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In the application of atmospheric pressure plasma jet, the influence of ambient gas cannot be ignored, especially in some specific scenarios which are highly sensitive to ambient particles. Coaxial double-tube plasma jet device is a promising method of controlling the chemical properties of jet effluent by restraining the mutual diffusion between jet effluent and ambient gas. In this work, the discharge characteristics and chemical properties of coaxial double-tube helium atmospheric pressure plasma jet at different flow rates of shielding gas are studied numerically, and the model is validated by experimental optical images. The results illustrate the enhanced discharge at the high flow rate, the weaker discharge at the low flow rate, and discharge behaviors without shielding gas as well. With the increase of shielded gas flow rate, the particle density increases in the discharge space, which can be attributed to the wider main discharge channel caused by the increase of shielding gas flow rate. In addition, the analysis shows the great difference in ion fluxes affected by the flow rate of the SG between the contour lines of different helium mole fractions. This study further reveals that different discharge positions have a great influence on the generation of nitrogen and oxygen particles, thus deepening the understanding of influence of shielding gas flow rate on discharge behavior, and may open up new opportunities for the further application of plasma jet.
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Keywords:
- atmospheric pressure plasma jet /
- coaxial double-tube device /
- shielding gas /
- distribution of species
[1] 孔得霖, 杨冰彦, 何锋, 韩若愚, 缪劲松, 宋廷鲁, 欧阳吉庭 2021 物理学报 70 095205
Google Scholar
Kong D L, Yang B Y, He F, Han R Y, Miao J S, Song T L, Ouyang J T 2021 Acta Phys. Sin. 70 095205
Google Scholar
[2] 张海宝, 陈强 2021 物理学报 70 095203
Google Scholar
Zhang H B, Chen Q 2021 Acta Phys. Sin. 70 095203
Google Scholar
[3] 李寿哲, 谢士辉, 吴悦, 廖宏达 2021 高电压技术 47 3012
Google Scholar
Li S Z, Xie S H, Wu Y, Liao H D 2021 High Voltage Eng. 47 3012
Google Scholar
[4] Winter J, Brandenburg R, Weltmann K D 2015 Plasma Sources Sci. Technol. 24 064001
Google Scholar
[5] 易善婷, 刘峰, 方志 2019 高电压技术 45 1936
Google Scholar
Yi S T, Liu F, Fang Z 2019 High Voltage Eng. 45 1936
Google Scholar
[6] Lu X, Ostrikov K 2018 Appl. Phys. Rev. 5 031102
Google Scholar
[7] Cai Y K, Lv L, Lu X P 2021 High Voltage 6 1092
Google Scholar
[8] 潘如政, 臧子豪, 黄邦斗, 朱文超, 章程, 邵涛 2021 高电压技术 47 3696
Google Scholar
Pan R Z, Zang Z H, Huang B D, Zhu W C, Zhang C, Shao T 2021 High Voltage Eng. 47 3696
Google Scholar
[9] Neyts E C, Ostrikov K K, Sunkara M K, Bogaerts A 2015 Chem. Rev. 115 13408
Google Scholar
[10] Wu S L, Yang Q, Shao T, Zhang Z T, Huang L Y 2020 High Voltage 5 15
Google Scholar
[11] Cheng H, Liu X, Lu X P, Liu D W 2016 High Voltage 1 62
Google Scholar
[12] 杨丽君, 宋彩虹, 赵娜, 周帅, 武珈存, 贾鹏英 2021 物理学报 70 155201
Google Scholar
Yang L J, Song C H, Zhao N, Zhou S, Wu J C, Jia P Y 2021 Acta Phys. Sin. 70 155201
Google Scholar
[13] Laroussi M, Lu X, Keidar M 2017 J. Appl. Phys. 122 020901
Google Scholar
[14] Penkov O V, Khadem M, Lim W S, Kim D E 2015 J. Coat. Technol. Res. 12 225
Google Scholar
[15] Jiang B, Zheng J T, Qiu S, Wu M B, Zhang Q H, Yan Z F, Xue Q Z 2014 Chem. Eng. J. 236 348
