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Atmospheric pressure plasma jet (APPJ) can produce plasma plumes rich in active species, which has a wide scope of applications. From the perspective of applications, it is one of the hot issues in APPJ research to generate a diffuse plasma plume on a large scale. At present, large-scale plasma plume has been produced by noble working gases, which is more economic and valuable if it is reproduced by air used as the working gas. In this work, an APPJ with an auxiliary discharge is proposed, with which a large-scale air plasma plume with a brush shape is produced. Results indicate that the brush-shaped air plume can exist by changing voltage amplitude (Vp) in a certain range. The length and brightness of the plasma plume increase with Vp increasing. The waveforms of voltage and light emission signalindicate that the discharge can start at most once within half a cycle of applied voltage. The probability of discharge and the intensity of light emission pulse for each half a voltage cycle increase with Vp increasing, but the voltage value at the discharge moment decreases with Vp increasing. High-speed imaging study shows that the generation mechanisms of diffuse brush-shaped air plasma plumes and small-scale air plasma are similar, both originating from the temporal superposition of bifurcated normal flow light. In addition, optical emission spectra from the brush-shaped air plasma plume are utilized to study electron temperature, electron density, molecular vibrational temperature, and gas temperature. With Vp increasing, gas temperature is low and almost unchanged, while electron density, electron temperature, and molecular vibrational temperature increase. In addition, OH concentration of the plasma plume is investigated by laser-induced fluorescence, indicating that OH is uniformly distributed, and its concentration increases with the Vp increasing. All these results mentioned above are qualitatively analyzed.
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Keywords:
- plasma jet /
- air plasma plume /
- optical emission spectrum /
- plasma parameters
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Google Scholar
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Google Scholar
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Google Scholar
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Google Scholar
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[1] Naidis G V, Sosnin E A, Panarin V A, Skakun V S, Tarasenko V F 2016 IEEE Trans. Plasma Sci. 44 3249
Google Scholar
[2] Reuter S, Von Woedtke T, Weltmann K D 2018 J. Phys. D Appl. Phys. 51 233001
Google Scholar
[3] Li X C, Liu R J, Li X N, Gao K, Wu J C, Gong D D, Jia P Y 2019 Phys. Plasmas 26 023510
Google Scholar
[4] Chen S L, Cheng T, Chen Z Q, Chen X Y, Zhang G J 2021 Appl. Surf. Sci. 544 148956
Google Scholar
