-
Direct X-ray imaging by a Fresnel zone plate (FZP) has achieved a spatial resolution of 10 nm on a synchrotron beamline. It may be used to obtain submicron-resolution X-ray images of laser-plasma sources or fusion targets. However, none of previous imaging experiments with laser-plasma kilo-elelctron-volt X-ray sources shows such a high resolution. In comparison with the FZP imaging on a synchrotron, we consider a case of imaging an extended object with a laser-plasma X-ray source that the illumination monochromaticity is lower and the field of view larger. Our simulations show that the spatial resolution is affected by both the object size and the spectral bandwidth of the source, which can explain the previous experiments. We conclude that by using a 100-zone FZP to image an object with up to 700 μm in size, a spatial resolution better than 1 μm can be realized by using X-rays of several kilo-electron volts and a spectral bandwidth just less than 3%. In this paper, we report a proof-of-principle study in simulation and experiment in an optical range centered at 632.8 nm. The simulation is performed with the same method as that previously used for X-ray imaging but with a 100-zone FZP working in the optical range. Simulations show that with the increase of the object size, the field-of-view contrast is degraded, but the spatial resolution is nearly unchanged. With the increase of the spectral bandwidth for the illumination, both the contrast and the resolution are degraded. In the experiments, different spectral bandwidths are realized by band-pass filters and different object sizes by an adjustable aperture. The experimental results are confirmed to be in agreement with the simulations. These results reveal that given a satisfied spectral bandwidth of laser-plasma X rays, the FZP imaging will be a promising approach to 1 μm or higher resolution X-ray imaging of a 1-mm-size object.
-
Keywords:
- imaging of zone plate /
- extended source /
- laser plasma
[1] Lindl J D, Amendt P, Berger R L, Glendinning S G, Glenzer S H, Haan S W, Kauffman R L, Landen O L, Sute L J 2004 Phys. Plasmas 11 339Google Scholar
[2] Fujioka S, Shiraga H, Nishikino M, Shigemori K, Sunahara A, Nakai M, Azechi H, Nishihara K, Yamanaka K 2003 Phys. Plasmas 10 4784Google Scholar
[3] Xu P, Bai Y L, Liu B Y, Ouyang X, Wang B, Yang W Z, Gou Y S, Zhu B L, Qin J J 2012 Appl. Opt. 51 7820Google Scholar
[4] 侯立飞, 韦敏习, 袁永腾, 易涛, 詹夏宇, 易荣清, 杨国洪, 刘慎业, 江少恩 2013 强激光与粒子束 25 2313Google Scholar
Hou L F, Wei M X, Yuan Y T, Yi T, Zhan X Y, Yi R Q, Yang G H, Liu S Y, Jiang S E 2013 High Power Laser Part. Beams 25 2313Google Scholar
[5] Marshall F J, Bennett G R 1999 Rev. Sci. Instrum. 70 617Google Scholar
[6] Aglitskiy Y, Lehecka T, Obenschain S, Bodner S, Pawley C, Gerber K, Sethian J, Brown C M, Seely J, Feldman U, Holland G 1998 Appl. Opt. 37 5253Google Scholar
[7] Koch J A, Aglitskiy Y, Brown C, Cowan T, Freeman R, Hatchett S, Holland G, Key M, MacKinnon A, Seely J, Snavely R, Stephens R 2003 Rev. Sci. Instrum. 74 2130Google Scholar
[8] 伊圣振, 穆宝忠, 王新, 蒋励, 朱京涛, 王占山, 方智恒, 王伟, 傅思祖 2012 强激光与粒子束 24 1076Google Scholar
Yi S Z, Mu B Z, Wang X, Jiang L, Zhu J T, Wang Z S, Fang Z H, Wang W, Fu S Z 2012 High Power Laser Part. Beams 24 1076Google Scholar
[9] Chao W, Kim J, Rekawa S, Fischer P, Anderson E H 2009 Opt. Express 17 17669Google Scholar
[10] Young M 1972 J. Opt. Soc. Am. 62 972Google Scholar
[11] 王晓方, 王晶宇 2011 物理学报 60 025212Google Scholar
Wang X F, Wang J Y 2011 Acta Phys. Sin. 60 025212Google Scholar
[12] Cauchon G, P-Thomasset M, Sauneuf R, Dhez P, Idir M, Ollivier M, Troussel P, Boutin J Y, Le Breton J P 1998 Rev. Sci. Instrum. 69 3186Google Scholar
[13] Azechi H, Tamari Y 2003 J. Plasma Fusion Res. 79 398Google Scholar
[14] 董建军, 曹磊峰, 陈铭, 谢常青, 杜华冰 2008 物理学报 57 3044Google Scholar
Dong J J, Cao L F, Chen M, Xie C Q, Du H B 2008 Acta Phys. Sin. 57 3044Google Scholar
[15] 陈晓虎, 王晓方, 张巍巍, 汪文慧 2013 物理学报 62 015208Google Scholar
Chen X H, Wang X F, Zhang W W, Wang W H 2013 Acta Phys. Sin. 62 015208Google Scholar
[16] 张巍巍, 王晓方 2014 强激光与粒子束 26 022003Google Scholar
Zhang W W, Wang X F 2014 High Power Laser Part. Beams 26 022003Google Scholar
[17] Chen L M, Liu F, Wang W M, Kando M, Mao J Y, Zhang L, Ma J L, Li Y T, Bulanov S V, Tajima T, Kato Y, Sheng Z M, Wei Z Y, Zhang J 2010 Phys. Rev. Lett. 104 215004Google Scholar
[18] Powers N D, Ghebregziabher I, Golovin G, Liu C, Chen S, Banerjee S, Zhang J, Umstadter D P 2013 Nat. Photon. 8 28Google Scholar
[19] 郁道银, 谈恒英 1999 工程光学 (北京: 机械工业出版社) 第249−250页
Yu D Y, Tan H Y 1999 Engineering Optics (Beijing: China Machine Press) pp249−250 (in Chinese)
[20] 阿特伍德 D 著(张杰 译) 2003 软X射线与极紫外辐射的原理和应用 (北京: 科学出版社) 第354页
Attwood D (translated by Zhang J) 2003 Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications (Beijing: Science Press) p354 (in Chinese)
-
图 3 扩展光源模型及成像结果 (a) 扩展光源模型; (b) FZP对扩展光源成的像; (c) 图(b)中像沿虚线y2方向的强度分布; (d) 图(c)中y2 = 0附近的强度分布
Fig. 3. Extended source model and its imaging results: (a) Extended source model; (b) image of extended source by FZP; (c) intensity distribution along y2 axis in panel (b); (d) intensity distribution near y2 = 0 in panel (c).