Google Scholar
[16] 朱彦熔, 常正实 2022 物理学报 71 025202
Google Scholar
Zhu Y R, Chang Z S 2022 Acta Phys. Sin. 71 025202
Google Scholar
[17] 王瑞雪, 沈苑, 章程, 牛铮, 方志, 邵涛 2015 高电压技术 41 2903
Google Scholar
Wang R X, Shen Y, Zhang C, Niu Z, Fang Z, Shao T 2015 High Voltage Eng. 41 2903
Google Scholar
[18] Yue Y F, Wu F, Cheng H, Xian Y B, Liu D W, Lu X P, Pei X K 2017 J. Appl. Phys. 121 033302
Google Scholar
[19] Léveillé V, Coulombe S 2005 Plasma Sources Sci. Technol. 14 467
Google Scholar
[20] Reuter S, Winter J, Schmidt-Bleker A, Tresp H, Hammer M U, Weltmann K-D 2012 IEEE Trans. Plasma Sci. 40 2788
Google Scholar
[21] Ohashi H, Oyama K, Mitani T, Naiki K, Nakayama T, Ito H 2017 IEEE Trans. Plasma Sci. 45 2481
Google Scholar
[22] Winter J, Sousa J S, Sadeghi N, Schmidt-Bleker A, Reuter S, Puech V 2015 Plasma Sources Sci. Technol. 24 025015
Google Scholar
[23] Nguyen D B, Trinh Q H, Mok Y S, Lee W G 2020 Plasma Sources Sci. Technol. 29 035014
Google Scholar
[24] Karakas E, Koklu M, Laroussi M 2010 J. Phys. D:Appl. Phys. 43 155202
Google Scholar
[25] 赵莉华, 冀一玮, 尚豪, 黄小龙, 任俊文, 宁文军 2021 中国电机工程学报 41 6090
Google Scholar
Zhao L H, Ji Y W, Shang H, Huang X L, Ren J W, Ning W J 2021 Proc. CSEE 41 6090
Google Scholar
[26] Yan W, Economou D J 2017 J. Phys. D:Appl. Phys. 50 415205
Google Scholar
[27] Ning W J, Dai D, Zhang Y H, Han Y X, Li L C 2018 J. Phys. D:Appl. Phys. 51 125204
Google Scholar
[28] Breden D, Miki K, Raja L L 2012 Plasma Sources Sci. Technol. 21 034011
Google Scholar
[29] Lazarou C, Anastassiou C, Topala I, Chiper A S, Mihaila I, Pohoata V, Georghiou G E 2018 Plasma Sources Sci. Technol. 27 105007
Google Scholar
[30] Lin P, Zhang J, Nguyen T, Donnelly V M, Economou D J 2021 J. Phys. D:Appl. Phys. 54 075205
Google Scholar
[31] Liu X Y, Pei X K, Lu X P, Liu D W 2014 Plasma Sources Sci. Technol. 23 035007
Google Scholar
[32] Kettlitz M, Höft H, Hoder T, Weltmann K D, Brandenburg R 2013 Plasma Sources Sci. Technol. 22 025003
Google Scholar
[33] Yan W, Xia Y, Bi Z H, Song Y, Wang D Z, Sosnin E A, Skakun V S, Liu D P 2017 J. Phys. D:Appl. Phys. 50 345201
Google Scholar
[34] Zhang Y H, Ning W J, Dai D 2018 AIP Adv. 8 035008
Google Scholar
[35] Pinchuk M, Stepanova O, Kurakina N, Spodobin V 2017 J. Phys. Conf. Ser. 830 012060
Google Scholar
[36] Mohamed A A H, Kolb J F, Schoenbach K H 2010 Eur. Phys. J. D 60 517
Google Scholar
[37] Basher A H, Mohamed A-A H 2018 J. Appl. Phys. 123 193302
Google Scholar
[38] Xiong R H, Xiong Q, Nikiforov A Y, Vanraes P, Leys C 2012 J. Appl. Phys. 112 033305
Google Scholar
[39] Viegas P, Slikboer E, Obrusník A, Bonaventura Z, Sobota A, Garcia-Caurel E, Guaitella O, Bourdon A 2018 Plasma Sources Sci. Technol. 27 094002
Google Scholar
[40] Hagelaar G J M, Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
Google Scholar
[41] Yuan X H, Raja L L 2003 IEEE Trans. Plasma Sci. 31 495
Google Scholar
[42] Lazarou C, Belmonte T, Chiper A S, Georghiou G E 2016 Plasma Sources Sci. Technol. 25 055023
Google Scholar
[43] Murakami T, Niemi K, Gans T, O'Connell D, Graham W G 2012 Plasma Sources Sci. Technol. 22 015003
Google Scholar
[44] Kossyi A, Kostinsky A Y, Matveyev A A, Silakov V P 1992 Plasma Sources Sci. Technol. 1 207
Google Scholar
-
图 1 实验装置示意图
Figure 1. Schematic diagram of experimental setup.
