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Dilution refrigerator, as a refrigeration technology that can obtain extremely low temperatures below 10 mK, is widely used in fields such as quantum computing, and condensed matter physics. The development of the most widely used typical dry dilution refrigerators has been relatively mature, while there is little research on other types of dilution refrigerators, and there is a lack of comprehensive and systematic research on dilution refrigeration technology. This paper focuses on the current status of dilution refrigeration technology research, introduces its basic principles, and points out that the fundamental reason for continuous refrigeration is the limited solubility of 3He in 4He and the difference in enthalpy between the concentrated phase and the dilute phase. This paper summarizes the realization forms and research progress of typical dilution refrigerators, 4He cycle dilution refrigerators, cold cycle dilution refrigerators, and space dilution refrigerators, and discusses their respective application occasions and advantages and disadvantages. From the Kapitza thermal resistance, osmotic pressure, and resistance, this paper analyzes the key influencing factors and design calculation methods for realizing dilution refrigerators below 10 mK, which provides reference for studying dilution refrigeration technology. [1] 郑茂文, 卫铃佼, 全加, 林鹏, 梁惊涛, 赵密广 2020 低温物理学报 41 211
Zheng M W, Wei L J, Quan J, Lin P, Liang J T, Zhao M G. 2020 Low Temp. Phys. 41 211
[2] Uhlig K 2015 Cryogenics 66 6Google Scholar
[3] Scholz P A, Kraft-Bermuth S, Andrianov V 2016 J. Low Temp. Phys. 184 576Google Scholar
[4] Zheng M W, Quan J, Wang N L, Li C Z, Zhao M G, Wei L J, Liang J T 2019 J. Low Temp. Phys. 19 1
[5] London H 1951 Proceeding of International Conference on Low Temperature Physics (Oxford: Oxford University Press) p157
[6] Das P, Ouboter R D B, Taconis K W 1965 9th International Conference on Low Temperature Physics (London: Olenum Press) 1965 p1253
[7] Zheng M W, Li J G, Guo H W, Wei L J, Pan Z J, Li Rui X, Chen H L, Liang J T 2024 Cryogenics 138 103802Google Scholar
[8] Lounasmaa O V 1979 J. Phys. E: Sci. Instrum. 12 668Google Scholar
[9] Zhao Z Y, Wang C 2020 Cryogenic Engineering and Technologies (New York: CRC Press) p317
[10] Guglielmo V, Lara R 2008 The Art of Cryogenics (British: British Library) p143
[11] Lounasmaa O V 1974 Experimental Principles and Methods Below 1K (New York: Academic Press INC
[12] Edwards D O, Pettersen M S 1992 J. Low Temp. Phys. 87 3
[13] Wilks J 1967 The Properties of Liquid and Solid Helium (Oxford: Clarendon Press
[14] Walker E J, Fairbank H A 1960 Phys. Rev. Lett. 5 139Google Scholar
[15] Graf E H, Lee D M, Reppy J D 1965 Phys. Rev. Lett. 19 417Google Scholar
[16] Edwards D O, Daunt J G 1961 Phys. Rev. 124 640Google Scholar
[17] van Leeuwen J M J, Cohen E G D 1961 Physica 27 1157Google Scholar