-
[1] Lindl J D, Amendt P, Berger R L, Glendinning S G, Glenzer S H, Haan S W, Kauffman R L, Landen O L, Sute L J 2004 Phys. Plasmas 11 339Google Scholar
[2] Fujioka S, Shiraga H, Nishikino M, Shigemori K, Sunahara A, Nakai M, Azechi H, Nishihara K, Yamanaka K 2003 Phys. Plasmas 10 4784Google Scholar
[3] Xu P, Bai Y L, Liu B Y, Ouyang X, Wang B, Yang W Z, Gou Y S, Zhu B L, Qin J J 2012 Appl. Opt. 51 7820Google Scholar
[4] 侯立飞, 韦敏习, 袁永腾, 易涛, 詹夏宇, 易荣清, 杨国洪, 刘慎业, 江少恩 2013 强激光与粒子束 25 2313Google Scholar
Hou L F, Wei M X, Yuan Y T, Yi T, Zhan X Y, Yi R Q, Yang G H, Liu S Y, Jiang S E 2013 High Power Laser Part. Beams 25 2313Google Scholar
[5] Marshall F J, Bennett G R 1999 Rev. Sci. Instrum. 70 617Google Scholar
[6] Aglitskiy Y, Lehecka T, Obenschain S, Bodner S, Pawley C, Gerber K, Sethian J, Brown C M, Seely J, Feldman U, Holland G 1998 Appl. Opt. 37 5253Google Scholar
[7] Koch J A, Aglitskiy Y, Brown C, Cowan T, Freeman R, Hatchett S, Holland G, Key M, MacKinnon A, Seely J, Snavely R, Stephens R 2003 Rev. Sci. Instrum. 74 2130Google Scholar
[8] 伊圣振, 穆宝忠, 王新, 蒋励, 朱京涛, 王占山, 方智恒, 王伟, 傅思祖 2012 强激光与粒子束 24 1076Google Scholar
Yi S Z, Mu B Z, Wang X, Jiang L, Zhu J T, Wang Z S, Fang Z H, Wang W, Fu S Z 2012 High Power Laser Part. Beams 24 1076Google Scholar
[9] Chao W, Kim J, Rekawa S, Fischer P, Anderson E H 2009 Opt. Express 17 17669Google Scholar
[10] Young M 1972 J. Opt. Soc. Am. 62 972Google Scholar
[11] 王晓方, 王晶宇 2011 物理学报 60 025212Google Scholar
Wang X F, Wang J Y 2011 Acta Phys. Sin. 60 025212Google Scholar
[12] Cauchon G, P-Thomasset M, Sauneuf R, Dhez P, Idir M, Ollivier M, Troussel P, Boutin J Y, Le Breton J P 1998 Rev. Sci. Instrum. 69 3186Google Scholar
[13] Azechi H, Tamari Y 2003 J. Plasma Fusion Res. 79 398Google Scholar
[14] 董建军, 曹磊峰, 陈铭, 谢常青, 杜华冰 2008 物理学报 57 3044Google Scholar
Dong J J, Cao L F, Chen M, Xie C Q, Du H B 2008 Acta Phys. Sin. 57 3044Google Scholar
[15] 陈晓虎, 王晓方, 张巍巍, 汪文慧 2013 物理学报 62 015208Google Scholar
Chen X H, Wang X F, Zhang W W, Wang W H 2013 Acta Phys. Sin. 62 015208Google Scholar
[16] 张巍巍, 王晓方 2014 强激光与粒子束 26 022003Google Scholar
Zhang W W, Wang X F 2014 High Power Laser Part. Beams 26 022003Google Scholar
[17] Chen L M, Liu F, Wang W M, Kando M, Mao J Y, Zhang L, Ma J L, Li Y T, Bulanov S V, Tajima T, Kato Y, Sheng Z M, Wei Z Y, Zhang J 2010 Phys. Rev. Lett. 104 215004Google Scholar
[18] Powers N D, Ghebregziabher I, Golovin G, Liu C, Chen S, Banerjee S, Zhang J, Umstadter D P 2013 Nat. Photon. 8 28Google Scholar
[19] 郁道银, 谈恒英 1999 工程光学 (北京: 机械工业出版社) 第249−250页
Yu D Y, Tan H Y 1999 Engineering Optics (Beijing: China Machine Press) pp249−250 (in Chinese)
[20] 阿特伍德 D 著(张杰 译) 2003 软X射线与极紫外辐射的原理和应用 (北京: 科学出版社) 第354页
Attwood D (translated by Zhang J) 2003 Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications (Beijing: Science Press) p354 (in Chinese)
计量
- 文章访问数: 7496
- PDF下载量: 40
- 被引次数: 0