[5] Jia P Y, Jia H X, Ran J X, Wu K Y, Wu J C, Pang X X, Li X C 2023 Chin. Phys. B 32 085202
Google Scholar
[6] Gangal U, Exarhos S, Contreras T, Rich C C, Dolan K, Yang V, Frontiera R R, Bruggeman P 2022 Plasma Process. Polym. 19 e2200031
Google Scholar
[7] Xuan L T Q, Nguyen L N, Dao N T 2021 Nanotechnol. 33 105603
[8] Ning W, Dai D, Zhang Y H 2019 Appl. Phys. Lett. 114 054104
Google Scholar
[9] Satale V V, Ganesh V, Dey A, Krishnamurthy S, Bhat S V 2021 Int. J. Hydrogen Energy 46 12715
Google Scholar
[10] Liu D W, Zhang Y Z, Xu M Y, Chen H X, Lu X P, Ostrikov K K 2020 Plasma Process. Polym. 17 e1900218
Google Scholar
[11] Xu Z M, Lan Y, Ma J, Shen J, Han W, Hu S H, Ye C B, Xi W H, Zhang Y D, Yang C J, Zhao X, Cheng C 2020 Plasma Sci. Technol. 22 103001
Google Scholar
[12] Lata S, Chakravorty S, Mitra T, Pradhan P K, Mohanty S, Patel P, Jha E, Panda P K, Verma S K, Suar M 2022 Mater. Today Bio. 13 100200
Google Scholar
[13] Shashurin A, Keidar M, Bronnikov S, Jurjus R A, Stepp M A 2008 Appl. Phys. Lett. 93 181501
Google Scholar
[14] Duan Y X, Huang C, Yu Q S 2007 Rev. Sci. Instrum. 78 015104
Google Scholar
[15] Li X C, Chu J D, Zhang Q, Zhang P P, Jia P Y, Geng J L 2016 Appl. Phys. Lett. 109 204102
Google Scholar
[16] Li X C, Chu J D, Jia P Y, Li Y R, Wang B, Dong L F 2018 IEEE Trans. Plasma Sci. 46 583
Google Scholar
[17] Urabe K, Sands B L, Ganguly B N, Sakai O 2012 Plasma Sources Sci. Technol. 21 034004
Google Scholar
[18] Babaeva N Y, Naidis G V, Tereshonok D V, Zhang C, Huang B D, Shao T 2021 Plasma Sources Sci. Technol. 30 115021
Google Scholar
[19] Chen J Y, Zhao N, Wu J C, Wu K Y, Zhang F R, Ran J X, Jia P Y, Pang X X, Li X C 2022 Chin. Phys. B 31 065205
Google Scholar
[20] Lu X P, Jiang Z H, Xiong Q, Tang Z, Hu X, Pan Y 2008 Appl. Phys. Lett. 92 081502
Google Scholar
[21] Darny T, Bauville G, Fleury M, Pasquiers S, Sousa J S 2021 Plasma Sources Sci. Technol. 30 105021
Google Scholar
[22] Matsusaka S 2019 Adv. Powder Technol. 30 2851
Google Scholar
[23] Duan Z C, Li P Z, He F, Han R Y, Ouyang J T 2021 Plasma Sources Sci. Technol. 30 025001
Google Scholar
[24] Li Q, Li J T, Zhu W C, Zhu X M, Pu Y K 2009 Appl. Phys. Lett. 95 141502
Google Scholar
[25] Liu Z Y, Xu J G, Zhu X, Liu F, Fang Z 2022 High Volt. 7 771
Google Scholar
[26] Cao Z, Nie Q, Bayliss D L, Walsh J L, Ren C S, Wang D Z, Kong M G 2010 Plasma Sources Sci. Technol. 19 025003
Google Scholar
[27] Wang S M, Zhang J L, Li G F, Wang D Z 2014 Vacuum 101 317
Google Scholar
[28] 杨丽君, 宋彩虹, 赵娜, 周帅, 武珈存, 贾鹏英 2021 物理学报 70 155201
Google Scholar
Yang L J, Song C H, Zhao N, Zhou S, Wu J C, Jia P Y 2021 Acta Phys. Sin. 70 155201
Google Scholar
[29] Li Q, Takana H, Pu Y K, Nishiyama H 2011 Appl. Phys. Lett. 98 241501
Google Scholar
[30] Li Q, Takana H, Pu Y K, Nishiyama H 2012 Appl. Phys. Lett. 100 133501
Google Scholar
[31] Li X C, Chu J D, Zhang Q, Zhang P P, Jia P Y, Dong L F 2018 Phys. Plasmas 25 043519
Google Scholar
[32] Tang J, Cao W Q, Zhao W, Wang Y S, Duan Y X 2012 Phys. Plasmas 19 013501
