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Ion sputtering will occur when energetic heavy ion incident ion collection and deposition structure with negative charge. Metal wire is a structure commonly used for ion acceleration processes, continuous high-throughput ion incidence can cause surface loss of metal wire, affecting the service performance and lifespan of the metal wire. The SRIM software commonly used for calculating sputtering yield, the multi-body interaction problem contained in the alloy crystal structure cannot be considered, however, so, there is a significant error in calculating the sputtering yield of high-energy ion incident alloy targets. Based on the Molecular Dynamics method and Langevin temperature control model, the calculation model of ion sputtering parameters of energetic metal ion incident alloy target is established. The model was used to calculate the sputtering yield under the conditions of intact surface lattice of the target material and long-term incident surface lattice damage. The damage of the cathode metal wire under different ion incident amounts was further calculated, and carried out the cross-sectional characterization of the metal wire under typical working condition. The results showed that the deviation between the experimental value and the theoretical value was less than 10%, which verified the accuracy and applicability of the theoretical model. Based on this model, proposed the search direction for sputtering resistant materials, meanwhile, carried out a theoretical method to improve the service life of the metal wire, which is of great significance for predicting the service life of the metal wire under different conditions.
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Keywords:
- Heavy-energy ion sputtering /
- Molecular dynamics /
- Alloy target /
- Service life
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