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Electric phenomena and magnetic phenomena are inseparable. The magnetic field affects the ionization balance and spatial distribution of the plasma. A new type of plasma discharges has been found in nitrogen gas under sub atmospheric pressure condition without external magnetic field. Because of its regular helical propagation pattern, it is called helical plasma (HP) plume. Although a great deal of research has been carried out on the key characteristics of the HP plume, the formation mechanism of it remains unclear, which affects its applications in materials and nanotechnology. By applying magnetic field to HP with different chirality, the regulation behavior of the external magnetic field on HP is studied. It is found that the external magnetic field will make the HP shrink or stretch. With the magnetic field intensity increasing from 0 mT to 200 mT, the left-handed HP plume stretches under the magnetic field of S-pole. Conversely, the left-handed chiral HP plume contracts when the magnetic pole changes to N-pole. However, when the chirality of HP plume is changed to being right-handed by adjusting voltage, phenomenon opposite to the previous one is observed. Moreover, the applied magnetic field also affects the divergence of HP. With the increase of S-pole external magnetic field, the HP plume stretches until the external magnetic field reaches to 80 mT. When the magnetic field intensity is 80 mT, the HP disappears. The plasma in the quartz tube appears in the divergent form. With the magnetic field intensity increasing to 160 mT, the plasma in the form of a helix appears again. Finally, in the process of changing the intensity of the magnetic field, the clarity of the HP plume will also change. The radial electric field of HP is calculated by electromagnetic wave theory, and the mechanism of the influence of external magnetic field on the behavior of HP is clarified. It is found that the magnetic field force component of Lorentz force is responsible for the external magnetic field regulating the HP behavior. This study lays a theoretical foundation for understanding the motion behavior of HP, which is conducive to the practical applications in the field of materials and nanotechnology. -
Keywords:
- atmosphere pressure plasma /
- plasma jet /
- nonequilibrium plasma /
- electrohydrodynamic
[1] Cheng H, Luo J, Song K, Zhao F, Liu D, Nie L, Lu X 2022 Phys. Plasmas 29 063506Google Scholar
[2] Luo J, Nie L, Liu D, Lu X 2022 Plasma Processes Polym. 19 e2200181Google Scholar
[3] Guo D, Yu D, Zhang P, Song W, Zhang B, Peng K 2021 Surf. Coat. Tech. 415 127129Google Scholar
[4] Baniya H B, Guragain R P, Subedi D P 2021 Progress in Adhesion and Adhesives (Hoboken: Wiley Scrivener Publishing LLC) p841
[5] Meyyappan M 2011 J. Phys. D: Appl. Phy. 44 174002Google Scholar
[6] Morabit Y, Hasan M I, Whalley R D, Robert E, Modic M, Walsh J L 2021 Eur. Phys. J. D 75 1Google Scholar
[7] Lin L, Keidar M 2021 Appl. Phys. Rev. 8 011306Google Scholar
[8] Adhikari B C, Lamichhane P, Lim J S, Nguyen L N, Choi E H 2021 Results Phys. 30 104863Google Scholar
[9] Chen Z, Obenchain R, Wirz R E 2021 Processes 9 249Google Scholar
[10] Douat C, Escot Bocanegra P, Dozias S, Robert É, Motterlini R 2021 Plasma Processes Polym. 18 2100069Google Scholar
[11] Liu C, Hung C W, Cheng I C, Hsu C C, Cheng I C, Chen J Z 2021 Polymers 13 3585Google Scholar
[12] Park J Y, Kim G H, Kim J D, Koh H S, Lee D C 1998 Combust. Sci. Technol. 133 65Google Scholar
[13] Ferreira J L, Monteiro K M F P, Damasio H J, Kostov K G 1998 Combust. Sci. Technol. 140 1Google Scholar
[14] Moon J D, Lee G T, Chung S H 1999 IEEE T. Ind. Appl. 35 1198Google Scholar
[15] Pekárek S 2010 Eur. Phys. J. D 56 91Google Scholar
[16] Sternberg N, Godyak V, Hoffman D 2006 Phys. Plasmas 13 063511Google Scholar
[17] Kharzeev D E, Yee H U 2011 Phys. Rev. D 83 1451Google Scholar
[18] Zou D, Cao X, Lu X, Ostrikov K 2015 Phys. Plasmas 22 103517Google Scholar
[19] Nie L, Liu F, Zhou X, Lu X, Xian Y 2018 Phys. Plasmas 25 053507Google Scholar
[20] Liu F, Li J, Wu F, Nie L, Lu X 2018 J. Phys. D: Appl. Phys. 51 294003Google Scholar
[21] Li L, Liang W, Yang L, Cao F, Sun K, Ban C, Cui J 2022 Int. J. Metalcast. 17 399Google Scholar
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图 2 施加电压为3.5 kV时, 左手性HP在不同极性和磁场强度下的照片 (a) S极磁场下左手性HP出现拉伸现象; (b) N极磁场下左手性HP出现收缩现象
Figure 2. Photographs of the left-handedness chiral HP plume at different polarity and intensity of the magnetic field at the applied voltage is 3.5 kV: (a) Contraction photographs of the left-handedness chiral HP plume at S-pole; (b) stretching photographs of the left-handedness chiral HP plume at N-pole.
