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The influences on dual frequency capacitively coupled plasma radial uniformity are studied with a newly developed complete floating double probe. It is found that low frequency power, discharge pressure and gap have significant effects on radial uniformity. The results show that a suitable low frequency power, discharge pressure and larger discharge gap can achieve more uniform plasma. Finally, the improved two-dimensional fluid model simulations are performed with the same discharge parameters in experiment. The radial ion density distributions are obtained for different discharge gaps. The results are almost consistent with each other.
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Keywords:
- dual frequency capacitively coupled plasma /
- radial uniformity /
- complete floating double probe /
- improved 2D fluid simulations
[1] Lee J K, Babaeva N Y, Kim H C, Manuilenko O V, Shon JW2004 IEEE Trans. Plasma Sci. 32 47
[2] Boyle P C, Ellingboe A R, Turner M M 2004 Plasma Sourc. Sci. Technol. 13 493
[3] Kitajima T, Takeo Y, Petrovic Z L, Makabe T 2000 Appl. Phys. Lett. 77 489
[4] Kim H C, Lee J K, Shon J W 2003 Phys. Plasmas 10 4545
[5] Chung T H 2005 Phys. Plasmas 12 104503
[6] Salabas A, Brinkmann R P 2005 Plasma Sourc. Sci. Technol. 14 S53
[7] Boyle P C, Ellingboe A R, Turner M M 2004 J. Phys. D: Appl. Phys. 37 697
[8] Kim H C, Lee J K 2005 Phys. Plasmas 12 053501
[9] Kim H C, Lee J K 2004 Phys. Rev. Lett. 93 085003
[10] Kawamura E, Lieberman M A, Lichtenberg A J 2006 Phys. Plasmas 13 053506
[11] Lee J K, Manuilenko O V, Babaeva N Yu, Kim H C, Shon J W 2005 Plasma Sourc. Sci. Technol. 14 89
[12] Lowe H D, Goto H H, Ohmi T 1991 J. Vac. Sci. Technol. A 9 3090
[13] Goto H H, Lowe H D, Ohmi T 1992 J. Vac. Sci. Technol. A 10 3048
[14] Denda T, Miyoshi Y, Komukai Y, Goto T, Petrovic Z L J, Makabe T 2004 J. Appl. Phys. 95 870
[15] Karkari S K, Ellingboe A R 2006 Appl. Phys. Lett. 88 101501
[16] Ohmori T, Goto T K, Kitajima T, Makabe T 2003 Appl. Phys. Lett. 83 4637
[17] Li X S, Bi Z H, Chang D L, Li Z C 2008 Appl. Phys. Lett. 93 031504
[18] Li Z C, Chang D L, Li X S, Bi Z H, Lu W Q 2010 Phys. Plasmas 17 033501
[19] Lisovskiy V A, Yegorenkov V D 2006 Vacuum 80 458
[20] Sudit I D, Chen F F 1994 Plasma Sourc. Sci. Technol. 3 162
[21] Braithwaite N S J, Benjamin N M P, Allen J E 1987 J. Phys. E: Sci. Instrum. 20 1046
[22] Paranjpe A P, McVittie J P, Self S A 1990 J. Appl. Phys. 67 6718
[23] Hebner G A, Paterson A M 2010 Plasma Sourc. Sci. Technol. 19 015020
[24] Kitajima T, Takeo Y, Makabe T 1999 J. Vac. Sci. Technol. A 17 2510
[25] Schulze J, Gans T, O’Connell D, Czarnetzki U, Ellingboe A R, Turner M M 2007 J. Phys. D 40 7008
[26] Ishimaru M, Ohba T, Ohmori T, Yagisawa T, Kitajima T, Makabe T. 2008 Appl. Phys. Lett. 92 071501
[27] Chen Z Y, Donnelly V M, Economou D J, Chen L, Funk M, Sundararajan R 2009 J. Vac. Sci. Technol. A 27 1159
[28] Karkari S K, Ellingboe A R, Gaman C 2008 Appl. Phys. Lett. 93 071501
[29] Booth J P, Curley G, Mari′c D, Chabert P 2010 Plasma Sourc. Sci. Technol. 19 01500
[30] Lu W Q (Chinese Patent) 200610134481.0. [2007-06-27] [陆文琪 中国专利] 200610134481.0. [2007-06-27]
[31] Huddlestone R H, Leonard S L 1965 Plasma Diagnostic Techniques (New York: Academic) pp 150, 183
[32] Zhao G L, Xu Y, Shang J P, Zhu A M, Lu W Q, Wang Y N 2009 Modern Phys. Lett. B 23 3409
[33] Overzet L J, Hopkins M B 1993 Appl. Phys. Lett. 63 2484
[34] Lieberman M A, Lichtenberg A J 2007 (Translated by Pa Y K) Principles of Plasma Discharges and Mayeriols Processing (2nd Ed.) (in Chinese) [迈克尔 · A. 力伯曼, 阿伦 · J. 里登伯格著, 蒲以康 等译 2007 等离子体 放电原理与材料处理 (北京: 科学出版社) p 291]
