Discharge characteristics and parameter diagnosis of brush-shaped air plasma plumes under auxiliary discharge

Zhang Xue-Xue; Jia Peng-Ying; Ran Jun-Xia; Li Jin-Mao; Sun Huan-Xia; Li Xue-Chen

doi:10.7498/aps.73.20231946

Abstract

Atmospheric pressure plasma jet (APPJ) can produce plasma plumes rich in active species, which has a wide scope of applications. From the perspective of applications, it is one of the hot issues in APPJ research to generate a diffuse plasma plume on a large scale. At present, large-scale plasma plume has been produced by noble working gases, which is more economic and valuable if it is reproduced by air used as the working gas. In this work, an APPJ with an auxiliary discharge is proposed, with which a large-scale air plasma plume with a brush shape is produced. Results indicate that the brush-shaped air plume can exist by changing voltage amplitude (V_p) in a certain range. The length and brightness of the plasma plume increase with V_p increasing. The waveforms of voltage and light emission signalindicate that the discharge can start at most once within half a cycle of applied voltage. The probability of discharge and the intensity of light emission pulse for each half a voltage cycle increase with V_p increasing, but the voltage value at the discharge moment decreases with V_p increasing. High-speed imaging study shows that the generation mechanisms of diffuse brush-shaped air plasma plumes and small-scale air plasma are similar, both originating from the temporal superposition of bifurcated normal flow light. In addition, optical emission spectra from the brush-shaped air plasma plume are utilized to study electron temperature, electron density, molecular vibrational temperature, and gas temperature. With V_p increasing, gas temperature is low and almost unchanged, while electron density, electron temperature, and molecular vibrational temperature increase. In addition, OH concentration of the plasma plume is investigated by laser-induced fluorescence, indicating that OH is uniformly distributed, and its concentration increases with the V_p increasing. All these results mentioned above are qualitatively analyzed.

Keywords:

Authors and contacts

1.
College of Physics Science and Technology, Hebei University, Baoding 071002, China
2.
School of Electrical and Information Engineering, Heilongjiang University of Technology, Jixi 158100, China

Corresponding author: Li Xue-Chen, plasmalab@126.com

Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 12375250, 11875121, 51977057, 11805013), the Natural Science Foundation of Hebei Province, China (Grant Nos. A2023201012, A2020201025, A2022201036), and the Fundamental Research Funds for the Undergraduate Universities in Heilongjiang Province, China (Grant No. 2022-KYYWF-0475).

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References

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Cited By

图 1 实验装置示意图

Figure 1. Schematic diagram of the experimental setup.

DownLoad: Full-Size Img PowerPoint

图 2 曝光时间(t_exp)为0.5 s, 不同V_p下等离子体羽的照片　(a) 9.0 kV; (b) 10.8 kV; (c) 12.4 kV; (d) 14.0 kV

Figure 2. Images of the plasma plume under different V_p with an exposure time (t_exp) of 0.5 s: (a) 9.0 kV; (b) 10.8 kV; (c) 12.4 kV; (d) 14.0 kV.

DownLoad: Full-Size Img PowerPoint

图 3 外加电压和发光信号的波形, (a)—(d)分别对应图2(a)—(d)

Figure 3. Waveforms of applied voltage and light emission signal from the plasma plume, (a)–(d) correspond to Fig. 2(a)-(d), respectively.

DownLoad: Full-Size Img PowerPoint

图 4 (a) V_inc随V_p的变化关系; (b) 平均发光脉冲强度和每半个电压周期内放电概率随V_p的变化关系

Figure 4. (a) V_inc as a function of V_p; (b) average pulse intensity and probability per voltage half cycle as functions of V_p.

DownLoad: Full-Size Img PowerPoint

图 5 不同t_exp下等离子体羽的ICCD图像, V_p为14.0 kV

Figure 5. ICCD images of the plasma plume with varying t_exp, V_p is 14.0 kV.

DownLoad: Full-Size Img PowerPoint

图 6 等离子体羽的总发射光谱

Figure 6. Optical emission spectrum of the plasma plume.

DownLoad: Full-Size Img PowerPoint

图 7 谱线强度比I_{371 nm}/I_{380 nm} (a)与I_{391 nm}/I_{380 nm} (b)随V_p的变化关系

Figure 7. Line intensity ratios of I_{371 nm}/I_{380 nm} (a) and I_{391 nm}/I_{380 nm} (b) as functions of V_p.

DownLoad: Full-Size Img PowerPoint

图 8 T_g (a)和T_v (b)的拟合图, T_g (c)和T_v (d)随V_p 的变化关系

Figure 8. A fitting process to calculate T_g (a) and T_v (b); T_g (c) and T_v (d) as functions of V_p.

DownLoad: Full-Size Img PowerPoint

图 9 不同V_p下等离子体羽的LIF照片　(a) 9.0 kV; (b) 10.8 kV; (c) 12.4 kV; (d) 14.0 kV

Figure 9. Images of laser induced fluorescence under different V_p: (a) 9.0 kV; (b) 10.8 kV; (c) 12.4 kV; (d) 14.0 kV.

