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Tantalum-doped TiO2 thin films were deposited on glass substrates by pulsed laser deposition (PLD). Their optoelectrical properties were studied. The optical band gap was found varying between 3.26 and 3.49 eV when the oxygen partial pressure increases from 0.3 to 0.7 Pa. The dependence of electrical property of the films on temperature was measured to identify the dominant conduction mechanism. It was found that thermally activated band conduction was the dominant conduction mechanism in the temperatures range of 150 to 210 K. Whereas, in the temperature region of 10 to 150 K, the dependence of the conductivity on temperature followed Mott’s variable range hopping (VRH) model. Moreover, the temperature dependence of resistivity for the films can be described by～ exp(b/T)1/2 at temperatures from 210 to 300 K.
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Keywords:
- Ta-doped TiO2 /
- pulsed laser deposition /
- thin film /
- conduction mechanism
[1] Maness P Smolinski S, Blake D, Huang Z, Wolfrum E, Jacoby W 1999 Appl. Environ. Microb. 65 4094
[2] Wu J, Lv X, Zhang L, Xia Y, Huang F, Xu F 2009 J. Alloys Compd. 496 1
[3] Regan B O, Gratzel M 1991 Nature 353 737
[4] Hu L H, Dai S Y, Wang K J 2005 Acta Phys Sin 54 1914 (in Chinese) [胡林华, 戴松元, 王孔嘉 2005 物理学报 54 1914]
[5] Danion A, Disdier J, Guillard C, Abdelmalek F, Jaffrezic Renault N 2004 Appl. Catal. B: Environ. 52 213
[6] Esquivel K, Arriaga L, Rodriguez F, Martinez L, Godinez L 2009 Water Res. 43 3593
[7] Moon J, Park J, Lee S, Zyung T, Kim I 2010 Sens. Actuators B: Chem. 149 301
[8] Asahi R, Taga Y,Mannstadt W, Freeman A J 2000 Phys. Rev. B 61 7459
[9] Tang H, Prasad K, Sanjines R, Schmid P E, Levy F 1994 J. Appl. Phys. 75 2042
[10] Liu X D, Jiang E Y, Li Z Q, Song Q G 2008 Appl. Phys. Lett. 92 252104
[11] Furubayashi Y, Hitosugi T, Yamamoto Y, Inaba K, Kinoda G, Hirose Y, Shimada T, Hasegawa T 2005 Appl. Phys. Lett. 86 252101
[12] Zhang S X, Kundaliya D C, Yu W, Dhar S, Young S Y, Riba L G S, Ogale S B, Vispute R D, Venkatesan T 2007 J. Appl. Phys. 102 013701
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[16] Gupta R K, Ghosh K, Mishra S R, Kahol P K 2008 Appl. Surf. Sci. 254 4018
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[18] Yamada N, Hitosugi T, Hoang N L H, Furubayashi Y, Hirose Y, Konuma S, Shimada T, Hasegawa T 2008 Thin Solid Films 516 5754
[19] Hitosugi T, Kamisaka H, Yamashita K, Nogawa H, Furubayashi Y, Nakao S, Yamada N, Chikamatsu A, Kumigashira H, Oshima M, Hirose Y, Shimada T, Hasegawa T 2008 Appl. Phys. Exp. 1 111203
[20] Patra A, Friend C S, Kapoor R, Prasad P N 2003 Chem. Mater. 15 3650
[21] Lee W E, Fang Y K, Ho J J, Chen C Y, Chiou L H, Wang S J, Dai F, Heieh T, Tsai R Y, Huang D, Ho F C 2002 Solid State Electron 46 477
[22] Tak Y H, Kim K B, Park H G, Lee K H, Lee J R 2002 Thin Solid Films 411 12
[23] Miao W, Li X, Zhang Q, Huang L, Zhang Z, Zhang L, Yan X 2006 Thin Solid Films 500 70
[24] Daude N, Gout C, Jouanin C 1977 Phys. Rev. B 15 3229
[25] Park S M, Ikegami T, Ebihara K, Shin P K 2006 Appl. Surf. Sci. 253 1522
[26] Yasuhiro I, Hirokazu K 2001 Appl. Surf. Sci. 169 508
[27] Zhang S X, Dhar S, Yu W, Xu H, Ogale S B, Venkatesan T 2007 Appl. Phys. L 91 112
[28] Yong T K, Tou T Y, Teo B S 2005 Appl. Surf. Sci. 248 388
