Formation and evolution of striation plasma in high-pressure argon glow discharge

Zhu Hai-Long; Shi Yu-Jun; Wang Jia-Wei; Zhang Zhi-Ling; Gao Yi-Ning; Zhang Feng-Bo

doi:10.7498/aps.71.20212394

Abstract

The self-organized striation phenomenon in the positive column region of glow discharge plasma is a basic problem in gas discharge physics, which involves rich physics such as electron dynamics, transport process, discharge instability and nonlinear phenomenon. It is an important topic in basic physics and practical application. In this work an argon glow discharge striation plasma at high pressure is reported. The electrical, optical and ionization wave propagation characteristics of the striation plasma, and the evolution of the striation plasma with pressure and impurity gas are investigated experimentally. The generation and quenching mechanism of argon striation plasma are analyzed. The results show that the striation length is about 1.5 mm, and decreases with pressure increasing, and the velocity and frequency of the ionization wave are estimated at 1.87 m/s and 1.25 kHz, respectively. The measurement of optical emission spectrum shows that the generation of striation plasma is probably related to the argon metastable atoms. The stepwise ionization process caused by metastable atoms triggers off an ionization instability. The instability propagates in the form of ionization wave, which leads the plasma parameters to be modulated longitudinally, thus, forming an alternating bright and dark striation plasma. The adding of nitrogen can effectively quench metastable argon atoms and change the electron energy distribution function, which destroys the instability conditions of the plasma, therefore, the striation plasma disappears. This work provides a new insight into the understanding of the formation and annihilation mechanism of glow discharge striation plasma at high pressure.

Keywords:

Authors and contacts

College of Physics and Electronic Engineering, Shanxi University, Taiyuan 030006, China

Corresponding author: Zhu Hai-Long, zhuhl@sxu.edu.cn

Funds: Project supported by the National Natural Science Foundation of China (Grant No. 11875039).

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References

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Cited By

图 1 几种典型的辉纹　(a) 250 Pa下的氩气辉纹^[8]; (b) 133 Pa下的氮气辉纹^[9]; (c) 18 kPa下的氦气辉纹; (d) 38 kPa下的氩气辉纹

Figure 1. Several typical striations: (a) Argon striation at 250 Pa; (b) nitrogen striation at 133 Pa; (c) helium striation at 18 kPa; (d) argon striation at 38 kPa.

DownLoad: Full-Size Img PowerPoint

图 2 实验装置示意图

Figure 2. Schematic diagram of the experimental setup.

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图 3 (a) 氩气辉纹放电图像, 电极间距为10 mm, 气压为21.22 kPa, 曝光时间为1/200 s; (b) 辉纹边缘检测图像; (c) 辉纹灰度值分布

Figure 3. (a) Typical image of argon striation plasmas in electrode spacing of 10 mm and gas pressure of 21.22 kPa, within exposure time of 1/200 s; (b) image edge detection of striation; (c) gray distribution of striation plasmas.

DownLoad: Full-Size Img PowerPoint

图 4 放电电压和电流波形

Figure 4. Typical waveforms of discharge voltage and discharge current

DownLoad: Full-Size Img PowerPoint

图 5 2级明纹的发射光谱

Figure 5. Optical emission spectroscopy of 2^nd bright striation.

DownLoad: Full-Size Img PowerPoint

图 6 氩激发态能级图

Figure 6. Energy-level diagram for argon excited states.

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图 7 各级明暗条纹的发射强度

Figure 7. Emission intensity of bright and dark striations.

DownLoad: Full-Size Img PowerPoint

图 8 辉纹随气压的形态演化　(a) 28.54 kPa; (b) 32.84 kPa; (c) 37.62 kPa; (d) 42.51 kPa

Figure 8. Evolution of striations with pressure: (a) 28.54 kPa; (b) 32.84 kPa; (c) 37.62 kPa; (d) 42.51 kPa.

