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Inductively coupled plasmais widely used in semiconductor and display process because of its desirable characteristics such as high plasma density, simple structure and independently controllable ion energy. The driving frequency is a significant parameter that generates and maintains the plasma. However, the effects of different driving frequencies on the radial distribution of the plasma parameters are hardly investigated. So a large area cylindrical inductively coupled plasma source driven separately by 2 MHz and 13.56 MHz is investigated. In order to perform a comprehensive investigation about the effect of driving frequency, the radially resolved measurements of electron density, electron temperature and density of metastable state atoms for the argon discharge are systematically analyzed by Langmuir double probe and optical emission spectroscopy at various power values and gas pressures. It is found that input power values at high frequency (13.56 MHz) and low frequency (2 MHz) have different effects on plasma parameters. When discharge is driven at high frequency, the electron density increases obviously with the increase of power. However, when discharge is driven at low frequency, the electron temperature increases evidently with the increase of power. This can be explained by calculating the skin depths in high and low frequency discharge. When the discharge is driven at high frequency, the induced electromagnetic field is higher than that at low frequency, and the single electron obtains more energy. It is easier to ionize, so the energy is mainly used to increase the electron density. When the discharge is driven at low frequency, the skin layer is thicker, the number of heated electrons is larger, and the average energy of electrons is increased, so the energy is mainly used to raise the electron temperature. At a gas pressure of 10 Pa, the electron density shows a ‘convex’ distribution and increases with the increase of input power for both the high-frequency and low-frequency discharge. While the distributions of electron temperature are obviously different. When the discharge is driven at high frequency, the electron temperature is relatively flat in the center of the chamber and slightly increases on the edge. When the discharge is driven at low frequency, the electron temperature gradually decreases along the radial position. This is due to the one-step ionization in the high-frequency discharge and the two-step ionization in the low-frequency discharge. In order to prove that the low-frequency discharge is dominated by two-step ionization, the spectral intensities of the argon plasma under the same discharge conditions are diagnosed by optical emission spectroscopy. The number density of metastable states is calculated by the branch ratio method. The results are consistent with the analyses. At a gas pressure of 100 Pa, the electron density increases and then decreases with the increase of radial distance, and the overall distribution shows a " saddle shape” for high frequency and also for low frequency discharge. Although the uniformity of electron density improves with the gas pressure, the uniformity at low frequency is better than that at high frequency. The reason can be attributed to the fact that the skin layer of low frequency is thicker and the heating area is wider.
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Keywords:
- inductively coupled plasma /
- Langmuir double probe /
