Ion energy distribution modulation in radio frequency magnetron sputtering of indium tin oxide via auxiliary anode bias

HUANG Tianyuan; ZHAO Yifan; MO Chaochao; MEI Yang; ZHANG Xiaoman; JI Peiyu; WU Xuemei

doi:10.7498/aps.74.20251172

Search

x

中国物理学会期刊

Advanced Search

HUANG Tianyuan, ZHAO Yifan, MO Chaochao, MEI Yang, ZHANG Xiaoman, JI Peiyu, WU Xuemei. Ion energy distribution modulation in radio frequency magnetron sputtering of indium tin oxide via auxiliary anode bias. Acta Physica Sinica, 2025, 74(23): 238501. DOI: 10.7498/aps.74.20251172

Citation:

HUANG Tianyuan, ZHAO Yifan, MO Chaochao, MEI Yang, ZHANG Xiaoman, JI Peiyu, WU Xuemei. Ion energy distribution modulation in radio frequency magnetron sputtering of indium tin oxide via auxiliary anode bias. Acta Physica Sinica, 2025, 74(23): 238501. DOI: 10.7498/aps.74.20251172

Citation:

HUANG Tianyuan, ZHAO Yifan, MO Chaochao, MEI Yang, ZHANG Xiaoman, JI Peiyu, WU Xuemei. Ion energy distribution modulation in radio frequency magnetron sputtering of indium tin oxide via auxiliary anode bias. Acta Physica Sinica, 2025, 74(23): 238501. DOI: 10.7498/aps.74.20251172