图 2 仿真模型的几何结构
Figure 2. The geometry of the simulation model.
图 3 不同SG流速下的放电光学图像 (a), (c) 0 slm; (b) 1 slm; (d) 3 slm. 红色曲线表示放电时最明亮的区域
Figure 3. The discharge optical images for the different SG flow rates: (a), (c) 0 slm; (b) 1 slm; (d) 3 slm. The red curve shows the brightest region of the discharge.
图 4 (a), (c) 不同SG流速下98%氦气摩尔分数的轮廓线; (b) 氦气摩尔分数(cHe)在轴向位置z = 2.5 mm处的径向分布
Figure 4. (a), (c) The contour line of the 98% helium mole fraction at different flow rates of SG; (b) the distribution of the helium mole fraction(cHe) at axial position of z = 2.5 mm.
图 5 当SG流速处于(a) 0, (b) 1, (c) 2和(d) 3 slm情况下, 电子密度ne(单位: m–3, 以对数形式表示)的时空分布. 洋红色线分别表示不同氦气摩尔分数的等值轮廓线
Figure 5. Spatial and temporal profiles of the electron density ne (unit: m–3, in 10 logarithmic scale) for SG flow rates of (a) 0, (b) 1, (c) 2 and (d) 3 slm. The magenta lines are the contour lines of different helium mole fractions.
图 6 SG流速为(a) 0 和(b) 3 slm情况下放电空间中电离率(单位: mol·m–3·s–1, 以对数形式表示)的时空演化情况. 洋红色线分别表示不同氦气摩尔分数的等值轮廓线
Figure 6. Development of the ionization rate (unit: mol·m–3·s–1, in 10 logarithmic scale) in the discharge region for SG flow rate of (a) 0 and (b) 3 slm. The magenta lines are the contour lines of different helium mole fractions.
图 7 放电空间中(a)粒子平均数密度及(b)各粒子时间空间平均生成速率
Figure 7. (a) The average species density and (b) the average spatiotemporal production rate of the species in discharge region.
图 8 轴向位置z = 2.5 mm, He*粒子的生成速率沿径向分布
Figure 8. Radial distribution of the production rate of He* at axial position z = 2.5 mm.
图 9 不同氦气浓度轮廓线表面的离子径向通量
Figure 9. Radial flux of ions on the contour lines of different helium mole fractions.
图 10 不同氦气浓度轮廓线表面的化学反应速率
Figure 10. Reaction rate on the contour lines of different helium mole fractions.
图 11 当SG流速为(a) 0和(b) 3 slm时, 轴向位置z = 2.5 mm处的离子密度沿径向位置分布
Figure 11. Distribution of ion density at axial position z = 2.5 mm for SG flow rate of (a) 0 and (b) 3 slm.
图 12 不同氦气浓度轮廓线表面的径向电场变化情况
Figure 12. Variation of the radial electric field on the contour lines of different helium mole fractions.
图 13
$\rm N_2^+ $ 和$\rm O_2^+ $ 的化学反应速率的空间分布. 洋红色线分别表示不同氦气摩尔分数的等值轮廓线Figure 13. Spatial distribution of the reaction rates involving (a)
$\rm O_2^+ $ and (b)$\rm N_2^+ $ . The magenta lines are the contour lines of different helium mole fractions.表 1 中性气体流动模型的边界条件
Table 1. Boundary conditions of the neutral gas flow model.
边界 表达式 备注 AX — 对称轴 BC ui = 3 slm, c = 1 工作气体入口 DE uo, c = 0 屏蔽气体入口 FG u = 0.1 m/s, c = 0 环境空气入口 GW p = 1 atm, ${{\boldsymbol{n}}} \cdot {D_{\text{d} } }\nabla c = 0$ — BPO, CQRD,
UW, ESTFu = 0 m/s, ${{\boldsymbol{n}}} \cdot {D_{\text{d} } }\nabla c = 0$ — 
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表 2 等离子体动力学模型的边界条件
Table 2. Boundary conditions of the plasma dynamics model.
