kim M W, Lee S, Han J H, Hong J 2024 J. Korean Phys. Soc. 84 189 Google Scholar
[6]	Bergmann R M, Bieri T, Craievich P, Ekinci T G, Gough M N, Rivkin C R, Schulz T S, Stingelin A S, Wrulich V V A, Callegher A Z, Zennaro R 2017 13th International Topical Meeting on the Applications of Accelerators Quebec, Cnanda, July 31–August 4, 2017 p217
[7]	Rastegar A, Jindal V 2012 28th European Mask and Lithography Conference (EMLC 2012) Dresden, Germany, January 17–18, 2012 p83520W
[8]	Pfeiffer F 2018 Nat. Photonics 12 9 Google Scholar
[9]	Miyai H, Kohyama T, Todoroki T 2021 Photomask Japan 2021 Japan, April 20–21, 2021 p119080H
[10]	Gwosch K, Capelli R, Roesch M, Nicholls R, Langbehn B, Mohn M, Verch A, Albert M, Kersteen G, Winkler A, Müller C, Krannich S 2023 SPIE Photomask Technology + Extreme Ultraviolet Lithography 2023 Monterey, California, USA, October 1–5, 2023 pPC127500O
[11]	赵红军, 李昊罡, 颜亮, 李川 2016 网络安全与数据治理 35 8 Google Scholar Zhao H J, Li H G, Yan L, Li C 2016 Cyber Secur. Data Govern. 35 8 Google Scholar
[12]	Spie Photomask Technology V, International B 2015 SPIE Photomask Technology Monterey, California, USA, September 29–October 1, 2015 p271
[13]	Lin J, Weber N, Maul J, Hendel S, Rott K, Merkel M, Schoenhense G, Kleineberg U 2007 Opt. Lett. 32 1875 Google Scholar
[14]	李慧, 吴晓斌, 韩晓泉, 马赫, 沙鹏飞 2023 中国激光 50 113 Li H, Wu X B, Han X Q, Ma H, Sha P F 2023 Chin. J. Lasers 50 113
[15]	Yang L, Ma Z, Liu S, Jiao Q, Zhang J, Zhang W, Pei J, Li H, Li Y, Zou Y, Xu Y, Tan X 2022 Sensors 22 1113 Google Scholar
[16]	García-Escudero A, Navarro-Bustos G, Umbría-Jiménez S, González-Cámpora R, Galera-Davidson H 2017 Rev. Soc. Esp. Quim. Clin. 50 113
[17]	Goldberg K, Mochi I, Benk M, Allezy A, Dickinson M, Cork C, Zehm D, Macdougall J, Anderson E, Salmassi F, Chao W, Vytla V, Gullikson E, DePonte J, Jones M S G, Van Camp D, Gamsby J, Ghiorso W, Huang H, Cork W, Martin E, Van Every E, Acome E, Milanovic V, Delano R, Naulleau P, Rekawa S 2013 SPIE Advanced Lithography San Jose, California, February 24–28, 2013 p867919
[18]	潘新宇, 毕筱雪, 董政, 耿直, 徐晗, 张一, 董宇辉, 张承龙 2023 物理学报 72 054202 Google Scholar Pan X Y, Bi X X, Dong Z, Geng Z, Xu H, Zhang Y, Dong Y H, Zhang C L 2023 Acta Phys. Sin. 72 054202 Google Scholar
[19]	范家东, 江怀东 2012 物理学报 61 218702 Google Scholar Fan J D, Jiang H D 2012 Acta Phys. Sin. 61 218702 Google Scholar
[20]	Lee S, Guizar-Sicairos M, Ekinci Y 2014 SPIE Advanced Lithography San Jose, California, February 23–27, 2014 p904811–1
[21]	Wojdyla A, Benk M, Naulleau P, Goldberg K 2018 Image Sensing Technologies: Materials, Devices, Systems, and Applications V Gaylord Palms Hotel, Orlando, April 16–19, 2018 p106560W
[22]	Mochi I, Helfenstein P, Mohacsi I, Rajendran R, Kazazis D, Yoshitake S, Ekinci Y 2017 J. Micro/Nanolithogr. , MEMS, MOEMS 16 041003 Google Scholar
[23]	Tanaka Y, Harada T, Amano T, Usui Y, Watanabe T, Kinoshita H 2014 Jpn. J. Appl. Phys. 53 06JC03 Google Scholar
[24]	Miyakawa R, and Naulleau P 2019 Synchrotron Radiat. News 32 15
[25]	Benk M, Wojdyla A, Chao W, Salmassi F, Oh S, Wang Y-G, Miyakawa R, Naulleau P, Goldberg K 2016 SPIE Advanced Lithography San Jose, California, February 21–25, 2016 p97761J–1
[26]	Goldberg K, Benk M, Wojdyla A, Mochi I, Rekawa S, Allezy A, Dickinson M, Cork C, Chao W, Zehm D, Macdougall J, Naulleau P, Rudack A 2014 SPIE Advanced Lithography San Jose, California, February 23–27, 2014 p90480Y–1
[27]	Li X L, Meng X Y, Wang Y, Liu H G, Zhang Y F, Zhang X Z, Zhao B, Zhao J, Tai R Z 2025 Phys. Scr. 100 045533 Google Scholar
[28]	Simons H, Poulsen H F, Guigay J P, Detlefs C 2016 arXiv: 1609.07513 [physics.ins-det]
[29]	Wakonig K, Diaz A, Bonnin A, Stampanoni M, Bergamaschi A, Ihli J, Guizar-Sicairos M, Menzel A 2019 Sci. Adv. 5 eaav0282 Google Scholar

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