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硅(Si)作为最重要的半导体材料之一, 被广泛应用于太阳电池、光电探测器等光电器件中. 由于硅和空气之间的折射率差异, 大量的入射光在硅基表面即被反射. 为了抑制这种反射带来的损失, 多种具有强陷光效应的硅纳米结构被研发出来. 采用干法蚀刻方案多数存在成本高昂、制备复杂的问题, 而湿法蚀刻方案所制备的硅纳米线阵列则存在间距等参数可控性较低、异质结有效面积较小等问题. 聚苯乙烯微球掩膜法可结合干法及湿法蚀刻各自的优点, 容易得到周期性硅纳米线(柱)阵列. 本文首先概述了硅纳米线结构的性质和制备方法, 总结了有效提升硅纳米线(柱)阵列光电探测器性能的策略, 并分析了其中存在的问题. 进而, 讨论了基于硅纳米线(柱)阵列光电探测器的最新进展, 重点关注其结构、光敏层的形貌以及提高光电探测器性能参数的方法. 最后, 简要介绍了其存在的主要问题及可能的解决方案.As one of the most important semiconductor materials, silicon (Si) is widely used in optoelectronic devices such as solar cells and photodetectors. Owing to the difference in refractive index between silicon and air, a large amount of incident light is reflected back into the air from the silicon surface. In order to suppress the loss caused by this reflection, a variety of silicon nanostructures with strong trapping effect have been developed. Most of the dry-etching schemes encounter the problems of high cost and complex preparation, while the silicon nanowires array prepared by the wet-etching schemes has the problems of low controllability of some parameters such as the spacing between two adjacent nanowires, and the small effective area of heterojunction. The method of using polystyrene microsphere as the mask can integrate the advantages of dry-etching method and wet-etching method, and it is easy to obtain periodic silicon nanowires (pillars) array. In this paper, first, we summarize the properties and preparation methods for silicon nanowires structure, the strategies to effectively improve the performance of silicon nanowires (pillars) array photodetectors, Then we analyze the existing problems. Further, the latest developments of silicon nanowires (pillars) array photodetector are discussed, and the structure, morphology of photosensitive layer and methods to improve the performance parameters of silicon nanowires (pillars) array photodetector are analyzed. Among them, we focus on the ultraviolet light sensitive silicon based photodetector and its method to show tunable and selective resonance absorption through leaky mode resonance, the silicon nanowires array photodetector modified with metal nanoparticles and the method of improving performance through surface plasmon effect, and plasmon hot electrons. Heterojunction photodetectors composed of various low-dimensional materials and silicon nanowires (pillars) array, and methods to improve the collection efficiency of photogenerated charge carriers through the “core/shell” structure, methods to expand the detection band range of silicon-based photodetectors by integrating down-conversion light-emitting materials and silicon nanowires (pillars) array, flexible silicon nanowires array photodetectors and their various preparation methods, are all introduced. Then, the main problems that a large number of defect states will be generated on the silicon nanostructure surface in the MACE process are briefly introduced, and several possible solutions for defect passivation are also presented. Finally, the future development for silicon nanowires (pillars) array photodetectors is prospected.
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Keywords:
- silicon nanowires /
- silicon nanowires array /
- dry-etching and wet-etching /
- metal-assisted chemical etching /
- photodetectors
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