[35] Gogolides E, Sawin H H 1992 J. Appl. Phys. 72 3971
[36] Bukowski J D, Graves D B, Vitello P 1996 J. Appl. Phys. 80 2614
[37] Stewart R A, Vitello P, Graves D B, Jaeger E F, Berry L A 1995 Plasma Sourc. Sci. Technol. 4 36
[38] Nitschke T E, Graves D B 1994 J. Appl. Phys. 76 5646
[39] Boeuf J P, Pitchford L C 1995 Phys. Rev. E 51 1376
[40] Godyak V A, Piejak R B, Alexandrovich BM1992 Plasma Sourc. Sci. Technol. 1 36
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[1] Lee J K, Babaeva N Y, Kim H C, Manuilenko O V, Shon JW2004 IEEE Trans. Plasma Sci. 32 47
[2] Boyle P C, Ellingboe A R, Turner M M 2004 Plasma Sourc. Sci. Technol. 13 493
[3] Kitajima T, Takeo Y, Petrovic Z L, Makabe T 2000 Appl. Phys. Lett. 77 489
[4] Kim H C, Lee J K, Shon J W 2003 Phys. Plasmas 10 4545
[5] Chung T H 2005 Phys. Plasmas 12 104503
[6] Salabas A, Brinkmann R P 2005 Plasma Sourc. Sci. Technol. 14 S53
[7] Boyle P C, Ellingboe A R, Turner M M 2004 J. Phys. D: Appl. Phys. 37 697
[8] Kim H C, Lee J K 2005 Phys. Plasmas 12 053501
[9] Kim H C, Lee J K 2004 Phys. Rev. Lett. 93 085003
[10] Kawamura E, Lieberman M A, Lichtenberg A J 2006 Phys. Plasmas 13 053506
[11] Lee J K, Manuilenko O V, Babaeva N Yu, Kim H C, Shon J W 2005 Plasma Sourc. Sci. Technol. 14 89
[12] Lowe H D, Goto H H, Ohmi T 1991 J. Vac. Sci. Technol. A 9 3090
[13] Goto H H, Lowe H D, Ohmi T 1992 J. Vac. Sci. Technol. A 10 3048
[14] Denda T, Miyoshi Y, Komukai Y, Goto T, Petrovic Z L J, Makabe T 2004 J. Appl. Phys. 95 870
[15] Karkari S K, Ellingboe A R 2006 Appl. Phys. Lett. 88 101501
[16] Ohmori T, Goto T K, Kitajima T, Makabe T 2003 Appl. Phys. Lett. 83 4637
[17] Li X S, Bi Z H, Chang D L, Li Z C 2008 Appl. Phys. Lett. 93 031504
[18] Li Z C, Chang D L, Li X S, Bi Z H, Lu W Q 2010 Phys. Plasmas 17 033501
[19] Lisovskiy V A, Yegorenkov V D 2006 Vacuum 80 458
[20] Sudit I D, Chen F F 1994 Plasma Sourc. Sci. Technol. 3 162
[21] Braithwaite N S J, Benjamin N M P, Allen J E 1987 J. Phys. E: Sci. Instrum. 20 1046
[22] Paranjpe A P, McVittie J P, Self S A 1990 J. Appl. Phys. 67 6718
[23] Hebner G A, Paterson A M 2010 Plasma Sourc. Sci. Technol. 19 015020
[24] Kitajima T, Takeo Y, Makabe T 1999 J. Vac. Sci. Technol. A 17 2510
[25] Schulze J, Gans T, O’Connell D, Czarnetzki U, Ellingboe A R, Turner M M 2007 J. Phys. D 40 7008
[26] Ishimaru M, Ohba T, Ohmori T, Yagisawa T, Kitajima T, Makabe T. 2008 Appl. Phys. Lett. 92 071501
[27] Chen Z Y, Donnelly V M, Economou D J, Chen L, Funk M, Sundararajan R 2009 J. Vac. Sci. Technol. A 27 1159
[28] Karkari S K, Ellingboe A R, Gaman C 2008 Appl. Phys. Lett. 93 071501
[29] Booth J P, Curley G, Mari′c D, Chabert P 2010 Plasma Sourc. Sci. Technol. 19 01500
[30] Lu W Q (Chinese Patent) 200610134481.0. [2007-06-27] [陆文琪 中国专利] 200610134481.0. [2007-06-27]
[31] Huddlestone R H, Leonard S L 1965 Plasma Diagnostic Techniques (New York: Academic) pp 150, 183
[32] Zhao G L, Xu Y, Shang J P, Zhu A M, Lu W Q, Wang Y N 2009 Modern Phys. Lett. B 23 3409
[33] Overzet L J, Hopkins M B 1993 Appl. Phys. Lett. 63 2484
[34] Lieberman M A, Lichtenberg A J 2007 (Translated by Pa Y K) Principles of Plasma Discharges and Mayeriols Processing (2nd Ed.) (in Chinese) [迈克尔 · A. 力伯曼, 阿伦 · J. 里登伯格著, 蒲以康 等译 2007 等离子体 放电原理与材料处理 (北京: 科学出版社) p 291]
[35] Gogolides E, Sawin H H 1992 J. Appl. Phys. 72 3971
[36] Bukowski J D, Graves D B, Vitello P 1996 J. Appl. Phys. 80 2614
[37] Stewart R A, Vitello P, Graves D B, Jaeger E F, Berry L A 1995 Plasma Sourc. Sci. Technol. 4 36
[38] Nitschke T E, Graves D B 1994 J. Appl. Phys. 76 5646
[39] Boeuf J P, Pitchford L C 1995 Phys. Rev. E 51 1376
[40] Godyak V A, Piejak R B, Alexandrovich BM1992 Plasma Sourc. Sci. Technol. 1 36
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