DownLoad: Full-Size Img PowerPoint

图 9 加入氮气对辉纹的影响　(a) 23.17 kPa; (b) 23.26 kPa; (c) 23.37 kPa; (d) 23.64 kPa

Figure 9. Effect of nitrogen gas addition to striations at different pressure: (a) 23.17 kPa; (b) 23.26 kPa; (c) 23.37 kPa; (d) 23.64 kPa.

DownLoad: Full-Size Img PowerPoint

图 10 加入氮气对主要发射线696.543 nm的影响　(a) 23.17 kPa; (b) 23.26 kPa; (c) 23.37 kPa; (d) 23.64 kPa

Figure 10. Effect of nitrogen gas addition to dominant emission of 696.543 nm: (a) 23.17 kPa; (b) 23.26 kPa; (c) 23.37 kPa; (d) 23.64 kPa.

DownLoad: Full-Size Img PowerPoint

表 1 几种典型气体的电离波特征^[30,39]

Table 1. Ionization wave characteristics of typical gases ^[30,39].

放电气体气压/kPa 电离波速度/(m·s^–1) 电离波频率/kHz

氩气 20.59 1.87 1.25
氦气 21.22 20.78 5.20
氮气 100.00 330.00 38.00

DownLoad: CSV

[1]	Bogaerts A 1999 J. Anal. At. Spectrom. 14 1375 Google Scholar
[2]	Kiselev A S, Menshchikova V V, Seyfulina N A, Smirnov E A 2019 J. Phys. Conf. Ser. 1313 012030 Google Scholar
[3]	Long L, Zhou W X, Tang J F, Zhou D S 2020 Plasma Process. Polym. 17 1900242 Google Scholar
[4]	Ezhovskii Y K, Mikhailovskii S V 2019 Russ. Microelectron. 48 229 Google Scholar
[5]	Raizer Y P 1991 Gas Discharge Physics (Berlin: Springer) p230
[6]	Kolobov V I 2006 J. Phys. D Appl. Phys. 39 R487 Google Scholar
[7]	Pollard W, Suzuki P, Staack D 2014 IEEE Trans. Plasma Sci. 42 2650 Google Scholar
[8]	Mulders H C J, Brok W J M, Stoffels W W 2008 IEEE Trans. Plasma Sci. 36 1380 Google Scholar
[9]	Mahamud R, Farouk T, Kolobov V 2017 The 44th International Conference on Plasma Science Atlantic City, American, May 21–24, 2017
[10]	Lisovskiy V A, Koval V A, Artushenko E P, Yegorenkov V D 2012 V Eur. J. Phys. 33 1537
[11]	Keys D A, Heard J F 1930 Nature 125 971 Google Scholar
[12]	Tsendin L D 2009 Plasma Sources Sci. Technol. 18 014020 Google Scholar
[13]	Novák M 1960 Czech. J. Phys. B 10 954 Google Scholar
[14]	Zhu W Y, Cui R L, He F, Wang Y Q, Ouyang J T 2021 Phys. Plasmas 28 113502 Google Scholar
[15]	Levko D 2021 Phys. Plasmas 28 013506 Google Scholar
[16]	Golubovskii Y B, Nekuchaev V O, Skoblo A Y 2014 Tech. Phys. 59 1787 Google Scholar
[17]	Golubovskii Y, Gurkova T, Valin S 2021 Plasma Sources Sci. Technol. 30 115001 Google Scholar
[18]	Godyak V A, Alexandrovich B M, Kolobov V I 2019 Phys. Plasmas 26 033504 Google Scholar
[19]	王建龙, 丁芳, 朱晓东 2015 物理学报 64 045206 Google Scholar Wang J L, Ding F, Zhu X D 2015 Acta Phys. Sin. 64 045206 Google Scholar
[20]	Shkurenkov I A, Mankelevich Y A, Rakhimova T V 2009 Phys. Rev. E 79 046406 Google Scholar
[21]	Golubovskii Y, Valin S, Pelyukhova E, Nekuchaev V 2019 Plasma Sources Sci. Technol. 28 45015 Google Scholar
