[1] |
Fu Zhi-Jian, Jia Li-Jun, Xia Ji-Hong, Tang Ke, Li Zhao-Hong, Quan Wei-Long, Chen Qi-Feng. A simple and effective simulation for electrical conductivity of warm dense titanium. Acta Physica Sinica,
2016, 65(6): 065201.
doi: 10.7498/aps.65.065201
|
[2] |
Fang Jia, Li Shuang-Liang, Xu Sheng-Zhi, Wei Chang-Chun, Zhao Ying, Zhang Xiao-Dan. Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy. Acta Physica Sinica,
2013, 62(16): 168103.
doi: 10.7498/aps.62.168103
|
[3] |
Hou Guo-Fu, Xue Jun-Ming, Yuan Yu-Jie, Zhang Xiao-Dan, Sun Jian, Chen Xin-Liang, Geng Xin-Hua, Zhao Ying. Key issues for high-efficiency silicon thin film solar cells prepared by RF-PECVD under high-pressure-depletion conditions. Acta Physica Sinica,
2012, 61(5): 058403.
doi: 10.7498/aps.61.058403
|
[4] |
Li Tian-Wei, Liu Feng-Zhen, Zhu Mei-Fang. rf excited optical emission spectrum of radicals generated during hot wire chemical vapour deposition for the preparation of microcrystalline silicon thin film. Acta Physica Sinica,
2011, 60(1): 018103.
doi: 10.7498/aps.60.018103
|
[5] |
Lu Peng, Hou Guo-Fu, Yuan Yu-Jie, Yang Rui-Xia, Zhao Ying. Influence of n-type layer structure on performance and light-induced degradation of n-i-p microcrystalline silicon solar cells. Acta Physica Sinica,
2010, 59(6): 4330-4336.
doi: 10.7498/aps.59.4330
|
[6] |
Tang Zheng-Xia, Shen Hong-Lie, Jiang Feng, Fang Ru, Lu Lin-Feng, Huang Hai-Bin, Cai Hong. Mechanism of large grain polycrystalline Si preparation by aluminum induced crystallization with temperature gradient profile. Acta Physica Sinica,
2010, 59(12): 8770-8775.
doi: 10.7498/aps.59.8770
|
[7] |
Zhang Yong, Liu Yan, Lü Bin, Tang Nai-Yun, Wang Ji-Qing, Zhang Hong-Ying. Influence of barrier height of the front contact on the amorphous silicon and microcrystalline silicon heterojunction solar cells. Acta Physica Sinica,
2009, 58(4): 2829-2835.
doi: 10.7498/aps.58.2829
|
[8] |
Fan Tian-You, Fan Lei, Mai Y. W.. Approximate analytic and numerical study on indentation of cellular/foam film with glass substrate. Acta Physica Sinica,
2009, 58(13): 189-S192.
doi: 10.7498/aps.58.189
|
[9] |
Peng Wen-Bo, Liu Shi-Yong, Xiao Hai-Bo, Zhang Chang-Sha, Shi Ming-Ji, Zeng Xiang-Bo, Xu Yan-Yue, Kong Guang-Lin, Yu Yu-De. Gap states and microstructure of microcrystalline silicon thin films. Acta Physica Sinica,
2009, 58(8): 5716-5720.
doi: 10.7498/aps.58.5716
|
[10] |
Sun Fu-He, Zhang Xiao-Dan, Wang Guang-Hong, Xu Sheng-Zhi, Yue Qiang, Wei Chang-Chun, Sun Jian, Geng Xin-Hua, Xiong Shao-Zhen, Zhao Ying. Influence of boron on the properties of intrinsic microcrystalline silicon thin films. Acta Physica Sinica,
2009, 58(2): 1293-1297.
doi: 10.7498/aps.58.1293
|
[11] |
Li Shi-Bin, Wu Zhi-Ming, Yuan Kai, Liao Nai-Man, Li Wei, Jiang Ya-Dong. Study on thermal conductivity of hydrogenated amorphous silicon films. Acta Physica Sinica,
2008, 57(5): 3126-3131.
doi: 10.7498/aps.57.3126
|
[12] |
Tan Man-Lin, Zhu Jia-Qi, Zhang Hua-Yu, Zhu Zhen-Ye, Han Jie-Cai. Effect of boron doping on the electrical conduction of tetrahedral amorphous carbon films. Acta Physica Sinica,
2008, 57(10): 6551-6556.
doi: 10.7498/aps.57.6551
|
[13] |
Yang Shi-E, Wen Li-Wei, Chen Yong-Sheng, Wang Chang-Zhou, Gu Jin-Hua, Gao Xiao-Yong, Lu Jing-Xiao. Substrate temperature and B-doping effects on microstructure and electronic properties of p-type hydrogenated microcrystalline silicon films. Acta Physica Sinica,
2008, 57(8): 5176-5181.
doi: 10.7498/aps.57.5176
|
[14] |
Hou Guo-Fu, Xue Jun-Ming, Sun Jian, Guo Qun-Chao, Zhang De-Kun, Ren Hui-Zhi, Zhao Ying, Geng Xin-Hua, Li Yi-Gang. Research on silane depletion status during the deposition of silicon thin films by high-pressure PECVD. Acta Physica Sinica,
2007, 56(2): 1177-1181.
doi: 10.7498/aps.56.1177
|
[15] |
Guo Qun-Chao, Geng Xin-Hua, Sun Jian Wei, Chang-Chun, Han Xiao-Yan, Zhang Xiao_Dan, Zhao Ying. Role of gas residence time in the deposition rate and properties of microcrystalline silicon films. Acta Physica Sinica,
2007, 56(5): 2790-2795.
doi: 10.7498/aps.56.2790
|
[16] |
Di Yu-Xian, Ji Xin-Hua, Hu Ming, Qin Yu-Wen, Chen Jin-Long. Residual stress measurement of porous silicon thin film by substrate curvature method. Acta Physica Sinica,
2006, 55(10): 5451-5454.
doi: 10.7498/aps.55.5451
|
[17] |
Gao Xiao-Yong, Li Rui, Chen Yong-Sheng, Lu Jing-Xiao, Liu Ping, Feng Tuan-Hui, Wang Hong-Juan, Yang Shi-E. Study of the structural and optical properties of microcrystalline silicon film. Acta Physica Sinica,
2006, 55(1): 98-101.
doi: 10.7498/aps.55.98
|
[18] |
Zhou Feng, Liang Kai-Ming, Wang Guo-Liang. Study on the phase transformation behavior of TiO2 thin films in an electric field. Acta Physica Sinica,
2005, 54(6): 2863-2867.
doi: 10.7498/aps.54.2863
|
[19] |
Zhang Xiao-Dan, Zhao Ying, Zhu Feng, Wei Chang-Chun, Wu Chun-Ya, Gao Yan-Tao, Hou Guo-Fu, Sun Jian, Geng Xin-Hua, Xiong Shao-Zhen. A study of Raman and optical emission spectroscopy on microcrystalline silicon films deposited by VHF-PECVD. Acta Physica Sinica,
2005, 54(1): 445-449.
doi: 10.7498/aps.54.445
|
[20] |
Zhang Shi-Bin, Liao Xian-Bo, An Long, Yang Fu-Hua, Kong Guang-Lin, Wang Yong-Qian, Xu Yan-Yue, Chen Chang-Yong, Diao Hong-Wei. . Acta Physica Sinica,
2002, 51(8): 1811-1815.
doi: 10.7498/aps.51.1811
|