[18] Masaki N, Yoshiko F, Toshinobu S 1987 Jpn. J. Appl. Phys. 26 69Google Scholar
[19] White G K 1968 Experimental Techniques in Low Temperature Physics (Oxford: Clarendon Press
[20] Wheatley J C, Rapp R E, Johnson R T 1971 J. Low Temp. Phys. 4 1Google Scholar
[21] Abel W R, Wheatley J C 1968 Phys. Rev. Lett. 21 1231Google Scholar
[22] Wheatley J C, Vilches O E, Abel W R 1968 Phys. 4 1Google Scholar
[23] Mota A C, Platzeck R P, Rapp R E, Wheatley J C 1969 Phys. Rev. 177 266Google Scholar
[24] Radebaugh R, Siegwarth J D 1971 Phys. Rev. Lett. 27 796
[25] Radebaugh R, Siegwarth J D 1971 Cryogenics 11 368Google Scholar
[26] Peterson R E, Anderson A C 1973 J. Low Temp. Phys. 11 639Google Scholar
[27] Kuerten J G M, Castelijns C A M, de Waele A T A M, Gijsman H M 1985 Cryogenics 25 419Google Scholar
[28] Peshkov V P 1970 Cryogenics 10 3Google Scholar
[29] Bunkov Y M, Guénault A M, Hayward D J, Jackson D A, Kennedy C J, Nichols T R, Miller I E, Pickett G R, Ward M G 1991 J. Low Temp. Phys. 83 257Google Scholar
[30] Vermeulen G A, Frossati G 1987 Cryogenics 27 139Google Scholar
[31] 冉启泽, 钱永嘉, 朱元贞 1979 低温物理 1 18
Ran Q Z, Qian Y J, Zhu Y J 1979 Low Temp. Phys. 1 18
[32] Uhlig K, Hehn W 1993 Cryogenics 33 1028Google Scholar
[33] Uhlig K, Hehn W 1994 Cryogenics 3 587
[34] Uhlig K, Hehn W 1997 Cryogenics 37 279Google Scholar
[35] Koike Y, Morii Y, Igarashi T, Kubota M, Hiresaki Y, Tanida K 1999 Cryogenics 39 579Google Scholar
[36] Uhlig K 2004 Cryogenics 44 53Google Scholar
[37] Uhlig K 2008 Cryogenics 48 138Google Scholar
[38] Sakon T, Nojiril H, Koyama K 2003 J. Phys Soc. Jpn. 72 140
[39] Herrmann R, Ofitserov A V, Khlyustikov I N 2005 Instrum. Exp. Tech. 48 5
[40] Shvarts V, Zhao Z, Bobb L, Jirmanus M 2009 J. Phys. Conf. Ser. 150 1
[41] Uhlig K 2009 International Cryocooler Conference 15, Long Beach, California, June 9–12, 2009 p15497
[42] Umeno T, Maehata K, Ishibashi K 2010 Cryogenics 50 314Google Scholar
[43] Singh V, Mathimalar S, Dokania N, et al. 2013 Pramana J. Phys. 81 719Google Scholar
[44] Hata T, Matsumoto T, Obara K 2014 J. Low Temp. Phys. 175 471
[45] Mikheev V A, Maidanov V A, Mikhin N P 1984 Cryogenics 24 190Google Scholar
[46] Mohandas P, Cowan B P, Saunders J 1994 Physica B 194 55
[47] Prouvé T, Luchier N, Duband L 2008 Cryocoolers 15 California, US, June 9–12, 2008 p497
[48] Teleberg G, Chase S T, Piccirillo L 2006 SPIE Conf. Ser. 6275 62750D
[49] Sivokon V E, Dotsenko V V, Pogorelov L A, Sobolev V I 1992 Cryogenics 32 207Google Scholar
[50] 俎红叶, 程维军, 王亚南, 王晓涛, 李柯, 戴巍 2023 物理学报 72 080701Google Scholar
Zu H Y, Cheng W J, Wang Y N, Wang X T, Li K, Dai W 2023 Acta Phys. Sin. 72 080701Google Scholar
[51] Pennings N H, de Bruyn Ouboter R, Taconis K W 1976 Physica 84B 249
[52] Pennings N H, Taconis K W, de Bruyn Ouboter R 1976 Physica 81B 101
[53] Pennings N H, Taconis K W, de Bruyn Ouboter R 1976 Physica 84B 102
[54] Satoh N K, Satoh T, Ohtsuka T, Fukuzawa N, Satoh N 1987 J. Low Temp. Phys. 67 195Google Scholar