[22]	Golubovskii Y B, Siasko A V, Kalanov D V, Nekuchaev V O 2018 Plasma Sources Sci. Technol. 27 085009 Google Scholar
[23]	Hodgman S S, Dall R G, Byron L J, Baldwin K G H, Buckman S J, Truscott A G 2009 Phys. Rev. Lett. 103 053002 Google Scholar
[24]	Johnston P D, 1971 Phys. Lett. A 34 389
[25]	Siefert N S, Sands B L, Ganguly B N 2006 Appl. Phys. Lett. 89 011502 Google Scholar
[26]	Yamada H, Kato S, Shimizu T, Fujiwara M, Fujiwara Y, Kim J, Ikehara S, Shimizu N, Ikehara Y, Sakakita H 2020 Phys. Plasmas 27 022107 Google Scholar
[27]	Morgan W L, Childs M W 2015 Plasma Sources Sci. Technol. 24 55022 Google Scholar
[28]	Liu Y X, Schüngel E, Korolov I, Donkó Z, Wang Y N, Schulze J 2016 Phys. Rev. Lett. 116 255002 Google Scholar
[29]	Iza F, Hopwood J A 2005 IEEE Trans. Plasma Sci. 33 306 Google Scholar
[30]	Zhu H, Su Z, Dong Y 2017 Appl. Phys. Lett. 111 054104 Google Scholar
[31]	Golubovskii Yu B, Siasko A V, Nekuchaev V O 2020 Plasma Sources Sci. Technol. 29 065020 Google Scholar
[32]	Kabouzi Y, Calzada M D, Moisan M, Tran K C, Trassy C 2002 J. Appl. Phys. 91 1008 Google Scholar
[33]	Czerwiec T, Graves D B 2004 J. Phys. D: Appl. Phys. 37 2827 Google Scholar
[34]	Kawamura E, Lieberman M A, Lichtenberg A J 2019 Phys. Plasmas 26 093506 Google Scholar
[35]	Kawamura E, Lieberman M A, Lichtenberg A J 2016 Plasma Sources Sci. Technol. 25 054009 Google Scholar
[36]	格兰特著 (马腾才, 秦运文译) 等离子体物理基础 (北京: 原子能出版社) 第258 —265页 Голант В Е(translated by Ma T C, Qin Y W) 1983 Fundamentals of Plasma Physics (Beijing: Atomic Energy Press) pp258–265 (in Chinese)
[37]	Böhle A, Ivanov O, Kolisko A, Kortshagen U, Schlüter H, Vikharev A 1996 J. Phys. D: Appl. Phys. 29 369 Google Scholar
[38]	Dyatko N A, Ionikh Y Z, Kochetov I V, Marinov D L, Meshchanov A V, Napartovich A P, Petrov F B, Starostin S A 2008 J. Phys. D. Appl. Phys. 41 055204 Google Scholar
[39]	Hong Y C, Uhm H S, Yi W J 2008 Appl. Phys. Lett. 93 051504 Google Scholar
[40]	Masoud N, Martus K, Becker K 2005 J. Phys. D: Appl. Phys. 38 1674 Google Scholar
[41]	Liu K, Xia H T, Yang M H, Geng W Q, Zuo J, Ostrikov K 2022 Vacuum 198 110901 Google Scholar
[42]	Tvarog D, Olejníček J, Kratochvíl J, Kšírová P, Poruba A, Hubička Z, Čada M 2021 J. Appl. Phys. 130 013301 Google Scholar
[43]	Kang N, Gaboriau F, Oh S, Ricard A 2011 Plasma Sources Sci. Technol. 20 045015 Google Scholar
[44]	Hayashi M 1982 J. Phys. D: Appl. Phys. 15 1411 Google Scholar
[45]	Petrov G M, Boris D R, Petrova T B, Lock E H, Fernsler R F, Walton S G 2013 Plasma Sources Sci. Technol. 22 065005 Google Scholar

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