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Low-dimensional material systems benefit from their extremely high carrier mobility and flexible integrability, making them a subject of research in the terahertz detection field and demonstrating significant potential for applications. At present, software is mainly used to simulate and analyze the structures relied upon for semiconductor terahertz detection of bulk materials, while the simulation analysis for terahertz detection in low-dimensional material systems is still relatively unexplored. Due to the low degrees of freedom in carrier motion in low-dimensional materials, the probability of scattering caused by collisions between electrons and the lattice in the channel during electron movement is effectively reduced, making these materials have immense potential in high-sensitivity detection. Their low equivalent noise power and high signal-to-noise ratio performance in signal detection highlight the broad development prospects of these materials in the field of communication. This work simulates and analyzes the plasmon wave effect in a monolayer MoS2 field-effect transistor (FET) for THz detection for the first time, and systematically elucidates the principle and analysis process of using plasmon waves for THz detection. The transmission characteristic curve of the device is simulated and measured at a source-drain voltage of 0.5 V, and, a gate-to-drain voltage of –0.1 V is selected based on this curve to preliminarily investigate the THz response performance of the device. By adjusting key parameters such as Ugs, THz wave irradiation frequency, and HfO2 layer thickness, it is found that the monolayer MoS2 FET THz detector can produce a maximum DC voltage signal of 14 μV. This signal exhibits a complex variation trend related to the bias voltage between the gate and drain. This trend correlates with the bias voltage-induced changes in carrier concentration and the corresponding momentum relaxation time. The research results obtained in this paper can provide an important reference for designing low-dimensional material THz detectors. Furthermore, they lay a foundation for optimizing the performance of two-dimensional material THz detectors through simulation analysis, thereby providing deeper insights into the study of THz photoelectric responses in 2D materials.
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Keywords:
- MoS2 /
- plasma wave /
- terahertz /
- TCAD simulation
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图 1 单层MoS2场效应管太赫兹探测器结构示意图
Figure 1. Structure of monolayer MoS2 FET terahertz detector.
图 2 转移特性曲线 (a)不同HfO2厚度下的转移特性曲线;(b)不同沟道长度下的转移特性曲线
Figure 2. Transfer characteristic curves: (a) The transfer characteristic curves with different HfO2 thickness; (b) the transfer characteristic curves with different channel length.
图 3 在太赫兹光激励下产生的源漏电压Vds随时间的关系
Figure 3. Time domain of Vds stimulated by terahertz radiation.
图 4 Vds振荡信号经FFT后频率与振幅的关系
Figure 4. Frequency domain of Vds.
图 5 不同结构参数下的直流电压输出 (a) 不同太赫兹波振幅下的直流信号输出; (b)不同HfO2厚度的直流信号输出; (c)不同沟道长度的直流信号输出
Figure 5. The DC voltages with different structure parameters: (a) The DC voltages with different U0; (b) the DC voltages with different HfO2 thicknesses; (c) the DC voltages with different channel lengths.
图 6 不同结构参数下直流电压信号随偏置电压以及频率的变化 (a), (b) 不同HfO2厚度(a)和不同沟道长度(b)结构的直流电压信号输出随着偏置电压的变化; (c), (d) 不同HfO2厚度(c)和不同沟道长度(d)结构的直流电压信号输出随着太赫兹波频率的变化
Figure 6. The DC voltages with different structure parameters at different Ugs and terahertz frequencies: (a), (b) The variation of DC voltage signals with bias voltage for structures with different HfO2 thicknesses (a) and different channel lengths (b); (c), (d) the variation of DC voltage signals with different HfO2 thicknesses (c) and different channel lengths (d) structures varies with the frequency of terahertz waves.
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