边界 表达式 备注 IPO V = V0, 方程(9)—方程(12) 外施电压 HX — 对称轴 IJ, KL $- {\boldsymbol{n}} \cdot {\boldsymbol{D}} = 0$, $- {\boldsymbol{n} } \cdot {\boldsymbol{\varGamma} } {\text{e} } = 0$, $- {\boldsymbol{n}} \cdot {\boldsymbol{\varGamma}} {\varepsilon } = 0$ TV V = 0, $- {\boldsymbol{n}} \cdot {\boldsymbol{\varGamma}} {\text{e} } = 0$, $- {\boldsymbol{n}} \cdot {\boldsymbol{\varGamma}} {\varepsilon } = 0$ 接地 TM, XYV V = 0 接地 UV, LST, JQRK 方程(9)—方程(12), 方程(14), 方程(15)
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表 A 等离子体化学反应
Table A. Chemical reactions considered in the plasma dynamics model.
序号 反应方程式 速率常数 能量损耗
/eV参考
文献1 ${\rm{e+He\to e+He}}$ f(c, ε) (m3·s–1) / [40] 2 ${\rm{e+He\to e+He^{\ast}}}$ f(c, ε) (m3·s–1) 19.82 [40] 3 ${\rm{e+He^{\ast }\to e+He}} $ f(c, ε) (m3·s–1) –19.82 [40] 4 ${\rm{e+He\to 2e+He^{+}}} $ f(c, ε) (m3·s–1) 24.587 [40] 5 ${\rm{e+N_{2}\to e+N_{2}}} $ f(c, ε) (m3·s–1) / [40] 6 ${\rm{e+N_{2}\to e+N_{2}(VIB\, \textit{v}1)}}$ f(c, ε) (m3·s–1) 0.2889 [40] 7 ${\rm{e+N_{2}\to e+N_{2}(VIB\, 3\textit{v}1)} }$ f(c, ε) (m3·s–1) 0.8559 [40] 8 ${\rm{e+N_{2}\to e+N_{2}(VIB\, 4\textit{v}1)} }$ f(c, ε) (m3·s–1) 1.1342 [40] 9 ${\rm{e+N_{2}\to e+N_{2}(VIB \,5\textit{v}1)} }$ f(c, ε) (m3·s–1) 1.4088 [40] 10 ${\rm{e+N_{2}\to 2e+N_{2}^{+}}} $ f(c, ε) (m3·s–1) 15.6 [40] 11 ${\rm{e+O_{2}\to e+O_{2}}} $ f(c, ε) (m3·s–1) / [40] 12 ${\rm{e+O_{2}\to O+O^{-}}} $ f(c, ε) (m3·s–1) / [40] 13 ${\rm{e+O_{2}\to O_{2}^{-}}} $ f(c, ε) (m3·s–1) / [40] 14 ${\rm{e+O_{2}\to e+O_{2}(VIB\, 3\textit{v}1)} }$ f(c, ε) (m3·s–1) 0.57 [40] 15 ${\rm{e+O_{2}\to e+O_{2}(VIB\, 4\textit{v}1)} }$ f(c, ε) (m3·s–1) 0.75 [40] 16 ${\rm{e+O_{2}\to e+O_{2} } }(\rm A1)$ f(c, ε) (m3·s–1) 0.997 [40] 17 ${\rm{e+O_{2}\to e+O_{2}}} $ f(c, ε) (m3·s–1) –0.997 [40] 18 ${\rm{e+O_{2}\to e+O_{2} } }(\rm B1)$ f(c, ε) (m3·s–1) 1.627 [40] 19 ${\rm{e+O_{2}\to e+O_{2}}} $ f(c, ε) (m3·s–1) –1.627 [40] 20 ${\rm{e+O_{2}\to e+O_{2}(EXC)}} $ f(c, ε) (m3·s–1) 4.5 [40] 21 ${\rm{e+O_{2}\to e+O+O}} $ f(c, ε) (m3·s–1) 5.58 [40] 22 ${\rm{e+O_{2}\to e+O+O(^{1}D)}} $ f(c, ε) (m3·s–1) 8.4 [40] 23 ${\rm{e+O_{2}\to 2e+O_{2}^{+}}}$ f(c, ε)(m3·s–1) 12.1 [40] 24 ${\rm{e+He^{\ast }\to 2e+He^{+}}} $ $4.661 \times {10^{ - 16} } \times {T_{\text{e} } ^{0.6}} \times { {\rm{e} }^{ - 4.78/T_{\text{e} } } }\,({\rm m}^3{\cdot} {\rm{s} }^{-1})$ 4.78 [41] 25 ${\rm{e+He_{2}^{\ast }\to 2e+He_{2}^{+}}} $ $1.268 \times {10^{ - 18} } \times {T_{\text{e} }^{0.71} }\times { {\text{e} }^{ - 3.4/T_{\text{e} } } }\, ({\rm m}^3{\cdot} {\rm{s} }^{-1})$ 3.4 [41] 26 ${\rm{2He^{\ast }\to e+He+He^{+}}} $ 4.5 × 10–16 (m3·s–1) –15 [41] 27 ${\rm{e+He_{2}^{+}\to He^{\ast}+He}} $ $5.386\times10^{-13}\times T_{\rm e}^{-0.5}\rm (m^3{\cdot} s^{-1})$ / [41] 28 ${\rm{e+He^{+}\to He^{\ast}}} $ $6.76\times10^{-19}\times T_{\rm e}^{-0.5}\rm (m^3{\cdot} s^{-1})$ / [41] 29 ${\rm{2e+He^{+}\to e+He^{\ast}}} $ $6.186\times10^{-39}\times T_{\rm e}^{-4.4}\rm (m^3{\cdot} s^{-1})$ / [31] 30 ${\rm{e+He+He^{+}\to He+He^{\ast}}} $ $6.66\times10^{-42}\times T_{\rm e}^{-2}\rm (m^6{\cdot} s^{-1})$ / [31] 31 ${\rm{2e+He_{2}^{+}\to He_{2}^{\ast}+e}} $ 1.2 × 10–33 (m6·s–1) / [31] 32 ${\rm{e+He+He_{2}^{+}\to He_{2}^{\ast }+He}} $ 1.5 × 10–39 (m6·s–1) / [31] 33 ${\rm{e+He+He_{2}^{+}\to He^{\ast }+2He}} $ 3.5 × 10–39 (m6·s–1) / [31] 34 ${\rm{2e+He_{2}^{+}\to He^{\ast }+He+e}} $ 2.8 × 10–32 (m6·s–1) / [31] 35 ${\rm{e+N_{2}\to e+N+N}} $ $1\times10^{-16}\times T_{\rm e}^{-0.5}\times {\rm e}^{{-16}/T_{\rm{e} }}\rm (m^3{\cdot} s^{-1})$ 9.757 [42] 36 ${\rm{e+N_{2}^{+}\to N+N}} $ $4.8\times10^{-13}\times T_{\rm e}^{-0.5}\rm (m^3{\cdot} s^{-1})$ / [42] 37 ${\rm{e+N_{2}^{+}\to N_{2}}} $ $7.72\times10^{-14}\times T_{\rm e}^{-0.5}\rm (m^3{\cdot} s^{-1})$ / [43] 38 ${\rm{e+N_{4}^{+}\to 2N_{2}}} $ $3.22\times10^{-13}\times T_{\rm e}^{-0.5}\rm (m^3{\cdot} s^{-1})$ / [44] 39 ${\rm{2e+N_{2}^{+}\to N_{2}+e}} $ $3.165\times10^{-42}\times T_{\rm e}^{-0.8}\rm (m^6 \cdot s^{-1})$ / [44] 40 ${\rm{e+2O_{2}\to O_{2}+O_{2}^{-}}} $ $5.17\times10^{-43}\times T_{\rm e}^{-1}\rm (m^6{\cdot} s^{-1})$ –0.43 [44] 41 ${\rm{e+O_{2}^{+}\to O+O}} $ $6\times10^{-11}\times T_{\rm e}^{-1}\rm (m^3{\cdot} s^{-1})$ –6.91 [44] 42 ${\rm{e+O_{2}^{+}\to O_{2}}} $ 4 × 10–18 (m3·s–1) / [43] 43 ${\rm{e+O_{4}^{+}\to 2O_{2}}} $ $2.25\times10^{-13}\times T_{\rm e}^{-0.5}\rm (m^3{\cdot} s^{-1})$ / [44] 44 ${\rm{He^{\ast}+ 2He \to He_{2}^{\ast }+He}} $ 1.3 × 10–45 (m6·s–1) / [41] 45 ${\rm{He^{+}+2He\to He_{2}^{+}+He}} $ 1 × 10–43 (m6·s–1) / [41] 46 ${\rm{N_{2}+N_{2}+N_{2}^{+}\to N_{2}+N_{4}^{+}}} $ 5 × 10–41 (m6·s–1) / [44] 47 ${\rm{O^{-}+O_{2}^{+}\to O+O_{2}}} $ 2 × 10–13 (m3·s–1) / [41] 48 ${\rm{O_{2}^{-}+O_{2}^{+}\to O_{2}+O_{2}}} $ 2 × 10–13 (m3·s–1) / [41] 49 ${\rm{O_{2}^{-}+O_{2}^{+}+O_{2}\to 3O_{2}}} $ 2 × 10–37 (m6·s–1) / [44] 50 ${\rm{O_{2}^{-}+O_{4}^{+}+O_{2}\to 4O_{2}}} $ 2 × 10–37 (m6·s–1) / [44] 51 ${\rm{O_{2}+O_{2}+O_{2}^{+}\to O_{2}+O_{4}^{+}}} $ 2.4 × 10–42 (m6·s–1) / [44] 52 ${\rm{He^{\ast }+N_{2}\to e+He+N_{2}^{+}}} $ 7 × 10–17 (m3·s–1) / [41] 53 ${\rm{He_{2}^{\ast }+N_{2}\to e+2He+N_{2}^{+}}} $ 7 × 10–17 (m3·s–1) / [41] 54 ${\rm{He_{2}^{\ast }+O_{2}\to e+2He+O_{2}^{+}}} $ 3.6 × 10–16 (m3·s–1) / [43] 55 ${\rm{He^{\ast }+O_{2}\to e+He+O_{2}^{+}}} $ 2.6 × 10–16 (m3·s–1) / [43] 56 ${\rm{He_{2}^{+}+N_{2}\to N_{2}^{+}+2He}} $ 5 × 10–16 (m3·s–1) / [41] 57 ${\rm{He^{+}+N_{2}\to N_{2}^{+}+He}} $ 5 × 10–16 (m3·s–1) / [41] 58 ${\rm{He+N_{2}+N_{2}^{+}\to He+N_{4}^{+}}} $ 8.9 × 10–42 (m6·s–1) / [42] 59 ${\rm{He+O_{2}+O_{2}^{+}\to He+O_{4}^{+}}} $ 5.8 × 10–43 (m6·s–1) / [42] 60 ${\rm{He+O_{2}^{-}+O_{2}^{+}\to He+2O_{2}}} $ 2 × 10–37 (m6·s–1) / [43] 61 ${\rm{O_{2}^{-}+O_{2}^{+}+N_{2}\to 2O_{2}+N_{2}}} $ 2 × 10–37 (m6·s–1) / [43] 62 ${\rm{O_{2}^{-}+O_{4}^{+}+N_{2}\to 3O_{2}+N_{2}}} $ 2 × 10–37 (m6·s–1) / [44] 63 ${\rm{N_{2}+O_{2}+N_{2}^{+}\to O_{2}+N_{4}^{+}}} $ 5 × 10–41 (m6·s–1) / [44] 64 ${\rm{O_{2}+N_{4}^{+}\to 2N_{2}+O_{2}^{+}}} $ 2.5 × 10–16 (m3·s–1) / [44] 65 ${\rm{O_{2}+N+N\to O_{2}+N_{2}}} $ 3.9 × 10–45 (m6·s–1) / [43] 66 ${\rm{O+O+N\to O_{2}+N}} $ 3.2 × 10–45 (m6·s–1) / [42] 注: f(c, ε)表示速率系数是通过电子能量分布函数(EEDF)使用相关文献中的横截面获得的. c表示He摩尔分数, ε表示平均电子能量(eV), ne和Te表示电子密度(m–3) 和电子温度(eV). 他代表He(23S)和He(21S). He2*代表He2(a3∑u+). N2(VIB v1), N2(VIB 3v1), N2(VIB 4v1)和N2(VIB 5v1)被视为N2, O2(VIB 3v1), O2(VIB 4v1), O2(A1), O2(B1)和O2(EXC)被视为O2; O(1D)和O(1S)被视为O.
