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Zhang Yu-Han, Zhao Xin-Qian, Liang Ying-Shuang, Guo Yuan-Yuan. Numerical simulation of inductively coupled Ar/O2 plasma. Acta Physica Sinica,
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Wang Li, Wen De-Qi, Tian Chong-Biao, Song Yuan-Hong, Wang You-Nian. Electron heating dynamics and plasma parameters control in capacitively coupled plasma. Acta Physica Sinica,
2021, 70(9): 095214.
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Niu Yue, Bao Wei-Min, Li Xiao-Ping, Liu Yan-Ming, Liu Dong-Lin. Numerical simulation and experimental study of high-power thermal equilibrium inductively coupled plasma. Acta Physica Sinica,
2021, 70(9): 095204.
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Zhou Yu, Cao Li-Yang, Ma Xiao-Ping, Deng Li-Li, Xin Yu. Diagnosis of capacitively coupled plasma driven by pulse-modulated 27.12 MHz by using an emissive probe. Acta Physica Sinica,
2020, 69(8): 085201.
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Yu Ming-Hao. Numerical investigation on interaction mechanisms between flow field and electromagnetic field for nonequilibrium inductively coupled plasma. Acta Physica Sinica,
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Wang Jun, Wang Tao, Tang Cheng-Shuang, Xin Yu. Evolution of electron energy distribution function in capacitively coupled argon plasma driven by very high frequency. Acta Physica Sinica,
2016, 65(5): 055203.
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Zhou Qian-Hong, Dong Zhi-Wei. Theoretical study on the electron energy distribution function of weakly ionized air plasma. Acta Physica Sinica,
2013, 62(1): 015201.
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Zou Shuai, Tang Zhong-Hua, Ji Liang-Liang, Su Xiao-Dong, Xin Yu. Application of floating microwave resonator probe to the measurement of electron density in electronegative capacitively coupled plasma. Acta Physica Sinica,
2012, 61(7): 075204.
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Liu Feng, Meng Yue-Dong, Ren Zhao-Xing, Shu Xing-Sheng. Characterization of ZrN films deposited by ICP enhanced RF magnetron sputtering. Acta Physica Sinica,
2008, 57(3): 1796-1801.
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2007, 56(2): 977-981.
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Di Xiao-Lian, Xin Yu, Ning Zhao-Yuan. Effect of antenna configuration on power transfer efficiency for planar inductively coupled plasmas. Acta Physica Sinica,
2006, 55(10): 5311-5317.
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Huang Song, Xin Yu, NingZhao-Yuan. Studies on C22 radical by optical emission spectroscopy in an induc tively-coupled CF44/CH44 plasma. Acta Physica Sinica,
2005, 54(4): 1653-1658.
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2004, 53(10): 3394-3397.
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2002, 51(5): 1035-1039.
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2000, 49(5): 922-925.
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