Measurement of time-varying electron density of air spark shock wave plasma jet by the method of microwave Rayleigh scattering

Wu Jin-Fang; Chen Zhao-Quan; Zhang Ming; Zhang Huang; Zhang San-Yang; Feng De-Ren; Zhou Yu-Ming

doi:10.7498/aps.69.20191909

Abstract

It is difficult in measuring the electron density of an atmospheric air spark shock wave plasma jet, due to its variation on the time scale of sub-microseconds. In this paper, the time-varying electron density of air spark shock wave plasma jet is measured, based on the principle of microwave Rayleigh scattering. The system constant A is determined by using calibration of materials with known properties; the results show that the system constant is obtained as A = 1.04 × 10⁵ V·Ω·m^–2. According to the principle of microwave Rayleigh scattering, the electron density of the plasma jet is related to its radius and length of the plasma jet plume. Combined with the discharge image captured by ICCD camera, it is observed that the plasma jet plumes are with irregular patterns. In order to facilitate the calculation, the plasma jet plumes are replaced by cylinders with the same volume as the original shapes. Thus, the equivalent radius and length of the plasma jet plume are obtained. According to the known data, the electron density is determined to be in the order of 10²⁰ m^–3; its value increases rapidly to the peak value, and after then exponential attenuates along with time. In addition, the effect of different equivalent dimensions of the plasma jet plume on the measurement results is also discussed. It is shown that the calculation result with the time-varying equivalent radius and the time-varying equivalent length is the most effective one. In addition, the first fast peak is caused by the ionization wave of the photo ionization. The actual ionization process is that the air discharge in the cathode cavity releases a large number of high energy photons, which pass through the cathode nozzle and project into the region outside the nozzle; and then the O₂ molecule in the ambient air are ionized by those high energy photons to form the plasma jet plume at the time of 1 μs.

Keywords:

Authors and contacts

College of Electrical & Information Engineering, Anhui University of Technology, Key Laboratory of Power Electronics and Electrical Drive in Anhui Province, Maanshan 243032, China

Corresponding author: Chen Zhao-Quan, chenzq@ahut.edu.cn

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References

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Cited By

图 1 大气压空气电火花放电产生的等离子体射流　(a)大气压空气电火花放电装置的结构图; (b) 电火花放电装置照片; (c) 空气电火花激波等离子体射流照片

Figure 1. Plasma jet generated by atmospheric pressure air spark discharge: (a) Structure diagram of atmospheric pressure air spark discharge device; (b) installation photo of spark discharge device; (c) photo of air spark shock-wave plasma jet.

DownLoad: Full-Size Img PowerPoint

图 2 火花放电电压波形

Figure 2. Spark discharge voltage waveform.

DownLoad: Full-Size Img PowerPoint

图 3 微波瑞利散射装置　(a)实验系统图; (b)实验装置照片

Figure 3. Microwave Rayleigh scattering device: (a) Experimental schematic diagram; (b) photo of experimental device.

DownLoad: Full-Size Img PowerPoint

图 4 微波瑞利散射装置的系统参数标定

Figure 4. Calibration on a constant of microwave Rayleigh scattering device.

DownLoad: Full-Size Img PowerPoint

图 5 微波瑞利散射装置测定的散射信号

Figure 5. Scattering signal measured by microwave Rayleigh scattering device.

DownLoad: Full-Size Img PowerPoint

图 6 空气等离子体射流的光学影像

Figure 6. Optical images of air plasma jet.

DownLoad: Full-Size Img PowerPoint

图 7 空气等离子体激波射流的半径r(t)和长度l(t)

Figure 7. The radius r(t) and length l(t) of air plasma shock-wave jet.

DownLoad: Full-Size Img PowerPoint

图 8 不同等效尺度下的等离子体射流的时变电子密度　(a) r = 1.2 mm, l = 10 mm; (b) r = 1.2 mm, l = l(t); (c) r = r(t), l = 10 mm; (d) r = r(t), l = l(t)

Figure 8. Time-varying electron density of plasma jet with the different equivalent scales: (a) r = 1.2 mm, l = 10 mm; (b) r = 1.2 mm, l = l(t); (c) r = r(t), l = 10 mm; (d) r = r(t), l = l(t).

