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The atmospheric pressure dc gliding arc plasma was investigated through its electrical and optical signals. The arc voltages of various gas discharges were compared. The arc voltage, current, power and resistance of a nitrogen gliding arc in one period were studied. Influences of gas type, gas flow rate and external resistor on the gliding arc fluctuation behaviour were studied using FFT spectrum analysis. Increased main oscillation frequency was observed as gas flow rate or external resistance value increased. Furthermore, major radical species in nitrogen, oxygen and air discharges were determined by means of optical emission spectroscopy. Additionally, the effect of external resistor on the relative intensity of radical emission and axial distribution of relative intensity at 337.1 nm (N2(C3Πu→B3Πg), Δv=0) were studied. Experimental results showed that radical emission relative intensity decreases with the increasing of external resistance value. The axial distribution of relative intensity exhibits the tendencies of increasing first and then decreasing. The radical emission relative intensity decreases dramatically out of the plasma area.
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Keywords:
- gliding arc plasma /
- non-thermal plasma /
- fluctuation /
- optical emission spectroscopy
[1] Fridman A, Chirokov A, Gutsol A 2005 J. Phys. D-Appl. Phys. 38 R1
[2] Zhang X H, Huang J, Lu X D, Peng L, Sun Y, Chen W, Feng K C, Yang S Z 2009 Acta Phys. Sin. 58 1595 (in Chinese) [张先徽、黄 骏、刘筱娣、彭 磊、孙 岳、陈 维、冯克成、杨思泽 2009 物理学报 58 1595]
[3] Zhang Y C, Zhu H Y, Wu H Y, Qiu Y P 2009 Acta Phys. Sin. 58 S298 (in Chinese) [张迎晨、朱海燕、吴红艳、邱夷平 2009 物理学报 58 S298]
[4] Sun J, Zhang J L, Wang D Z, Ma T C 2006 Acta Phys. Sin. 55 344 (in Chinese) [孙 姣、张家良、王德真、马腾才 2006 物理学报 55 344]
[5] Liu Y H, Zhang J L, Wang W G, Jian L, Liu D P, Ma T C 2006 Acta Phys. Sin. 55 1458 (in Chinese) [刘艳红、张家良、王卫国、李 建、刘东平、马腾才 2006 物理学报 54 1458]
[6] Fridman A, Nester S, Kennedy L A, Saveliev A, Mutaf-Yardimci O 1999 Prog. Energy Combust. Sci. 25 211
[7] Czernichowski A 1994 Pure Appl. Chem. 66 1301
[8] Benstaali B, Moussa D, Addou A, Brisset J L 1998 Eur. Phys. J.-Appl. Phys. 4 171
[9] Krawczyk K 2006 Przem. Chem. 85 1035
[10] Lin L, Wu B, Yang C, Wu C K 2006 Plasma Sci. Technol. 8 653
[11] Zhao Y H, Ma Q, Xia W D 2008 Plasma Sci. Technol. 10 65
[12] Yu L, Yan J H, Tu X, Li X D, Lu S Y, Cen K F 2008 EPL (Europhysics Letters) 83 45001
[13] Yu L, Li X D, Tu X, Wang Y, Lu S Y, Yan J H 2010 J. Phys. Chem. A 114 360
[14] Tu X, Yu L, Yan J H, Cen K F, Cheron B G 2009 Phys. Plasmas 16 113506
[15] Yan J H, Bo Z, Li X D, Du C M, Cen K F, Cheron B G 2007 Plasma Chem. Plasma Process. 27 115
[16] Kuznetsova I V, Kalashnikov N Y, Gutsol A F, Fridman A A, Kennedy L A 2002 J. Appl. Phys. 92 4231
[17] Delair L, Brisset J L, Cheron B G 2001 High Temp. Mater. Process 5 381
[18] Bo Z, Yan J H, Li X D, Chi Y, Cen K F 2008 J. Hazard. Mater. 155 494
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[1] Fridman A, Chirokov A, Gutsol A 2005 J. Phys. D-Appl. Phys. 38 R1
[2] Zhang X H, Huang J, Lu X D, Peng L, Sun Y, Chen W, Feng K C, Yang S Z 2009 Acta Phys. Sin. 58 1595 (in Chinese) [张先徽、黄 骏、刘筱娣、彭 磊、孙 岳、陈 维、冯克成、杨思泽 2009 物理学报 58 1595]
[3] Zhang Y C, Zhu H Y, Wu H Y, Qiu Y P 2009 Acta Phys. Sin. 58 S298 (in Chinese) [张迎晨、朱海燕、吴红艳、邱夷平 2009 物理学报 58 S298]
[4] Sun J, Zhang J L, Wang D Z, Ma T C 2006 Acta Phys. Sin. 55 344 (in Chinese) [孙 姣、张家良、王德真、马腾才 2006 物理学报 55 344]
[5] Liu Y H, Zhang J L, Wang W G, Jian L, Liu D P, Ma T C 2006 Acta Phys. Sin. 55 1458 (in Chinese) [刘艳红、张家良、王卫国、李 建、刘东平、马腾才 2006 物理学报 54 1458]
[6] Fridman A, Nester S, Kennedy L A, Saveliev A, Mutaf-Yardimci O 1999 Prog. Energy Combust. Sci. 25 211
[7] Czernichowski A 1994 Pure Appl. Chem. 66 1301
[8] Benstaali B, Moussa D, Addou A, Brisset J L 1998 Eur. Phys. J.-Appl. Phys. 4 171
[9] Krawczyk K 2006 Przem. Chem. 85 1035
[10] Lin L, Wu B, Yang C, Wu C K 2006 Plasma Sci. Technol. 8 653
[11] Zhao Y H, Ma Q, Xia W D 2008 Plasma Sci. Technol. 10 65
[12] Yu L, Yan J H, Tu X, Li X D, Lu S Y, Cen K F 2008 EPL (Europhysics Letters) 83 45001
[13] Yu L, Li X D, Tu X, Wang Y, Lu S Y, Yan J H 2010 J. Phys. Chem. A 114 360
[14] Tu X, Yu L, Yan J H, Cen K F, Cheron B G 2009 Phys. Plasmas 16 113506
[15] Yan J H, Bo Z, Li X D, Du C M, Cen K F, Cheron B G 2007 Plasma Chem. Plasma Process. 27 115
[16] Kuznetsova I V, Kalashnikov N Y, Gutsol A F, Fridman A A, Kennedy L A 2002 J. Appl. Phys. 92 4231
[17] Delair L, Brisset J L, Cheron B G 2001 High Temp. Mater. Process 5 381
[18] Bo Z, Yan J H, Li X D, Chi Y, Cen K F 2008 J. Hazard. Mater. 155 494
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