DownLoad: Full-Size Img PowerPoint

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[2]	Reuter S, Von Woedtke T, Weltmann K D 2018 J. Phys. D Appl. Phys. 51 233001 Google Scholar
[3]	Li X C, Liu R J, Li X N, Gao K, Wu J C, Gong D D, Jia P Y 2019 Phys. Plasmas 26 023510 Google Scholar
[4]	Chen S L, Cheng T, Chen Z Q, Chen X Y, Zhang G J 2021 Appl. Surf. Sci. 544 148956 Google Scholar
[5]	Jia P Y, Jia H X, Ran J X, Wu K Y, Wu J C, Pang X X, Li X C 2023 Chin. Phys. B 32 085202 Google Scholar
[6]	Gangal U, Exarhos S, Contreras T, Rich C C, Dolan K, Yang V, Frontiera R R, Bruggeman P 2022 Plasma Process. Polym. 19 e2200031 Google Scholar
[7]	Xuan L T Q, Nguyen L N, Dao N T 2021 Nanotechnol. 33 105603
[8]	Ning W, Dai D, Zhang Y H 2019 Appl. Phys. Lett. 114 054104 Google Scholar
[9]	Satale V V, Ganesh V, Dey A, Krishnamurthy S, Bhat S V 2021 Int. J. Hydrogen Energy 46 12715 Google Scholar
[10]	Liu D W, Zhang Y Z, Xu M Y, Chen H X, Lu X P, Ostrikov K K 2020 Plasma Process. Polym. 17 e1900218 Google Scholar
[11]	Xu Z M, Lan Y, Ma J, Shen J, Han W, Hu S H, Ye C B, Xi W H, Zhang Y D, Yang C J, Zhao X, Cheng C 2020 Plasma Sci. Technol. 22 103001 Google Scholar
[12]	Lata S, Chakravorty S, Mitra T, Pradhan P K, Mohanty S, Patel P, Jha E, Panda P K, Verma S K, Suar M 2022 Mater. Today Bio. 13 100200 Google Scholar
[13]	Shashurin A, Keidar M, Bronnikov S, Jurjus R A, Stepp M A 2008 Appl. Phys. Lett. 93 181501 Google Scholar
[14]	Duan Y X, Huang C, Yu Q S 2007 Rev. Sci. Instrum. 78 015104 Google Scholar
[15]	Li X C, Chu J D, Zhang Q, Zhang P P, Jia P Y, Geng J L 2016 Appl. Phys. Lett. 109 204102 Google Scholar
[16]	Li X C, Chu J D, Jia P Y, Li Y R, Wang B, Dong L F 2018 IEEE Trans. Plasma Sci. 46 583 Google Scholar
[17]	Urabe K, Sands B L, Ganguly B N, Sakai O 2012 Plasma Sources Sci. Technol. 21 034004 Google Scholar
[18]	Babaeva N Y, Naidis G V, Tereshonok D V, Zhang C, Huang B D, Shao T 2021 Plasma Sources Sci. Technol. 30 115021 Google Scholar
[19]	Chen J Y, Zhao N, Wu J C, Wu K Y, Zhang F R, Ran J X, Jia P Y, Pang X X, Li X C 2022 Chin. Phys. B 31 065205 Google Scholar
[20]	Lu X P, Jiang Z H, Xiong Q, Tang Z, Hu X, Pan Y 2008 Appl. Phys. Lett. 92 081502 Google Scholar
[21]	Darny T, Bauville G, Fleury M, Pasquiers S, Sousa J S 2021 Plasma Sources Sci. Technol. 30 105021 Google Scholar
[22]	Matsusaka S 2019 Adv. Powder Technol. 30 2851 Google Scholar
[23]	Duan Z C, Li P Z, He F, Han R Y, Ouyang J T 2021 Plasma Sources Sci. Technol. 30 025001 Google Scholar
[24]	Li Q, Li J T, Zhu W C, Zhu X M, Pu Y K 2009 Appl. Phys. Lett. 95 141502 Google Scholar
[25]	Liu Z Y, Xu J G, Zhu X, Liu F, Fang Z 2022 High Volt. 7 771 Google Scholar
[26]	Cao Z, Nie Q, Bayliss D L, Walsh J L, Ren C S, Wang D Z, Kong M G 2010 Plasma Sources Sci. Technol. 19 025003 Google Scholar
[27]	Wang S M, Zhang J L, Li G F, Wang D Z 2014 Vacuum 101 317 Google Scholar
[28]	杨丽君, 宋彩虹, 赵娜, 周帅, 武珈存, 贾鹏英 2021 物理学报 70 155201 Google Scholar Yang L J, Song C H, Zhao N, Zhou S, Wu J C, Jia P Y 2021 Acta Phys. Sin. 70 155201 Google Scholar
[29]	Li Q, Takana H, Pu Y K, Nishiyama H 2011 Appl. Phys. Lett. 98 241501 Google Scholar
[30]	Li Q, Takana H, Pu Y K, Nishiyama H 2012 Appl. Phys. Lett. 100 133501 Google Scholar