DownLoad: Full-Size Img PowerPoint

[1]	Akram M, Lundgren E 1996 J. Phys. 29 2129
[2]	Lu X P, Laroussi M, Puech V 2012 Plasma Sources Sci. Technol. 21 034005 Google Scholar
[3]	Janda M, Machala Z 2011 IEEE Trans. Plasma Sci. 39 2246
[4]	El-Koramy R A, Effendiev A Z, Aliverdiev A A 2007 Phys B 392 304 Google Scholar
[5]	Dobrynin D, Arjunan K, Fridman A, Friedman G, Morss Clyne A 2011 J. Phys. D: Appl. Phys. 44 075201 Google Scholar
[6]	Lu X P, Laroussi M 2006 J. Appl. Phys. 100 063302 Google Scholar
[7]	Lu X P, Naidis G V, Laroussi M, Reuter S, Graves D B, Ostrikov K 2016 Phys. Rep. 63 1
[8]	Lu X P, Naidis G V, Laroussi M and Ostrikov K 2014 Phys. Rep. 540 123 Google Scholar
[9]	Abdellatif G, Imam H 2002 Spectrochim. Acta B 57 1155 Google Scholar
[10]	李驰, 唐晓亮, 邱高 2008 光谱学与光谱分析 28 2754 Google Scholar Li C, Tang X L, Qiu G 2008 Spectrosc. Spect. Anal. 28 2754 Google Scholar
[11]	Pakhal H R, Lucht R P, Laurendeau N M 2008 Appl. Phys. B 90 15 Google Scholar
[12]	Yambea K, Saito H, Ogura K 2015 IEEJTrans. Electr. Electron. Eng. 10 614 Google Scholar
[13]	杨文斌, 周江宁, 李斌成, 邢廷文 2017 物理学报 66 095201 Google Scholar Yang W B, Zhou J N, Li B C, Xing T W 2017 Acta Phys. Sin. 66 095201 Google Scholar
[14]	Xu J Z, Shi J J, Zhang J, Zhang Q, Nakamura K, Sugai H 2010 Chin. Phys. B 19 075206 Google Scholar
[15]	Shneider M N, Miles R B 2005 J. Appl. Phys. 98 033301 Google Scholar
[16]	ShashurinA, Shneider M N, Dogariu A, Miles R B, Keidar M 2010 Appl. Phys. Lett. 96 171501 Google Scholar
[17]	Shashurin A, Shneider M N, Dogariu A, Miles R B, Keidar M 2009 Appl. Phys. Lett. 94 231504 Google Scholar
[18]	Lu X P, Keidar M, Laroussi M, Choi E, Szili E J, Ostrikov K 2019 Mater. Sci. Eng. R. 138 36 Google Scholar
[19]	Chen Z Q, Zhou B K, Zhang H, Hong L L, Zou C L, Li P, Zhao W D, Liu X D, Stepanova O, Kudryavtsev A A 2018 Chin. Phys. B 27 055202 Google Scholar
[20]	Chen Z Q, Liu X D, Zou C L, Song X, Li P, Hu Y L, Qiu H B, Kudryavtsev A A, Zhu M Z 2017 J. Appl. Phys. 121 023302 Google Scholar
[21]	Chen Z Q, Xia G Q, Zou C L, Liu X D, Feng D R, Li P, Hu Y L, Stepanova O, Kudryavtsev A A 2017 J. Appl. Phys. 122 093301 Google Scholar
[22]	Chen Z Q, Yin Z X, Chen M G, Hong L L, Xia G Q, Hu Y L, Huang Y R, Liu M H, Kudryavtsev A A 2014 J. Appl. Phys. 116 153303 Google Scholar
[23]	Chen Z Q, Zhou Q Y, Xia G Q, Hu Y L, Zheng X L, Zheng Z, Hong L L, Li P, Huang Y R, Liu M H 2012 Rev. Sci. Instrum. 83 084701 Google Scholar
[24]	Barni R, Biganzoil I, Tassetti D, Riccardi C 2014 Plasma Chem. Plasma Process. 34 1415 Google Scholar
[25]	Chen Z Q, Xia G Q, Li P, Hong L L, Hu Y L, Zheng X L, Wang Y, Huang Y R, Zhu L J, Liu M H 2013 IEEE Trans. PlasmaSci. 41 1658 Google Scholar
[26]	卢新培, 严萍, 任春生, 邵涛 2011 中国科学: 物理学~力学~天文学 41 801 Google Scholar Lu X P, Yan P, Ren C S, Shao T 2011 Sci. China-Phys. Mech. Astron. 41 801 Google Scholar
[27]	周前红, 董志伟, 陈京元 2011 物理学报 60 125202 Google Scholar Zhou Q H, Dong Z W, Chen J Y 2011 Acta Phys. Sin. 60 125202 Google Scholar