[55] Duband L, Hui L, Lange A 1990 Cryogenics 30 263
[56] Roach P R, Helvensteijn Ben P M 1999 Cryogenics 39 1015Google Scholar
[57] Benoit A, Pujol S 1994 Cryogenics 34 421
[58] Sirbi A, Pouilloux B, Benoit A, Lamarre J M 1999 Cryogenics 39 665Google Scholar
[59] Sentis L, Delmas J, Camus P, et al. 2005 Cryocoolers 13 New York, US 2005 pp533–542
[60] Triqueneaux S, Sentis L, Camus P, Benoit A, Guyot G 2006 Cryogenics 46 288Google Scholar
[61] Martin F, Vermeulen G, Camus P, Benoit A 2010 Cryogenics 50 623Google Scholar
[62] Roach P R, Helvensteijn B P M 1999 10th International Cryocooler Conference MONTEREY, CA , May 26–28, 1999 pp647–653
[63] Chaudhry G, Vermeulen G 2012 J. Low Temp. Phys. 169 90Google Scholar
[64] Chaudhry G, Volpe A, Camus P, Triqueneaux S, Vermeulen G 2012 Cryogenics 52 471Google Scholar
[65] Camus P, Vermeulen G, Volpe A, Triqueneaux S, Benoit A, Butterworth J, D’Escrivan S, Tirolien T 2014 J. Low Temp. Phys. 176 1069Google Scholar
[66] Nagata A, Sugita H, Shinozaki K, Sato Y 2018 Cryocoolers 20 Burlington, VT, June 18–21, 2018 pp357–367
[67] Keisuke S, Kenichiro S, Yoichi S, Hiroyuki S, Kazuhisa M, Takao N, Shoji T, Katsuhiro N, Gerard V, Philippe C, Sebastien T, Sylvain M, Stephane D 2016 Trans. JSASS Aerospace Tech. 14 27
[68] Chandra M B, Nisith Kr D 2017 IOP Conf. Ser. Mater. Sci. Eng. 171 012143Google Scholar
[69] Harriso J P 1979 J. Low Temp. Phys. 37 1Google Scholar
[70] 郑茂文 2022 博士学位论文(北京: 中国科学院大学/理化技术研究所)
Zheng M W 2022 Ph. D. Dissertation (Beijing: University of Chinese Academy of Science/ Technical Institute of Physics and Chemistry
[71] Betts D S 著 (金铎, 冉启泽, 曹烈兆 译) 1995 极低温(mK)技术概论 ( 北京: 中国科学技术大学出版社)
Betts D S (translated by Jin D, Ran Q Z, Cao L Z) 1995 Ultra Low Temperature Technologies (Hefei: Press of University of Science and Technology of China
[72] Chaudhry G 2009 Ph. D. Dissertation (Cambridge, Massachusetts, USA: Massachusetts Institute of Technology
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表 1 国外主流商用稀释制冷机产品
Table 1. The foreign mainstream commercial dilution refrigerator products.
公司 稀释制冷机型号 最低温度/mK 制冷功率 Bluefors BF- LD250 10 250 μW@100 mK, 10 μW@20 mK BF-XLD400 10 400 μW@100 mK, 15 μW@20 mK BF-XLD1000 10 1000 μW@100 mK, 30 μW@20 mK KIDE 10 3 mW@100 mK(3个模块) Oxford Proteox MX 10 450 μW@100 mK, 12 μW@20 mK Proteox LX 7 850 μW@100 mK, 25 μW@20 mK Proteox 5 mK 5 850 μW@100 mK, 25 μW@20 mK Janis JDry-500 10 400 μW@100 mK JDry-750 9 400 μW@100 mK, 14 μW@20 mK Cryoconcept HEXA-DRY L 10 450 μW@100 mK 表 2 国内报道的经典稀释制冷机研究进展
Table 2. Research progress of classical dilution refrigerators reported in China.
单位/企业 目前最低温度/mK 制冷功率 中国科学院物理研究所 <7.6 >450 μW@100 mK 中国科学院理化技术研究所[7] ~15 >400 μW@100 mK 中国电子科技集团公司第十六研究所 7.9 >450 μW@100 mK 安徽大学/合肥知冷低温科技有限公司 8.5 550 μW@100 mK 中船鹏力超低温 12 >450 μW@100 mK 本源量子 <10 >450 μW@100 mK 北京飞斯科科技有限公司 <10 >300 μW@100 mK 集焓科学仪器有限公司 6.8 >400 μW@100 mK 表 3 蒸发器温度对应的3He及4He蒸气压
Table 3. 3He and 4He vapor pressures corresponding to evaporator temperature.
