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2025, 74(9): 095203.
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Ding Ye-Zhang, Ye Yin, Li Duo-Sheng, Xu Feng, Lang Wen-Chang, Liu Jun-Hong, Wen Xin. Molecular dynamics simulation of graphene deposition and growth on WC-Co cemented carbides. Acta Physica Sinica,
2023, 72(6): 068703.
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He Xiao, Xiao Xiao-Zhou, He Bin, Xue Ping, Xiao Jia-Ying. Quantitative analysis of oxygen partial pressure measurements based on photoacoustic pump-probe imaging. Acta Physica Sinica,
2023, 72(21): 218101.
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Zhang Zhi-Chao, Wang Fang, Wu Shi-Jian, Li Yi, Mi Wei, Zhao Jin-Shi, Zhang Kai-Liang. Influneces of different oxygen partial pressures on switching properties of Ni/HfOx/TiN resistive switching devices. Acta Physica Sinica,
2018, 67(5): 057301.
doi: 10.7498/aps.67.20172194
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Lu Yong-Jun, Yang Yi, Wang Feng-Hui, Lou Kang, Zhao Xiang. Effect of continuously graded functional layer on curvature and residual stress of solid oxide fuel cell in initial reduction process. Acta Physica Sinica,
2016, 65(9): 098102.
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Wang Hong, Yun Feng, Liu Shuo, Huang Ya-Ping, Wang Yue, Zhang Wei-Han, Wei Zheng-Hong, Ding Wen, Li Yu-Feng, Zhang Ye, Guo Mao-Feng. Effect of wafer bonding and laser liftoff process on residual stress of GaN-based vertical light emitting diode chips. Acta Physica Sinica,
2015, 64(2): 028501.
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Zhou Da-Yu, Xu Jin. Ferroelectric and antiferroelectric properties of Si-doped HfO2 thin films. Acta Physica Sinica,
2014, 63(11): 117703.
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Li Zhi-Guo, Liu Wei, He Jing-Jing, Li Zu-Liang, Han An-Jun, Zhang Chao, Zhou Zhi-Qiang, Zhang Yi, Sun Yun. Influences of deposition rate in second stage on the Cu(In,Ga)Se2 thin film and device prepared by low-temperature process. Acta Physica Sinica,
2013, 62(3): 038803.
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Niu Zhong-Cai, He Zhi-Bing, Zhang Ying, Wei Jian-Jun, Liao Guo, Du Kai, Tang Yong-Jian. Influence of radio frequency power on the structure and optical properties of glow discharge polymer films. Acta Physica Sinica,
2012, 61(10): 106804.
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Jiang Wei-Wei, Fan Lin-Yong, Zhao Rui-Feng, Wei Yan, Pei Li, Jian Shui-Sheng. Comb-filter based on two core fiber coupler and its CO2 laser trimming. Acta Physica Sinica,
2011, 60(4): 044214.
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Xu Jun, Huang Yu-Jian, Ding Shi-Jin, Zhang Wei. Influence of Ta and TaN bottom electrodes on electrical performances of MIM capacitors with atomic-layer-deposited HfO2 dielectric. Acta Physica Sinica,
2009, 58(5): 3433-3436.
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Jiang Yang, Luo Yi, Xi Guang-Yi, Wang Lai, Li Hong-Tao, Zhao Wei, Han Yan-Jun. Effect of AlGaN intermediate layer on residual stress control and surface morphology of GaN grown on 6H-SiC substrate by metal organic vapour phase epitaxy. Acta Physica Sinica,
2009, 58(10): 7282-7287.
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Sun Hao-Liang, Song Zhong-Xiao, Xu Ke-Wei. Effect of substrate constraint on stress-induced cracking of sputtered tungsten thin film. Acta Physica Sinica,
2008, 57(8): 5226-5231.
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Yu Yi-Ting, Yuan Wei-Zheng, Qiao Da-Yong, Liang Qing. A novel microstructure for in-situ measurement of residual stress in micromechanical thin films. Acta Physica Sinica,
2007, 56(10): 5691-5697.
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Kong De-Jun, Zhang Yong-Kang, Chen Zhi-Gang, Lu Jin-Zhong, Feng Ai-Xin, Ren Xu-Dong, Ge Tao. Experimental study of residual stress of galvanized passive film based on XRD. Acta Physica Sinica,
2007, 56(7): 4056-4061.
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Zhang Yong-Kang, Kong De-Jun, Feng Ai-Xin, Lu Jin-Zhong, Ge Tao. Study on the detection of interfacial bonding strength of coatings (Ⅱ): detecting system of bonding strength. Acta Physica Sinica,
2006, 55(11): 6008-6012.
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Wang Li-Xia, Li Jian-Ping, He Xiu-Li, Gao Xiao-Guang. Fabrication of vanadium dioxide films at low temperature and researches on properties of the films. Acta Physica Sinica,
2006, 55(6): 2846-2851.
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Di Yu-Xian, Ji Xin-Hua, Hu Ming, Qin Yu-Wen, Chen Jin-Long. Residual stress measurement of porous silicon thin film by substrate curvature method. Acta Physica Sinica,
2006, 55(10): 5451-5454.
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Qin Qi, Yu Nai-Sen, Guo Li-Wei, Wang Yang, Zhu Xue-Liang, Chen Hong, Zhou Jun-Ming. Residual stress in the GaN epitaxial film prepared by in situ SiNx deposition. Acta Physica Sinica,
2005, 54(11): 5450-5454.
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Shao Shu-Ying, Fan Zheng-Xiu, Shao Jian-Da. Influences of the period of repeating thickness on the stress of alternative high and low refractivity ZrO2/SiO2 multilayers. Acta Physica Sinica,
2005, 54(7): 3312-3316.
doi: 10.7498/aps.54.3312
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