[28]	李和平, 于达仁, 孙文廷, 刘定新, 李杰, 韩先伟, 李增耀, 孙冰, 吴云 2016 高电压技术 42 3697 Li H P, Yu D R, Sun W T, Liu D X, Li J, Han X W, Li Z Y, Sun B, Wu Y 2016 High Voltage Eng. 42 3697
[29]	王林, 夏智勋, 罗振兵, 周岩, 张宇 2014 物理学报 63 194702 Google Scholar Wang L, Xia Z X, Luo Z B, Zhou Y, Zhang Y 2014 Acta Phys. Sin. 63 194702 Google Scholar
[30]	Bárdos L, Baránková H 2010 Thin Solid Films 518 6705 Google Scholar
[31]	严建华, 屠昕, 马增益, 潘新潮, 岑可法 2006 物理学报 55 3451 Google Scholar Yan J H, Tu X, Ma Z Y, Pan X C, Cen K F, Cheron Bruno 2006 Acta Phys. Sin. 55 3451 Google Scholar
[32]	Lu X P, Ostrikov K 2018 Appl. Phys. Rev. 5 031102 Google Scholar
[33]	Xia G Q, Chen Z Q, Yin Z X, Hao J K, Xu Z Q, Xue C G, Hu D, Zhou M R, Hu Y L, Kudryavtsev A A 2015 IEEE Trans. PlasmaSci. 43 1825 Google Scholar
[34]	Xia G Q, Chen Z Q, Saifutdinov A I, Eliseev S, Hu Y L, Kudryavtsev A A 2014 IEEE Trans. PlasmaSci. 42 2768 Google Scholar
[35]	Xian Y B, Wu S Q, Wang Z, Huang Q J, Lu X P, Kolb J F 2013 Plasma Process. Polym. 10 372 Google Scholar
[36]	吴淑群, 聂兰兰, 卢新培 2015 高电压技术 41 2602 Wu S Q, Nie L L, Lu X P 2015 High Voltage Eng. 41 2602
[37]	Dobrynin D, Fridman A, Starikovskiy A Y 2012 IEEE Trans. Plasma Sci. 40 2613
[38]	Wu S Q, Lu X P, Liu D, Yang Y, Pan Y, Ostrikov K 2014 Phys. Plasmas 21 103508 Google Scholar
[39]	陈兆权, 夏广庆, 刘明海, 郑晓亮, 胡业林, 李平, 徐公林, 洪伶俐, 沈昊宇, 胡希伟 2013 物理学报 62 195204 Google Scholar Chen Z Q, Xia G Q, Liu M H, Zheng X L, Hu Y L, Li P, Xu G L, Hong L L, Shen H Y, Hu X W 2013 Acta Phys. Sin. 62 195204 Google Scholar
[40]	卢新培 2011 高电压技术 37 1416 Lu X P 2011 High Voltage Eng. 37 1416
[41]	张宏超, 陆建, 倪晓武 2008 物理学报 58 4034 Google Scholar Zhang H C, Lu J, Ni X W 2008 Acta Phys. Sin. 58 4034 Google Scholar
[42]	Chen Z Q, Zhang H, Wu J F, Tu Y L, Zhang M, Wu C Y, Liu S C, Zhou Y M 2019 IEEE Trans. Plasma Sci. 47 4787 Google Scholar
[43]	李雪辰, 张盼盼, 李霁媛, 张琦, 鲍文婷 2017 光谱学与光谱分析 37 1696 Li X C, Zhang P P, Li J Y, Zhang Q, Bao W T 2017 Spectrosc. Spect. Anal. 37 1696
[44]	Xiong Z M, Kushner M J 2012 Plasma Sources Sci. Technol. 21 034001 Google Scholar
[45]	Brian L S, Biswa N G, Kunihide T 2008 Appl. Phys. Lett. 92 151503 Google Scholar
[46]	蔡新景, 王新新, 邹晓兵, 孙悦, 鲁志伟 2015 高电压技术 41 2047 Cai X J, Wang X X, Zou X B, Sun Y, Lu Z W 2015 High Voltage Eng. 41 2047
[47]	Wormeester G, Pancheshnyi S, Luque A, Nijdam S, Ebert U 2010 J. Phys. D: Appl. Phys. 43 505201 Google Scholar
[48]	Nijdam S, Wetering van de F M J H, Blanc R, Veldhuizen van E M, Ebert U 2010 J. Phys. D: Appl. Phys. 43 145204 Google Scholar
[49]	韩波, 王菲鹿, 梁贵云, 赵刚 2016 物理学报 65 110503 Google Scholar Han B, Wang F L, Liang G Y, Zhao G 2016 Acta Phys. Sin. 65 110503 Google Scholar
[50]	张赟, 曾嵘, 杨学昌, 张波, 何金良 2009 中国电机工程学报 29 0110 Zhang Y, Zeng R, Yang X C, Zhang B, He J L 2009 Proc. Chin. Soc. Elect. Eng. 29 0110

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Vol. 69, Issue 7 - 2020-04-05

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