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Influence of applied magnetic field on properties of silicon nitride thin film with light trapping structure prepared by R.F. magnetron sputtering

Jiang Qiang Mao Xiu-Juan Zhou Xi-Ying Chang Wen-Long Shao Jia-Jia Chen Ming

Citation:

Influence of applied magnetic field on properties of silicon nitride thin film with light trapping structure prepared by R.F. magnetron sputtering

Jiang Qiang, Mao Xiu-Juan, Zhou Xi-Ying, Chang Wen-Long, Shao Jia-Jia, Chen Ming
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  • Abstract views:  6906
  • PDF Downloads:  854
  • Cited By: 0
Publishing process
  • Received Date:  23 September 2012
  • Accepted Date:  25 January 2013
  • Published Online:  05 June 2013

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