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表 3 与
$ \rm N_2^+, N_4^+和O_2^+ $ 相关的化学反应速率Table 3. Reaction rates involving
$ \rm N_2^+, N_4^+ \text{ and }O_2^+ $ 反应 cHe = 98%轮
廓线上
化学反应速率
/(mol·m–2·s–1)cHe = 95%轮
廓线上
化学反应速率
/(mol·m–2·s–1)cHe = 90%轮
廓线上
化学反应速率
/(mol·m–2·s–1)R41: e + $\rm O_2^+$ → O + O 2.98 × 10–3 1.27 × 10–3 3.81 × 10–4 R46: N2 + N2 + $\rm N_2^+ $ → N2 + $\rm N_4^+$ 1.67 × 10–4 1.61 × 10–5 2.67 × 10–7 R51: O2 + O2 + $\rm O_2^+$ → O2 + $\rm O_4^+$ 8.86 × 10–7 3.83 × 10–6 6.70 × 10–6 R52: He* + N2 → e + He + $\rm N_2^+ $ 1.29 × 10–3 4.48 × 10–5 4.96 × 10–7 R55: He* + O2 → e + He + $\rm O_2^+$ 1.28 × 10–3 4.42 × 10–5 4.90 × 10–7 R58: He + N2 + $\rm N_2^+ $ → He + $\rm N_4^+ $ 1.86 × 10–3 6.92 × 10–5 5.41 × 10–7 R63: N2 + O2 + $\rm N_2^+ $ → O2 + $\rm N_4^+ $ 4.45 × 10–5 4.29 × 10–6 7.09 × 10–8 R64: O2 + $\rm N_4^+ $ → 2N2 + $\rm O_2^+$ 1.59 × 10–3 9.67 × 10–4 1.10 × 10–4
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[1] 孔得霖, 杨冰彦, 何锋, 韩若愚, 缪劲松, 宋廷鲁, 欧阳吉庭 2021 物理学报 70 095205
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Kong D L, Yang B Y, He F, Han R Y, Miao J S, Song T L, Ouyang J T 2021 Acta Phys. Sin. 70 095205
Google Scholar
[2] 张海宝, 陈强 2021 物理学报 70 095203
Google Scholar
Zhang H B, Chen Q 2021 Acta Phys. Sin. 70 095203
Google Scholar
[3] 李寿哲, 谢士辉, 吴悦, 廖宏达 2021 高电压技术 47 3012
Google Scholar
Li S Z, Xie S H, Wu Y, Liao H D 2021 High Voltage Eng. 47 3012
Google Scholar
[4] Winter J, Brandenburg R, Weltmann K D 2015 Plasma Sources Sci. Technol. 24 064001
Google Scholar
[5] 易善婷, 刘峰, 方志 2019 高电压技术 45 1936
Google Scholar
Yi S T, Liu F, Fang Z 2019 High Voltage Eng. 45 1936
Google Scholar
[6] Lu X, Ostrikov K 2018 Appl. Phys. Rev. 5 031102
Google Scholar
[7] Cai Y K, Lv L, Lu X P 2021 High Voltage 6 1092
Google Scholar
[8] 潘如政, 臧子豪, 黄邦斗, 朱文超, 章程, 邵涛 2021 高电压技术 47 3696
Google Scholar
Pan R Z, Zang Z H, Huang B D, Zhu W C, Zhang C, Shao T 2021 High Voltage Eng. 47 3696
Google Scholar
[9] Neyts E C, Ostrikov K K, Sunkara M K, Bogaerts A 2015 Chem. Rev. 115 13408
Google Scholar
[10] Wu S L, Yang Q, Shao T, Zhang Z T, Huang L Y 2020 High Voltage 5 15
Google Scholar
[11] Cheng H, Liu X, Lu X P, Liu D W 2016 High Voltage 1 62
Google Scholar
[12] 杨丽君, 宋彩虹, 赵娜, 周帅, 武珈存, 贾鹏英 2021 物理学报 70 155201
Google Scholar
Yang L J, Song C H, Zhao N, Zhou S, Wu J C, Jia P Y 2021 Acta Phys. Sin. 70 155201
Google Scholar
[13] Laroussi M, Lu X, Keidar M 2017 J. Appl. Phys. 122 020901
Google Scholar
[14] Penkov O V, Khadem M, Lim W S, Kim D E 2015 J. Coat. Technol. Res. 12 225
Google Scholar
[15] Jiang B, Zheng J T, Qiu S, Wu M B, Zhang Q H, Yan Z F, Xue Q Z 2014 Chem. Eng. J. 236 348
Google Scholar
[16] 朱彦熔, 常正实 2022 物理学报 71 025202
Google Scholar
Zhu Y R, Chang Z S 2022 Acta Phys. Sin. 71 025202
Google Scholar
[17] 王瑞雪, 沈苑, 章程, 牛铮, 方志, 邵涛 2015 高电压技术 41 2903
Google Scholar
Wang R X, Shen Y, Zhang C, Niu Z, Fang Z, Shao T 2015 High Voltage Eng. 41 2903
Google Scholar
