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中国物理学会期刊

半绝缘等离子体波导太赫兹量子级联激光器工艺研究

CSTR: 32037.14.aps.59.2169

Device fabrication of semi-insulating surface-plasmon terahertz quantum-cascade lasers

CSTR: 32037.14.aps.59.2169
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  • 采用气态源分子束外延设备生长了GaAs/AlGaAs束缚态到连续态跃迁结构的太赫兹(THz)量子级联激光器(QCL)有源区结构,研究了半绝缘等离子体波导THz QCL的器件工艺,采用远红外傅里叶变换光谱仪以及探测器测量了器件的电光特性.器件激射频率为32 THz,10 K下的阈值电流密度为275 A/cm2.

     

    The active region of GaAs/AlGaAs bound-to-continuum terahertz quantum-cascade laser (THz QCL) is grown by gas-source molecular beam epitaxy. The device fabrication process of semi-insulating surface-plasmon THz QCL is studied in detail. The electrical and optical characteristics of the fabricated THz QCL device are measured using a far-infrared Fourier transform infrared spectrometer with a deuterated triglycerine sulfate far-infrared detector. At 10 K,the measured lasing frequency is 32 THz and the threshold current density is 275 A/cm2.

     

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