[31]	Li X C, Chu J D, Zhang Q, Zhang P P, Jia P Y, Dong L F 2018 Phys. Plasmas 25 043519 Google Scholar
[32]	Tang J, Cao W Q, Zhao W, Wang Y S, Duan Y X 2012 Phys. Plasmas 19 013501 Google Scholar
[33]	Wu K Y, Liu J N, Wu J C, Chen M, Ran J X, Pang X X, Jia P Y, Li X C, Ren C H 2023 High Volt. 8 1161 Google Scholar
[34]	Kolb J F, Mohamed A A H, Price R O, Swanson R J, Bowman A, Chiavarini R L, Stacey M, Schoenbach K H 2008 Appl. Phys. Lett. 92 241501 Google Scholar
[35]	Wu S Q, Liu X Y, Mao W H, Chen W, Liu C, Zhang C H 2018 J. Appl. Phys. 124 243302 Google Scholar
[36]	Liu K, Zhang X H, Zhou X F, Huo X M, Wang X H, Ostrikov K K 2022 J. Phys. D Appl. Phys. 55 485202 Google Scholar
[37]	Liu K, Hu H, Lei J, Hu Y, Zheng Z 2016 Phys. Plasmas 23 123510 Google Scholar
[38]	Lu X P, Liu D W, Xian Y B, Nie L L, Cao Y G, He G Y 2021 Phys. Plasmas 28 100501 Google Scholar
[39]	Yang Y W, Wu J Y, Chiang M H, Wu J S 2012 IEEE Trans. Plasma Sci. 40 3003 Google Scholar
[40]	Li X C, Wu J C, Jia B Y, Wu K Y, Kang P C, Zhang F R, Zhao N, Jia P Y, Wang L, Li S Z 2020 Appl. Phys. Lett. 117 134102 Google Scholar
[41]	Li X C, Bao W T, Chu J D, Zhang P P, Jia P Y 2015 Plasma Sources Sci. Technol. 24 065020 Google Scholar
[42]	Li X C, Wu K Y, Liu R J, Yang L W, Geng J L, Wang B, Jia P Y 2019 IEEE Trans. Plasma Sci. 47 1330 Google Scholar
[43]	Li Z, Liu J, Lu X 2020 Plasma Sources Sci. Technol. 29 045015 Google Scholar
[44]	Wu J C, Jia P Y, Ran J X, Chen J Y, Zhang F R, Wu K Y, Zhao N, Ren C H, Yin Z Q, Li X C 2021 Phys. Plasmas 28 073501 Google Scholar
[45]	卢新培, 吴帆, 李嘉胤 2021 高电压技术 47 1831 Google Scholar Lu X P, Wu F, Li J Y 2021 High Voltage Eng. 47 1831 Google Scholar
[46]	Jiang J K, Gonzalvo Y A, Bruggeman P J 2020 Plasma Sources Sci. Technol. 29 045023 Google Scholar
[47]	Darny T, Pouvesle J M, Fontane J, Joly L, Dozias S, Robert E 2017 Plasma Sources Sci. Technol. 26 105001 Google Scholar
[48]	Lichten W 1957 J. Chem. Phys. 26 306 Google Scholar
[49]	Akishev Y, Aponin G, Petryakov A, Trushkin N 2018 J. Phys. D Appl. Phys. 51 274006 Google Scholar
[50]	Yuri R P 1991 Gas Discharge Physics (New York: Springer-Verlag) pp53–60
[51]	Lu X P, Laroussi M 2006 J. Appl. Phys. 100 063302 Google Scholar
[52]	Wu J C, Li X C, Ran J X, Jia H X, Wu K Y, Han G X, Liu J N, Chen J Y, Pang X X, Jia P Y 2023 Plasma Process. Polym. 20 e2200188 Google Scholar
[53]	Wu K Y, Zhao N, Niu Q M, Wu J C, Zhou S, Jia P Y, Li X C 2022 Plasma Sci. Technol. 24 055405 Google Scholar
[54]	Belmonte T, Noël C, Gries T, Martin J, Henrion G 2015 Plasma Sources Sci. Technol. 24 064003 Google Scholar
[55]	Li X C, Zhou S, Gao K, Ran J X, Wu K Y, Jia P Y 2022 IEEE Trans. Plasma Sci. 50 1717 Google Scholar
[56]	Ran J X, Zhang X X, Zhang Y, Wu K Y, Zhao N, He X R, Dai X H, Liang Q H, Li X C 2023 Plasma Sci. Technol. 25 055403 Google Scholar
[57]	Masoud N, Martus K, Figus M, Becker K 2005 Contrib. Plasma Phys. 45 32 Google Scholar
[58]	Yue Y F, Wu F, Cheng H, Xian Y B, Liu D W, Lu X P, Pei X K 2017 J. Appl. Phys. 121 033302 Google Scholar

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Vol. 73, Issue 8 - 2024-04-20

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