[18] Yue Y F, Wu F, Cheng H, Xian Y B, Liu D W, Lu X P, Pei X K 2017 J. Appl. Phys. 121 033302
Google Scholar
[19] Léveillé V, Coulombe S 2005 Plasma Sources Sci. Technol. 14 467
Google Scholar
[20] Reuter S, Winter J, Schmidt-Bleker A, Tresp H, Hammer M U, Weltmann K-D 2012 IEEE Trans. Plasma Sci. 40 2788
Google Scholar
[21] Ohashi H, Oyama K, Mitani T, Naiki K, Nakayama T, Ito H 2017 IEEE Trans. Plasma Sci. 45 2481
Google Scholar
[22] Winter J, Sousa J S, Sadeghi N, Schmidt-Bleker A, Reuter S, Puech V 2015 Plasma Sources Sci. Technol. 24 025015
Google Scholar
[23] Nguyen D B, Trinh Q H, Mok Y S, Lee W G 2020 Plasma Sources Sci. Technol. 29 035014
Google Scholar
[24] Karakas E, Koklu M, Laroussi M 2010 J. Phys. D:Appl. Phys. 43 155202
Google Scholar
[25] 赵莉华, 冀一玮, 尚豪, 黄小龙, 任俊文, 宁文军 2021 中国电机工程学报 41 6090
Google Scholar
Zhao L H, Ji Y W, Shang H, Huang X L, Ren J W, Ning W J 2021 Proc. CSEE 41 6090
Google Scholar
[26] Yan W, Economou D J 2017 J. Phys. D:Appl. Phys. 50 415205
Google Scholar
[27] Ning W J, Dai D, Zhang Y H, Han Y X, Li L C 2018 J. Phys. D:Appl. Phys. 51 125204
Google Scholar
[28] Breden D, Miki K, Raja L L 2012 Plasma Sources Sci. Technol. 21 034011
Google Scholar
[29] Lazarou C, Anastassiou C, Topala I, Chiper A S, Mihaila I, Pohoata V, Georghiou G E 2018 Plasma Sources Sci. Technol. 27 105007
Google Scholar
[30] Lin P, Zhang J, Nguyen T, Donnelly V M, Economou D J 2021 J. Phys. D:Appl. Phys. 54 075205
Google Scholar
[31] Liu X Y, Pei X K, Lu X P, Liu D W 2014 Plasma Sources Sci. Technol. 23 035007
Google Scholar
[32] Kettlitz M, Höft H, Hoder T, Weltmann K D, Brandenburg R 2013 Plasma Sources Sci. Technol. 22 025003
Google Scholar
[33] Yan W, Xia Y, Bi Z H, Song Y, Wang D Z, Sosnin E A, Skakun V S, Liu D P 2017 J. Phys. D:Appl. Phys. 50 345201
Google Scholar
[34] Zhang Y H, Ning W J, Dai D 2018 AIP Adv. 8 035008
Google Scholar
[35] Pinchuk M, Stepanova O, Kurakina N, Spodobin V 2017 J. Phys. Conf. Ser. 830 012060
Google Scholar
[36] Mohamed A A H, Kolb J F, Schoenbach K H 2010 Eur. Phys. J. D 60 517
Google Scholar
[37] Basher A H, Mohamed A-A H 2018 J. Appl. Phys. 123 193302
Google Scholar
[38] Xiong R H, Xiong Q, Nikiforov A Y, Vanraes P, Leys C 2012 J. Appl. Phys. 112 033305
Google Scholar
[39] Viegas P, Slikboer E, Obrusník A, Bonaventura Z, Sobota A, Garcia-Caurel E, Guaitella O, Bourdon A 2018 Plasma Sources Sci. Technol. 27 094002
Google Scholar
[40] Hagelaar G J M, Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
Google Scholar
[41] Yuan X H, Raja L L 2003 IEEE Trans. Plasma Sci. 31 495
Google Scholar
[42] Lazarou C, Belmonte T, Chiper A S, Georghiou G E 2016 Plasma Sources Sci. Technol. 25 055023
Google Scholar
[43] Murakami T, Niemi K, Gans T, O'Connell D, Graham W G 2012 Plasma Sources Sci. Technol. 22 015003
Google Scholar
[44] Kossyi A, Kostinsky A Y, Matveyev A A, Silakov V P 1992 Plasma Sources Sci. Technol. 1 207
Google Scholar
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