蒸发器温度/K P30/Pa P40/Pa x3/% a P3/Pa P4/Pa (P3+P4)/Pa [P3/(P3+P4)]/% 0.9 695 5.542 0.78 4.47 24.23 5.499 29.73 81.51 0.8 378 1.526 0.88 5.13 17.06 1.513 18.58 91.86 0.7 180 0.30375 1 5.98 10.76 0.301 11.06 97.28 0.6 70.6 0.037485 1.2 7.11 6.02 0.037 6.06 99.39 0.5 20.5 0.002178 1.4 8.69 2.49 0.0021 2.50 99.91 0.4 3.59 0.001 1.8 11.07 0.72 0.0010 0.72 99.86 -
[1] 郑茂文, 卫铃佼, 全加, 林鹏, 梁惊涛, 赵密广 2020 低温物理学报 41 211
Zheng M W, Wei L J, Quan J, Lin P, Liang J T, Zhao M G. 2020 Low Temp. Phys. 41 211
[2] Uhlig K 2015 Cryogenics 66 6Google Scholar
[3] Scholz P A, Kraft-Bermuth S, Andrianov V 2016 J. Low Temp. Phys. 184 576Google Scholar
[4] Zheng M W, Quan J, Wang N L, Li C Z, Zhao M G, Wei L J, Liang J T 2019 J. Low Temp. Phys. 19 1
[5] London H 1951 Proceeding of International Conference on Low Temperature Physics (Oxford: Oxford University Press) p157
[6] Das P, Ouboter R D B, Taconis K W 1965 9th International Conference on Low Temperature Physics (London: Olenum Press) 1965 p1253
[7] Zheng M W, Li J G, Guo H W, Wei L J, Pan Z J, Li Rui X, Chen H L, Liang J T 2024 Cryogenics 138 103802Google Scholar
[8] Lounasmaa O V 1979 J. Phys. E: Sci. Instrum. 12 668Google Scholar
[9] Zhao Z Y, Wang C 2020 Cryogenic Engineering and Technologies (New York: CRC Press) p317
[10] Guglielmo V, Lara R 2008 The Art of Cryogenics (British: British Library) p143
[11] Lounasmaa O V 1974 Experimental Principles and Methods Below 1K (New York: Academic Press INC
[12] Edwards D O, Pettersen M S 1992 J. Low Temp. Phys. 87 3
[13] Wilks J 1967 The Properties of Liquid and Solid Helium (Oxford: Clarendon Press
[14] Walker E J, Fairbank H A 1960 Phys. Rev. Lett. 5 139Google Scholar
[15] Graf E H, Lee D M, Reppy J D 1965 Phys. Rev. Lett. 19 417Google Scholar
[16] Edwards D O, Daunt J G 1961 Phys. Rev. 124 640Google Scholar
[17] van Leeuwen J M J, Cohen E G D 1961 Physica 27 1157Google Scholar
[18] Masaki N, Yoshiko F, Toshinobu S 1987 Jpn. J. Appl. Phys. 26 69Google Scholar
[19] White G K 1968 Experimental Techniques in Low Temperature Physics (Oxford: Clarendon Press
[20] Wheatley J C, Rapp R E, Johnson R T 1971 J. Low Temp. Phys. 4 1Google Scholar
[21] Abel W R, Wheatley J C 1968 Phys. Rev. Lett. 21 1231Google Scholar
[22] Wheatley J C, Vilches O E, Abel W R 1968 Phys. 4 1Google Scholar
[23] Mota A C, Platzeck R P, Rapp R E, Wheatley J C 1969 Phys. Rev. 177 266Google Scholar
[24] Radebaugh R, Siegwarth J D 1971 Phys. Rev. Lett. 27 796
[25] Radebaugh R, Siegwarth J D 1971 Cryogenics 11 368Google Scholar
[26] Peterson R E, Anderson A C 1973 J. Low Temp. Phys. 11 639Google Scholar
[27] Kuerten J G M, Castelijns C A M, de Waele A T A M, Gijsman H M 1985 Cryogenics 25 419Google Scholar
[28] Peshkov V P 1970 Cryogenics 10 3Google Scholar
[29] Bunkov Y M, Guénault A M, Hayward D J, Jackson D A, Kennedy C J, Nichols T R, Miller I E, Pickett G R, Ward M G 1991 J. Low Temp. Phys. 83 257Google Scholar
[30] Vermeulen G A, Frossati G 1987 Cryogenics 27 139Google Scholar
[31] 冉启泽, 钱永嘉, 朱元贞 1979 低温物理 1 18
Ran Q Z, Qian Y J, Zhu Y J 1979 Low Temp. Phys. 1 18
[32] Uhlig K, Hehn W 1993 Cryogenics 33 1028Google Scholar
[33] Uhlig K, Hehn W 1994 Cryogenics 3 587
[34] Uhlig K, Hehn W 1997 Cryogenics 37 279Google Scholar
[35] Koike Y, Morii Y, Igarashi T, Kubota M, Hiresaki Y, Tanida K 1999 Cryogenics 39 579Google Scholar
[36] Uhlig K 2004 Cryogenics 44 53Google Scholar
[37] Uhlig K 2008 Cryogenics 48 138Google Scholar