[29] Sheng P, Abeles B, Arie Y 1973 Phys. Rev. Lett. 31 44
[30] Efros A L, Shklovskii B I 1975 J. Phys. C 8 L49
[31] Mott N F, Davis E A 1979 Calendon Press Oxford
[32] Yildiz A, Lisesivdin S B, Kasap M, Mardare D 2009 Physica B 404 1423
[33] Mott N F 1968 J. Non-Cryst. Solids 1 1
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[1] Maness P Smolinski S, Blake D, Huang Z, Wolfrum E, Jacoby W 1999 Appl. Environ. Microb. 65 4094
[2] Wu J, Lv X, Zhang L, Xia Y, Huang F, Xu F 2009 J. Alloys Compd. 496 1
[3] Regan B O, Gratzel M 1991 Nature 353 737
[4] Hu L H, Dai S Y, Wang K J 2005 Acta Phys Sin 54 1914 (in Chinese) [胡林华, 戴松元, 王孔嘉 2005 物理学报 54 1914]
[5] Danion A, Disdier J, Guillard C, Abdelmalek F, Jaffrezic Renault N 2004 Appl. Catal. B: Environ. 52 213
[6] Esquivel K, Arriaga L, Rodriguez F, Martinez L, Godinez L 2009 Water Res. 43 3593
[7] Moon J, Park J, Lee S, Zyung T, Kim I 2010 Sens. Actuators B: Chem. 149 301
[8] Asahi R, Taga Y,Mannstadt W, Freeman A J 2000 Phys. Rev. B 61 7459
[9] Tang H, Prasad K, Sanjines R, Schmid P E, Levy F 1994 J. Appl. Phys. 75 2042
[10] Liu X D, Jiang E Y, Li Z Q, Song Q G 2008 Appl. Phys. Lett. 92 252104
[11] Furubayashi Y, Hitosugi T, Yamamoto Y, Inaba K, Kinoda G, Hirose Y, Shimada T, Hasegawa T 2005 Appl. Phys. Lett. 86 252101
[12] Zhang S X, Kundaliya D C, Yu W, Dhar S, Young S Y, Riba L G S, Ogale S B, Vispute R D, Venkatesan T 2007 J. Appl. Phys. 102 013701
[13] Zhang R S, Liu Y, Teng F 2012 Acta Phys. Sin. 61 392 (in Chinese) [章瑞铄, 刘涌, 滕繁 2012 物理学报 61 392]
[14] Luo X D, Di G Q 2012 Acta Phys. Sin. 61 391 (in Chinese) [罗晓东, 狄国庆 2012 物理学报 61 391]
[15] Hitosugi T, Furubayashi Y, Ueda A, Itabashi K, Inaba K, Hirose Y, Kinoda G, Yamamoto Y, Shimada T, Hasegawa T 2005 Jpn. J. Appl. Phys. 44 L1063
[16] Gupta R K, Ghosh K, Mishra S R, Kahol P K 2008 Appl. Surf. Sci. 254 4018
[17] Yamada N, Hitosugi T, Hoang N L H, Furubayashi Y, Hirose Y, Shimada T, Hasegawa T 2007 Jpn. J. Appl. Phys. 46 5275
[18] Yamada N, Hitosugi T, Hoang N L H, Furubayashi Y, Hirose Y, Konuma S, Shimada T, Hasegawa T 2008 Thin Solid Films 516 5754
[19] Hitosugi T, Kamisaka H, Yamashita K, Nogawa H, Furubayashi Y, Nakao S, Yamada N, Chikamatsu A, Kumigashira H, Oshima M, Hirose Y, Shimada T, Hasegawa T 2008 Appl. Phys. Exp. 1 111203
[20] Patra A, Friend C S, Kapoor R, Prasad P N 2003 Chem. Mater. 15 3650
[21] Lee W E, Fang Y K, Ho J J, Chen C Y, Chiou L H, Wang S J, Dai F, Heieh T, Tsai R Y, Huang D, Ho F C 2002 Solid State Electron 46 477
[22] Tak Y H, Kim K B, Park H G, Lee K H, Lee J R 2002 Thin Solid Films 411 12
[23] Miao W, Li X, Zhang Q, Huang L, Zhang Z, Zhang L, Yan X 2006 Thin Solid Films 500 70
[24] Daude N, Gout C, Jouanin C 1977 Phys. Rev. B 15 3229
[25] Park S M, Ikegami T, Ebihara K, Shin P K 2006 Appl. Surf. Sci. 253 1522
[26] Yasuhiro I, Hirokazu K 2001 Appl. Surf. Sci. 169 508
[27] Zhang S X, Dhar S, Yu W, Xu H, Ogale S B, Venkatesan T 2007 Appl. Phys. L 91 112
[28] Yong T K, Tou T Y, Teo B S 2005 Appl. Surf. Sci. 248 388
[29] Sheng P, Abeles B, Arie Y 1973 Phys. Rev. Lett. 31 44
[30] Efros A L, Shklovskii B I 1975 J. Phys. C 8 L49
[31] Mott N F, Davis E A 1979 Calendon Press Oxford
[32] Yildiz A, Lisesivdin S B, Kasap M, Mardare D 2009 Physica B 404 1423
[33] Mott N F 1968 J. Non-Cryst. Solids 1 1
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