- optical emission spectroscopy /
- plasma parameters
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Lieberman M A, Lichtenberg A J(translated by Pu Y K) 2004 Principles of Plasma Discharge and Materials Processing (Beijing: Science Press) pp1−19 (in Chinese)
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Google Scholar
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[1] 迈克尔A.力伯曼, 阿伦J.里登伯格 著(蒲以康 译) 2004 等离子体放电原理与材料处理(北京: 科学出版社)第1−19页
Lieberman M A, Lichtenberg A J(translated by Pu Y K) 2004 Principles of Plasma Discharge and Materials Processing (Beijing: Science Press) pp1−19 (in Chinese)
[2] 帕斯卡 夏伯特 著(王友年 译) 2015 射频等离子体物理学(北京: 科学出版社)第1−15页
Chabert P(translated by Wang Y N) 2015 Physics of Radio-Frequency Plasmas (Beijing: Science Press) pp1−15 (in Chinese)
[3] Xu S, Ostrikov K N, Li Y, Tsakadze E L, Jones I R 2000 Phys. Plasmas 45 20
[4] Saehoon U, Kyong-Ho L, Chang H Y, Chung C W 2004 Phys. Plasmas 11 4830
Google Scholar
[5] Kim J H, Hwang H J, Kim D H, Cho J H, Chung C W 2015 J. Appl. Phys. 117 153302
Google Scholar
[6] 丁振峰, 袁国玉, 高巍, 孙景超 2007 物理学报 57 4304
Ding Z F, Yuan G Y, Gao W, Sun J C 2007 Acta Phys. Sin. 57 4304
[7] 高飞 2011 博士学位论文(大连: 大连理工大学)
Gao F 2011 Ph. D. Dissertation (Dalian: Dalian University of Technology) (in Chinese)
[8] 赵书霞 2011 博士学位论文(大连: 大连理工大学)
Zhao S X 2010 Ph. D. Dissertation (Dalian: Dalian University of Technology) (in Chinese)
[9] Godyak V A, Alexandrovich B M 2004 Phys. Plasmas 11 3553
Google Scholar
[10] Lee H C, Chung C W 2015 Phys. Plasmas 22 053505
Google Scholar
[11] Lee H C, Chung C W 2013 Phys. Plasmas 20 101607
Google Scholar
[12] Jun H S, Chang H Y 2007 Appl. Phys. Lett. 92 041501
[13] Gao F, Zhang Y R, Li H, Liu Y, Wang Y N 2017 Phys. Plasmas 24 073508
Google Scholar
[14] Liu F, Ren C S, Wang Y N, Qi X L, Ma T C 2006 Vacuum 81 221
Google Scholar
[15] Hua Y, Song J, Hao Z Y 2018 Plasma Sci. Technol. 20 065402
Google Scholar
[16] Hua Y, Song J, Hao Z Y, Zhang G L 2018 Plasma Sci. Technol. 20 014005
Google Scholar
[17] 刘耀泽 2016 硕士学位论文(哈尔滨: 哈尔滨工业大学)
Liu Y Z 2016 M. S. Thesis (Harbin: Harbin Institute of Technology) (in Chinese)
[18] 张健 2006 硕士学位论文(大连: 大连理工大学)
Zhang J 2006 M. S. Thesis (Dalian: Dalian University of Technology) (in Chinese)
[19] 齐雪莲 2008 博士学位论文(大连: 大连理工大学)
Qi X L 2008 Ph. D. Dissertation (Dalian: Dalian University of Technology) (in Chinese)
[20] Daltrini A M, Moshkalev S A, Monteiro M J R, Besseler E, Kostryukov A 2007 J. Appl. Phys. 101 073309
Google Scholar
[21] Moshkalev S A, Steen P G, Gomez S, Graham W G 1999 Appl. Phys. Lett. 75 328
Google Scholar
[22] 韩雪 2015 硕士学位论文(哈尔滨: 哈尔滨工业大学)
Han X 2015 M. S. Thesis (Harbin: Harbin Institute of Technology) (in Chinese)
[23] Daltrini A M, Moshkalev S A,Morgan T J 2008 Appl. Phys. Lett. 92 061504
Google Scholar
[24] Zhu X M, Pu Y K 2010 J. Phys. D 43 015204
Google Scholar
[25] Czerwiec T,Graves D B 2004 J. Phys. D 37 2827
Google Scholar
[26] 刘阳 2017 硕士学位论文(大连: 大连理工大学)
Liu Y 2017 M. S. Thesis (Dalian: Dalian University of Technology) (in Chinese)
[27] Li H, Liu Y, Zhang Y R, Gao F, Wang Y N 2017 J. Appl. Phys. 121 23302
Google Scholar
[28] Lee H C, Seo B H, Kwon D C, Kim J H, Seong D J, Oh S J, Chung C W, You K H, Shin C H 2017 Appl. Phys. Lett. 110 014106
Google Scholar
[29] Lee H C 2018 Phys. Plasmas 5 011108
Google Scholar
[30] Lee H C, Lee M H, Chung C W 2010 Appl. Phys. Lett. 96 041503
Google Scholar
[31] Setsuhara Y, Tsukiyama D, Takenaka K 2008 Surface & Coatings Technology 202 5238
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