图 3 施加电压为3.8 kV时, 右手性HP在不同极性和磁场强度下的照片 (a) S极磁场下右手性HP出现收缩现象; (b) N极磁场下右手性HP出现拉伸现象
Figure 3. Photographs of the right-handedness chiral HP plume at different polarity and intensity of the magnetic field at the applied voltage is 3.8 kV: (a) Contraction photographs of the right-handedness chiral HP plume at S-pole; (b) stretching photographs of the right-handedness chiral HP plume at N-pole.
表 1 外加磁场对HP拉伸和收缩影响的实验结果
Table 1. Effect of external magnetic field on the stretch and contraction of HP.
等离子体手性 S极 N极 左手性 拉伸 收缩 右手性 收缩 拉伸 -
[1] Cheng H, Luo J, Song K, Zhao F, Liu D, Nie L, Lu X 2022 Phys. Plasmas 29 063506Google Scholar
[2] Luo J, Nie L, Liu D, Lu X 2022 Plasma Processes Polym. 19 e2200181Google Scholar
[3] Guo D, Yu D, Zhang P, Song W, Zhang B, Peng K 2021 Surf. Coat. Tech. 415 127129Google Scholar
[4] Baniya H B, Guragain R P, Subedi D P 2021 Progress in Adhesion and Adhesives (Hoboken: Wiley Scrivener Publishing LLC) p841
[5] Meyyappan M 2011 J. Phys. D: Appl. Phy. 44 174002Google Scholar
[6] Morabit Y, Hasan M I, Whalley R D, Robert E, Modic M, Walsh J L 2021 Eur. Phys. J. D 75 1Google Scholar
[7] Lin L, Keidar M 2021 Appl. Phys. Rev. 8 011306Google Scholar
[8] Adhikari B C, Lamichhane P, Lim J S, Nguyen L N, Choi E H 2021 Results Phys. 30 104863Google Scholar
[9] Chen Z, Obenchain R, Wirz R E 2021 Processes 9 249Google Scholar
[10] Douat C, Escot Bocanegra P, Dozias S, Robert É, Motterlini R 2021 Plasma Processes Polym. 18 2100069Google Scholar
[11] Liu C, Hung C W, Cheng I C, Hsu C C, Cheng I C, Chen J Z 2021 Polymers 13 3585Google Scholar
[12] Park J Y, Kim G H, Kim J D, Koh H S, Lee D C 1998 Combust. Sci. Technol. 133 65Google Scholar
[13] Ferreira J L, Monteiro K M F P, Damasio H J, Kostov K G 1998 Combust. Sci. Technol. 140 1Google Scholar
[14] Moon J D, Lee G T, Chung S H 1999 IEEE T. Ind. Appl. 35 1198Google Scholar
[15] Pekárek S 2010 Eur. Phys. J. D 56 91Google Scholar
[16] Sternberg N, Godyak V, Hoffman D 2006 Phys. Plasmas 13 063511Google Scholar
[17] Kharzeev D E, Yee H U 2011 Phys. Rev. D 83 1451Google Scholar
[18] Zou D, Cao X, Lu X, Ostrikov K 2015 Phys. Plasmas 22 103517Google Scholar
[19] Nie L, Liu F, Zhou X, Lu X, Xian Y 2018 Phys. Plasmas 25 053507Google Scholar
[20] Liu F, Li J, Wu F, Nie L, Lu X 2018 J. Phys. D: Appl. Phys. 51 294003Google Scholar
[21] Li L, Liang W, Yang L, Cao F, Sun K, Ban C, Cui J 2022 Int. J. Metalcast. 17 399Google Scholar
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