Google Scholar
[33] Wu K Y, Liu J N, Wu J C, Chen M, Ran J X, Pang X X, Jia P Y, Li X C, Ren C H 2023 High Volt. 8 1161
Google Scholar
[34] Kolb J F, Mohamed A A H, Price R O, Swanson R J, Bowman A, Chiavarini R L, Stacey M, Schoenbach K H 2008 Appl. Phys. Lett. 92 241501
Google Scholar
[35] Wu S Q, Liu X Y, Mao W H, Chen W, Liu C, Zhang C H 2018 J. Appl. Phys. 124 243302
Google Scholar
[36] Liu K, Zhang X H, Zhou X F, Huo X M, Wang X H, Ostrikov K K 2022 J. Phys. D Appl. Phys. 55 485202
Google Scholar
[37] Liu K, Hu H, Lei J, Hu Y, Zheng Z 2016 Phys. Plasmas 23 123510
Google Scholar
[38] Lu X P, Liu D W, Xian Y B, Nie L L, Cao Y G, He G Y 2021 Phys. Plasmas 28 100501
Google Scholar
[39] Yang Y W, Wu J Y, Chiang M H, Wu J S 2012 IEEE Trans. Plasma Sci. 40 3003
Google Scholar
[40] Li X C, Wu J C, Jia B Y, Wu K Y, Kang P C, Zhang F R, Zhao N, Jia P Y, Wang L, Li S Z 2020 Appl. Phys. Lett. 117 134102
Google Scholar
[41] Li X C, Bao W T, Chu J D, Zhang P P, Jia P Y 2015 Plasma Sources Sci. Technol. 24 065020
Google Scholar
[42] Li X C, Wu K Y, Liu R J, Yang L W, Geng J L, Wang B, Jia P Y 2019 IEEE Trans. Plasma Sci. 47 1330
Google Scholar
[43] Li Z, Liu J, Lu X 2020 Plasma Sources Sci. Technol. 29 045015
Google Scholar
[44] Wu J C, Jia P Y, Ran J X, Chen J Y, Zhang F R, Wu K Y, Zhao N, Ren C H, Yin Z Q, Li X C 2021 Phys. Plasmas 28 073501
Google Scholar
[45] 卢新培, 吴帆, 李嘉胤 2021 高电压技术 47 1831
Google Scholar
Lu X P, Wu F, Li J Y 2021 High Voltage Eng. 47 1831
Google Scholar
[46] Jiang J K, Gonzalvo Y A, Bruggeman P J 2020 Plasma Sources Sci. Technol. 29 045023
Google Scholar
[47] Darny T, Pouvesle J M, Fontane J, Joly L, Dozias S, Robert E 2017 Plasma Sources Sci. Technol. 26 105001
Google Scholar
[48] Lichten W 1957 J. Chem. Phys. 26 306
Google Scholar
[49] Akishev Y, Aponin G, Petryakov A, Trushkin N 2018 J. Phys. D Appl. Phys. 51 274006
Google Scholar
[50] Yuri R P 1991 Gas Discharge Physics (New York: Springer-Verlag) pp53–60
[51] Lu X P, Laroussi M 2006 J. Appl. Phys. 100 063302
Google Scholar
[52] Wu J C, Li X C, Ran J X, Jia H X, Wu K Y, Han G X, Liu J N, Chen J Y, Pang X X, Jia P Y 2023 Plasma Process. Polym. 20 e2200188
Google Scholar
[53] Wu K Y, Zhao N, Niu Q M, Wu J C, Zhou S, Jia P Y, Li X C 2022 Plasma Sci. Technol. 24 055405
Google Scholar
[54] Belmonte T, Noël C, Gries T, Martin J, Henrion G 2015 Plasma Sources Sci. Technol. 24 064003
Google Scholar
[55] Li X C, Zhou S, Gao K, Ran J X, Wu K Y, Jia P Y 2022 IEEE Trans. Plasma Sci. 50 1717
Google Scholar
[56] Ran J X, Zhang X X, Zhang Y, Wu K Y, Zhao N, He X R, Dai X H, Liang Q H, Li X C 2023 Plasma Sci. Technol. 25 055403
Google Scholar
[57] Masoud N, Martus K, Figus M, Becker K 2005 Contrib. Plasma Phys. 45 32
Google Scholar
[58] Yue Y F, Wu F, Cheng H, Xian Y B, Liu D W, Lu X P, Pei X K 2017 J. Appl. Phys. 121 033302
Google Scholar
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