[38] Sakon T, Nojiril H, Koyama K 2003 J. Phys Soc. Jpn. 72 140
[39] Herrmann R, Ofitserov A V, Khlyustikov I N 2005 Instrum. Exp. Tech. 48 5
[40] Shvarts V, Zhao Z, Bobb L, Jirmanus M 2009 J. Phys. Conf. Ser. 150 1
[41] Uhlig K 2009 International Cryocooler Conference 15, Long Beach, California, June 9–12, 2009 p15497
[42] Umeno T, Maehata K, Ishibashi K 2010 Cryogenics 50 314Google Scholar
[43] Singh V, Mathimalar S, Dokania N, et al. 2013 Pramana J. Phys. 81 719Google Scholar
[44] Hata T, Matsumoto T, Obara K 2014 J. Low Temp. Phys. 175 471
[45] Mikheev V A, Maidanov V A, Mikhin N P 1984 Cryogenics 24 190Google Scholar
[46] Mohandas P, Cowan B P, Saunders J 1994 Physica B 194 55
[47] Prouvé T, Luchier N, Duband L 2008 Cryocoolers 15 California, US, June 9–12, 2008 p497
[48] Teleberg G, Chase S T, Piccirillo L 2006 SPIE Conf. Ser. 6275 62750D
[49] Sivokon V E, Dotsenko V V, Pogorelov L A, Sobolev V I 1992 Cryogenics 32 207Google Scholar
[50] 俎红叶, 程维军, 王亚南, 王晓涛, 李柯, 戴巍 2023 物理学报 72 080701Google Scholar
Zu H Y, Cheng W J, Wang Y N, Wang X T, Li K, Dai W 2023 Acta Phys. Sin. 72 080701Google Scholar
[51] Pennings N H, de Bruyn Ouboter R, Taconis K W 1976 Physica 84B 249
[52] Pennings N H, Taconis K W, de Bruyn Ouboter R 1976 Physica 81B 101
[53] Pennings N H, Taconis K W, de Bruyn Ouboter R 1976 Physica 84B 102
[54] Satoh N K, Satoh T, Ohtsuka T, Fukuzawa N, Satoh N 1987 J. Low Temp. Phys. 67 195Google Scholar
[55] Duband L, Hui L, Lange A 1990 Cryogenics 30 263
[56] Roach P R, Helvensteijn Ben P M 1999 Cryogenics 39 1015Google Scholar
[57] Benoit A, Pujol S 1994 Cryogenics 34 421
[58] Sirbi A, Pouilloux B, Benoit A, Lamarre J M 1999 Cryogenics 39 665Google Scholar
[59] Sentis L, Delmas J, Camus P, et al. 2005 Cryocoolers 13 New York, US 2005 pp533–542
[60] Triqueneaux S, Sentis L, Camus P, Benoit A, Guyot G 2006 Cryogenics 46 288Google Scholar
[61] Martin F, Vermeulen G, Camus P, Benoit A 2010 Cryogenics 50 623Google Scholar
[62] Roach P R, Helvensteijn B P M 1999 10th International Cryocooler Conference MONTEREY, CA , May 26–28, 1999 pp647–653
[63] Chaudhry G, Vermeulen G 2012 J. Low Temp. Phys. 169 90Google Scholar
[64] Chaudhry G, Volpe A, Camus P, Triqueneaux S, Vermeulen G 2012 Cryogenics 52 471Google Scholar
[65] Camus P, Vermeulen G, Volpe A, Triqueneaux S, Benoit A, Butterworth J, D’Escrivan S, Tirolien T 2014 J. Low Temp. Phys. 176 1069Google Scholar
[66] Nagata A, Sugita H, Shinozaki K, Sato Y 2018 Cryocoolers 20 Burlington, VT, June 18–21, 2018 pp357–367
[67] Keisuke S, Kenichiro S, Yoichi S, Hiroyuki S, Kazuhisa M, Takao N, Shoji T, Katsuhiro N, Gerard V, Philippe C, Sebastien T, Sylvain M, Stephane D 2016 Trans. JSASS Aerospace Tech. 14 27
[68] Chandra M B, Nisith Kr D 2017 IOP Conf. Ser. Mater. Sci. Eng. 171 012143Google Scholar
[69] Harriso J P 1979 J. Low Temp. Phys. 37 1Google Scholar
[70] 郑茂文 2022 博士学位论文(北京: 中国科学院大学/理化技术研究所)
Zheng M W 2022 Ph. D. Dissertation (Beijing: University of Chinese Academy of Science/ Technical Institute of Physics and Chemistry
[71] Betts D S 著 (金铎, 冉启泽, 曹烈兆 译) 1995 极低温(mK)技术概论 ( 北京: 中国科学技术大学出版社)
Betts D S (translated by Jin D, Ran Q Z, Cao L Z) 1995 Ultra Low Temperature Technologies (Hefei: Press of University of Science and Technology of China
[72] Chaudhry G 2009 Ph. D. Dissertation (Cambridge, Massachusetts, USA: Massachusetts Institute of Technology
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